Patents by Inventor Hyo Young PARK

Hyo Young PARK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11904039
    Abstract: A cosmetic composition for makeup removal and its use for removing facial make-up are disclosed. The composition includes a water-soluble surfactant and an oil-soluble surfactant and. The composition, more specifically, includes, as an active ingredient, a mixture of a water-soluble surfactant having a hydrophile-lipophile balance (HLB) value of 13 or more and an oil-soluble surfactant having an HLB value of 12 or less. The composition can excellently remove makeup residues resulting from using a makeup product, can excellently improve the transparency of the composition, and is excellent in feeling of use on the skin.
    Type: Grant
    Filed: March 28, 2019
    Date of Patent: February 20, 2024
    Assignee: AMOREPACIFIC CORPORATION
    Inventors: Hyo Young Park, Hyun Ju Yu
  • Publication number: 20210059916
    Abstract: A cosmetic composition for makeup removal and its use for removing facial make-up are disclosed. The composition includes a water-soluble surfactant and an oil-soluble surfactant and. The composition, more specifically, includes, as an active ingredient, a mixture of a water-soluble surfactant having a hydrophile-lipophile balance (HLB) value of 13 or more and an oil-soluble surfactant having an HLB value of 12 or less. The composition can excellently remove makeup residues resulting from using a makeup product, can excellently improve the transparency of the composition, and is excellent in feeling of use on the skin.
    Type: Application
    Filed: March 28, 2019
    Publication date: March 4, 2021
    Applicant: AMOREPACIFIC CORPORATION
    Inventors: Hyo Young PARK, Hyun Ju YU