Abstract: A display device includes: a first substrate; a plurality of metal layers on the first substrate and separated from each other; a buffer layer on the metal layer; a semiconductor layer on the buffer layer; a gate conductive layer on the semiconductor layer; a data conductive layer connected to the semiconductor layer; and a light-emitting element connected to the data conductive layer, wherein the metal layer includes a first portion partially overlapping the semiconductor layer in a third direction perpendicular to the surface of the first substrate, a second portion where the metal layer completely overlaps the semiconductor layer in the third direction, and a third portion where the metal layer does not overlap the semiconductor layer in the third direction.

Abstract: An anode for a lithium secondary battery includes an anode current collector, and an anode active material layer disposed on the anode current collector. The anode active material layer includes a first anode active material layer including a first anode active material and a first binder that includes an acrylate-styrene butadiene copolymer, and a second anode active material layer disposed on the first anode material layer, the second anode active material layer including a second anode active material and a second binder that includes an acrylate-styrene-butadiene copolymer. A peak intensity ratio according to Raman spectroscopy of the first anode active material is smaller than the peak intensity ratio according to Raman spectroscopy of the second anode active material, and the peak intensity ratio according to Raman spectroscopy is represented as ID/IG.

Abstract: The present disclosure relates to a vapor deposition compound capable of being deposited into a thin film through vapor deposition. Specifically, the present disclosure relates to a novel compound applicable to atomic layer deposition (ALD) or chemical vapor deposition (CVD) and having excellent reactivity, volatility, and thermal stability, a precursor composition containing the novel compound, a method of forming a thin film using the precursor composition, and a thin film formed using the precursor composition.

Abstract: The present invention relates to a catalyst for hydrogenation of an aromatic compound, which is capable of greatly reducing the inactivation of a catalyst by using a support including a magnesium-based spinel structure, and a preparation method therefor.

Abstract: Provided is a hydrogenation method of a phthalate-based compound. According to the present invention, after hydrogenation of the phthalate-based compound, a reaction product is stably decompressed to separate and recover unreacted hydrogen, thereby improving stability and economic efficiency of the process.

Abstract: The present invention relates to a novel use of milk exosomes, and more specifically, provides a method of enhancing immunity of a subject including administering a therapeutically effective amount of exosomes isolated from milk or goat milk to the subject.

Abstract: The present invention relates to a novel use of milk exosomes, and more specifically, provides a method of preventing or treating hair loss of a subject, the method including administering a therapeutically effective amount of exosomes isolated from milk or goat milk to the subject.

Abstract: The present invention relates to a novel use of milk exosomes, and more specifically, provides a method of inhibiting UV-induced oxidative damage of cells using an effective amount of exosomes isolated from milk or goat milk.

Abstract: The present disclosure relates to a retina imaging method in which a light from a light source into two lights is dispersed, at least one eyeground image of the eyeball at a first magnification is obtained by adjusting the paths of the two lights incident on the eyeball, and a plurality of DIC images are obtained at a second magnification higher than the first magnification with respect to the retina of the entirety of the obtained at least one eyeground image by adjusting the paths of the two lights incident on the eyeball.

Abstract: The present invention relates to a vapor deposition compound capable of being deposited as a thin film through vapor deposition and, in particular, to: an organometal-containing compound which can be applied to an atomic layer deposition (ALD) method or a chemical vapor deposition (CVD) method and has excellent reactivity, volatility, and thermal stability; a precursor composition comprising the organometallic compound; a method for manufacturing a thin film using the precursor composition; and an organometal-containing thin film manufactured using the precursor composition.

Abstract: This invention relates to a preparation method of an ester compound that can reduce energy consumption due to convenient post-treatment process, and simultaneously, can produce products of high purities.

Abstract: The present invention relates to a novel use of milk exosomes, and more specifically, provides various uses of milk exosomes, such as in functional cosmetics, functional health food with various functions such as improving gut health and immunity, and drugs including a wound healing medication.

Abstract: This invention relates to a process for hydrogenation of a phthalate based compound. According to the invention, generation of by-products is inhibited during hydrogenation, and thus, catalytic activity is improved and life is prolonged, thereby increasing efficiency and economical feasibility of the industrial process. And, since the hydrogenation product prepared according to the invention has high purity and low acid value, it has excellent qualities as a plasticizer, and thus, can be used for various products.

Abstract: The present invention relates to a vapor deposition compound enabling thin-film deposition through vapor deposition, and particularly to nickel and cobalt precursors capable of being applied to atomic layer deposition (ALD) or chemical vapor deposition (CVD) and having superior thermal stability and reactivity, and a method of preparing the same.

Abstract: The present invention relates to a compound that is capable of being used in thin-film deposition using vapor deposition. Particularly, the present invention relates to a rare earth compound, which is capable of being applied to atomic layer deposition (ALD) or chemical vapor deposition (CVD) and which has excellent thermal stability and reactivity, a rare earth precursor including the same, a method of manufacturing the same, and a method of forming a thin film using the same.

Abstract: The present invention relates to a vapor deposition compound enabling thin-film deposition through vapor deposition, and more particularly to a novel cobalt precursor, which can be applied to atomic layer deposition (ALD) or chemical vapor deposition (CVD) and exhibits superior reactivity, volatility and thermal stability, a method of preparing the same and a method of manufacturing a thin film using the same.

Abstract: The present invention relates to a compound that is capable of being used in thin-film deposition using vapor deposition. Particularly, the present invention relates to a rare earth compound, which is capable of being applied to atomic layer deposition (ALD) or chemical vapor deposition (CVD) and which has excellent thermal stability and reactivity, a rare earth precursor including the same, a method of manufacturing the same, and a method of forming a thin film using the same.

Abstract: An organometallic compound, which enables thin-film deposition through vapor deposition, and particularly to a Co or Fe precursor, which is suitable for use in atomic layer deposition or chemical vapor deposition, and a method of preparing the same.

Abstract: Provided is a hydrogenation method of a phthalate compound. According to the present invention, in the hydrogenation reaction, generation of by-products is suppressed, and thus catalytic activity is improved and life-time is extended, thereby increasing efficiency of a commercial process and economic efficiency. Further, since the hydrogenation product prepared by the present invention has high purity and a low acid value, its quality as a plasticizer is excellent, thereby being applied to a variety of products.

Abstract: The present invention relates to a vapor deposition compound enabling thin-film deposition through vapor deposition, and more particularly to a novel cobalt precursor, which can be applied to atomic layer deposition (ALD) or chemical vapor deposition (CVD) and exhibits superior reactivity, volatility and thermal stability, a method of preparing the same and a method of manufacturing a thin film using the same.