Patents by Inventor Hyo-Young KWON

Hyo-Young KWON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polymer, organic layer composition, and method of forming patterns
    Patent number: 10556986
    Abstract: A polymer including a structural unit represented by Chemical Formula 1, and an organic layer composition including the polymer, and method of forming patterns are provided. The Chemical Formula 1 is the same as defined in the detailed description.
    Type: Grant
    Filed: September 19, 2016
    Date of Patent: February 11, 2020
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Youjung Park, Sunyoung Yang, Hyo Young Kwon
  • Photocurable composition and device including barrier layer formed from composition
    Patent number: 10392459
    Abstract: The present invention relates to: a photocurable composition containing (A) a photocurable monomer and (B) a monomer containing phosphorus and an amide group; and a device including a barrier layer formed of the composition.
    Type: Grant
    Filed: July 8, 2013
    Date of Patent: August 27, 2019
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Ji Hye Kwon, Hyo Young Kwon, Seong Ryong Nam, Se Il Oh, Chang Soo Woo, Yeon Soo Lee, Chang Min Lee, Seung Jib Choi, Kyoung Jin Ha
  • Monomer, organic layer composition, organic layer, and method of forming patterns
    Patent number: 10364221
    Abstract: A monomer, an organic layer composition, an organic layer, and a method of forming a pattern, the monomer being represented by the following Chemical Formula 1:
    Type: Grant
    Filed: June 8, 2016
    Date of Patent: July 30, 2019
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Hyo Young Kwon, Sunhae Kang, Ran Namgung, Younhee Nam, Yumi Heo, Young Min Kim, Soohyoun Mun
  • Polymer, organic layer composition, and method of forming patterns
    Patent number: 10340148
    Abstract: A polymer, an organic layer composition, and a method of forming patterns, the polymer including a structural unit represented by Chemical Formula 1:
    Type: Grant
    Filed: September 14, 2016
    Date of Patent: July 2, 2019
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Hyo Young Kwon, Ran Namgung, Dominea Rathwell, Hyeonil Jung
  • Polymer, organic layer composition, organic layer, and method of forming patterns
    Patent number: 10323124
    Abstract: A polymer including a moiety represented by Chemical Formula 1, an organic layer composition including the polymer, an organic layer manufactured from the organic layer composition, and a method of forming patterns using the organic layer composition are provided. The definitions of the Chemical Formula 1 are the same as defined in the detailed description.
    Type: Grant
    Filed: June 9, 2015
    Date of Patent: June 18, 2019
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Youn-Hee Nam, Seung-Hyun Kim, Hyo-Young Kwon, Sung-Hwan Kim, Ran Namgung, Soo-Hyoun Mun, Dominea Rathwell, Hyun-Ji Song, Hyeon-Il Jung, Yu-Mi Heo
  • Organic layer composition, organic layer, and method of forming patterns
    Patent number: 10066057
    Abstract: An organic layer composition, an organic layer, and associated methods, the composition including a polymer that includes a moiety represented by Chemical Formula 1, a monomer represented by Chemical Formula 2, and a solvent,
    Type: Grant
    Filed: November 30, 2015
    Date of Patent: September 4, 2018
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Yu-Shin Park, Yun-Jun Kim, Tae-Ho Kim, You-Jung Park, Yoo-Jeong Choi, Hyo-Young Kwon, Seung-Hyun Kim, Ran Namgung, Dominea Rathwell, Soo-Hyoun Mun, Hyun-Ji Song, Hyeon-Il Jung, Yu-Mi Heo
  • Polymer, organic layer composition, organic layer, and method of forming patterns
    Patent number: 9971243
    Abstract: A polymer includes a structural unit represented by Chemical Formula 1 and an organic layer composition including the same. wherein in Chemical Formula 1, A is a carbon cyclic group including at least one hetero atom, B is one of groups in Group 1, where Ar1 to Ar4, R11 to R14, L and m are as defined in the specification and * is a linking point.
    Type: Grant
    Filed: June 3, 2016
    Date of Patent: May 15, 2018
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Yu-Shin Park, Tae-Ho Kim, Yoo-Jeong Choi, Sun-Hae Kang, Hyo-Young Kwon, Sang-Kyun Kim, Young-Min Kim, Youn-Hee Nam, Hyun-Ji Song, Byeri Yoon, Dong-Geun Lee, Seulgi Jeong
  • Polymer, organic layer composition, and method of forming patterns
    Patent number: 9873815
    Abstract: A polymer includes a first moiety represented by Chemical Formula 1, and a second moiety including a substituted or unsubstituted C6 to C60 cyclic group, a substituted or unsubstituted C6 to C60 hetero cyclic group, or a combination thereof: In Chemical Formula 1, X is phosphorus (P), nitrogen (N), boron (B), or P?O, Y1 and Y2 are independently hydrogen or a moiety including at least one substituted or unsubstituted benzene ring, provided that at least one of Y1 and Y2 is the moiety including at least one substituted or unsubstituted benzene ring, Y3 is another moiety including at least one substituted or unsubstituted benzene ring, and * is a linking point.
    Type: Grant
    Filed: March 7, 2016
    Date of Patent: January 23, 2018
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Soohyoun Mun, Hyo Young Kwon, Ran Namgung, Younhee Nam, Hyunji Song
  • Monomer, polymer, organic layer composition, organic layer, and method of forming patterns
    Patent number: 9862668
    Abstract: A monomer, a polymer, an organic layer composition, an organic layer and associated methods, the monomer being represented by Chemical Formula 1:
    Type: Grant
    Filed: October 19, 2015
    Date of Patent: January 9, 2018
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Youn-Hee Nam, Hyo-Young Kwon, Sung-Hwan Kim, Seung-Hyun Kim, Ran Namgung, Dominea Rathwell, Soo-Hyoun Mun, Seulgi Jeong, Hyeon-Il Jung, Yu-Mi Heo
  • MONOMER FOR A HARDMASK COMPOSITION, HARDMASK COMPOSITION COMPRISING THE MONOMER, AND METHOD FOR FORMING A PATTERN USING THE HARDMASK COMPOSITION
    Publication number: 20170327640
    Abstract: Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same. In Chemical Formula 1, A, A?, L and n are the same as in the detailed description.
    Type: Application
    Filed: August 3, 2017
    Publication date: November 16, 2017
    Inventors: Yun-Jun KIM, Hwan-Sung CHEON, Youn-Jin CHO, Yong-Woon YOON, Chung-Heon LEE, Hyo-Young KWON, Yoo-Jeong CHOI
  • Polymer, organic layer composition, organic layer, and method of forming patterns
    Patent number: 9758612
    Abstract: A polymer, an organic layer composition, an organic layer, and a method of forming patterns, the polymer including a moiety represented by the following Chemical Formula 1:
    Type: Grant
    Filed: November 3, 2015
    Date of Patent: September 12, 2017
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Ran Namgung, Hyo-Young Kwon, Seung-Hyun Kim, Dominea Rathwell, Soo-Hyoun Mun, Hyeon-Il Jung, Yu-Mi Heo
  • Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask composition
    Patent number: 9725389
    Abstract: Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same. In Chemical Formula 1, A, A?, L and n are the same as in the detailed description.
    Type: Grant
    Filed: November 29, 2012
    Date of Patent: August 8, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Yun-Jun Kim, Hwan-Sung Cheon, Youn-Jin Cho, Yong-Woon Yoon, Chung-Heon Lee, Hyo-Young Kwon, Yoo-Jeong Choi
  • POLYMER, ORGANIC LAYER COMPOSITION, AND METHOD OF FORMING PATTERNS
    Publication number: 20170114181
    Abstract: A polymer including a structural unit represented by Chemical Formula 1, and an organic layer composition including the polymer, and method of forming patterns are provided. The Chemical Formula 1 is the same as defined in the detailed description.
    Type: Application
    Filed: September 19, 2016
    Publication date: April 27, 2017
    Inventors: Youjung PARK, Sunyoung YANG, Hyo Young KWON
  • POLYMER, ORGANIC LAYER COMPOSITION, AND METHOD OF FORMING PATTERNS
    Publication number: 20170110328
    Abstract: A polymer, an organic layer composition, and a method of forming patterns, the polymer including a structural unit represented by Chemical Formula 1:
    Type: Application
    Filed: September 14, 2016
    Publication date: April 20, 2017
    Inventors: Hyo Young KWON, Ran NAMGUNG, Dominea RATHWELL, Hyeonil JUNG
  • Resist underlayer composition, method of forming patterns, and semiconductor integrated circuit device including the pattern
    Patent number: 9606438
    Abstract: Disclosed is a resist underlayer composition including a compound including a moiety represented by the following Chemical Formula 1 and a solvent. In the above Chemical Formula 1, A1 to A3, X1, X2, L1, L2, Z, and m are the same as defined in the specification.
    Type: Grant
    Filed: November 5, 2013
    Date of Patent: March 28, 2017
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Min-Gyum Kim, Hyo-Young Kwon, Jun-Ho Lee, Hwan-Sung Cheon
  • Polymer, organic layer composition, organic layer, and method of forming patterns
    Patent number: 9593205
    Abstract: A polymer, an organic layer composition including the polymer, an organic layer formed from the organic layer composition, and a method of forming patterns using the organic layer composition, the polymer including a moiety represented by Chemical Formula 1: *-A1-A3A2-A4n*.
    Type: Grant
    Filed: November 9, 2015
    Date of Patent: March 14, 2017
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Soo-Hyoun Mun, Hyo-Young Kwon, Seung-Hyun Kim, Ran Namgung, Dominea Rathwell, Hyeon-Il Jung, Yu-Mi Heo
  • Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition
    Patent number: 9556094
    Abstract: Disclosed are a monomer represented by the following Chemical Formula 1 for a hardmask composition, a hardmask composition including the monomer, and a method of forming patterns using the hardmask composition. In the above Chemical Formula 1, A1 to A3, X1 to X3, L1, L2, n and m are the same as described in the detailed description.
    Type: Grant
    Filed: June 4, 2013
    Date of Patent: January 31, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Yun-Jun Kim, Hyo-Young Kwon, Hea-Jung Kim, Chung-Heon Lee, Youn-Jin Cho, Yoo-Jeong Choi
  • MONOMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PATTERNS
    Publication number: 20170008843
    Abstract: A monomer, an organic layer composition, an organic layer, and a method of forming a pattern, the monomer being represented by the following Chemical Formula 1:
    Type: Application
    Filed: June 8, 2016
    Publication date: January 12, 2017
    Inventors: Hyo Young KWON, Sunhae KANG, Ran NAMGUNG, Younhee NAM, Yumi HEO, Young Min KIM, Soohyoun MUN
  • POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PATTERNS
    Publication number: 20160363864
    Abstract: A polymer includes a structural unit represented by Chemical Formula 1 and an organic layer composition including the same. wherein in Chemical Formula 1, A is a carbon cyclic group including at least one hetero atom, B is one of groups in Group 1, where Ar1 to Ar4, R11 to R14, L and m are as defined in the specifiction and * is a linking point.
    Type: Application
    Filed: June 3, 2016
    Publication date: December 15, 2016
    Inventors: Yu-Shin PARK, Tae-Ho KIM, Yoo-Jeong CHOI, Sun-Hae KANG, Hyo-Young KWON, Sang-Kyun KIM, Young-Min KIM, Youn-Hee NAM, Hyun-Ji SONG, Byeri YOON, Dong-Geun LEE, Seulgi JEONG
  • POLYMER, ORGANIC LAYER COMPOSITION, AND METHOD OF FORMING PATTERNS
    Publication number: 20160322216
    Abstract: A polymer includes a first moiety represented by Chemical Formula 1, and a second moiety including a substituted or unsubstituted C6 to C60 cyclic group, a substituted or unsubstituted C6 to C60 hetero cyclic group, or a combination thereof: In Chemical Formula 1, X is phosphorus (P), nitrogen (N), boron (B), or P?O, Y1 and Y2 are independently hydrogen or a moiety including at least one substituted or unsubstituted benzene ring, provided that at least one of Y1 and Y2 is the moiety including at least one substituted or unsubstituted benzene ring, Y3 is another moiety including at least one substituted or unsubstituted benzene ring, and * is a linking point.
    Type: Application
    Filed: March 7, 2016
    Publication date: November 3, 2016
    Inventors: Soohyoun MUN, Hyo Young KWON, Ran NAMGUNG, Younhee NAM, Hyunji SONG