Patents by Inventor Hyo Won SON
Hyo Won SON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11795549Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.Type: GrantFiled: March 7, 2022Date of Patent: October 24, 2023Assignee: LG INNOTEK CO., LTD.Inventors: Dong Mug Seong, Jong Min Yun, Su Hyeon Cho, Hae Sik Kim, Tae Hoon Han, Hyo Won Son, Sang Yu Lee, Sang Beum Lee
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Patent number: 11732364Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.Type: GrantFiled: January 12, 2022Date of Patent: August 22, 2023Assignee: LG INNOTEK CO., LTD.Inventors: Dong Mug Seong, Jong Min Yun, Su Hyeon Cho, Hae Sik Kim, Tae Hoon Han, Hyo Won Son, Sang Yu Lee, Sang Beum Lee
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Publication number: 20220190250Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.Type: ApplicationFiled: March 7, 2022Publication date: June 16, 2022Inventors: Dong Mug SEONG, Jong Min YUN, Su Hyeon CHO, Hae Sik KIM, Tae Hoon HAN, Hyo Won SON, Sang Yu LEE, Sang Beum LEE
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Patent number: 11335854Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.Type: GrantFiled: March 27, 2020Date of Patent: May 17, 2022Assignee: LG INNOTEK CO., LTD.Inventors: Dong Mug Seong, Jong Min Yun, Su Hyeon Cho, Hae Sik Kim, Tae Hoon Han, Hyo Won Son, Sang Yu Lee, Sang Beum Lee
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Publication number: 20220149283Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.Type: ApplicationFiled: January 12, 2022Publication date: May 12, 2022Inventors: Dong Mug SEONG, Jong Min YUN, Su Hyeon Cho, Hae Sik Kim, Tae Hoon Han, Hyo Won Son, Sang Yu Lee, Sang Beum Lee
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Patent number: 10727409Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.Type: GrantFiled: August 22, 2017Date of Patent: July 28, 2020Assignee: LG INNOTEK CO., LTD.Inventors: Dong Mug Seong, Jong Min Yun, Su Hyeon Cho, Hae Sik Kim, Tae Hoon Han, Hyo Won Son, Sang Yu Lee, Sang Beum Lee
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Publication number: 20200227640Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.Type: ApplicationFiled: March 27, 2020Publication date: July 16, 2020Inventors: Dong Mug SEONG, Jong Min YUN, Su Hyeon CHO, Hae Sik KIM, Tae Hoon HAN, Hyo Won SON, Sang Yu LEE, Sang Beum LEE
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Publication number: 20190259951Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.Type: ApplicationFiled: August 22, 2017Publication date: August 22, 2019Inventors: Dong Mug SEONG, Jong Min YUN, Su Hyeon CHO, Hae Sik KIM, Tae Hoon HAN, Hyo Won SON, Sang Yu LEE, Sang Beum LEE
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Patent number: 9870072Abstract: A digitizer includes a first substrate, a first electrode on the first substrate, a first insulating layer on the first electrode, and a second electrode on the first insulating layer. The first insulating layer is formed therein with a through hole to expose the first electrode, and the first and second electrodes make contact with each other through the through hole.Type: GrantFiled: February 27, 2015Date of Patent: January 16, 2018Assignee: LG INNOTEK CO., LTD.Inventors: Sun Hwa Lee, Seong Su Oem, Dae Young Ku, Young Sun You, Jee Heum Paik, Hyo Won Son, Eun Young Jung, Kwang Yong Jin
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Patent number: 9857656Abstract: Provided are an electrode plate using an ITO, and an electrochromic plate, an electrochromic mirror and a display device using the electrode plate, the electrode plate including a transparent electrode layer, a metal mesh pattern on the transparent electrode layer, an insulating layer provided in a space defined by an upper surface of the transparent electrode layer and the metal mesh pattern and between metal components of the metal mesh pattern, and a base substrate on the metal mesh pattern and the insulating layer.Type: GrantFiled: July 31, 2014Date of Patent: January 2, 2018Assignee: LG INNOTEK CO., LTD.Inventors: Young Dae Seo, Hyo Won Son, Joo Hyun Hwang
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Publication number: 20150248184Abstract: A digitizer includes a first substrate, a first electrode on the first substrate, a first insulating layer on the first electrode, and a second electrode on the first insulating layer. The first insulating layer is formed therein with a through hole to expose the first electrode, and the first and second electrodes make contact with each other through the through hole.Type: ApplicationFiled: February 27, 2015Publication date: September 3, 2015Inventors: Sun Hwa LEE, Seong Su OEM, Dae Young KU, Young Sun YOU, Jee Heum PAIK, Hyo Won SON, Eun Young JUNG, Kwang Yong JIN
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Publication number: 20150077361Abstract: Provided are an electrode plate using an ITO, and an electrochromic plate, an electrochromic mirror and a display device using the electrode plate, the electrode plate including a transparent electrode layer, a metal mesh pattern on the transparent electrode layer, an insulating layer provided in a space defined by an upper surface of the transparent electrode layer and the metal mesh pattern and between metal components of the metal mesh pattern, and a base substrate on the metal mesh pattern and the insulating layer.Type: ApplicationFiled: July 31, 2014Publication date: March 19, 2015Inventors: Young Dae SEO, Hyo Won SON, Joo Hyun HWANG