Patents by Inventor Hyoc-Min Yoon

Hyoc-Min Yoon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist composition and method of forming a photoresist pattern using the same
    Patent number: 7989136
    Abstract: A photoresist composition comprises about 0.5 to about 20 parts by weight of a photo-acid generator, about 10 to about 70 parts by weight of a novolac resin containing a hydroxyl group, about 1 to about 40 parts by weight of a cross-linker that comprises an alkoxymethylmelamine compound, and about 10 to about 150 parts by weight of a solvent.
    Type: Grant
    Filed: March 31, 2008
    Date of Patent: August 2, 2011
    Assignees: Samsung Electronics Co., Ltd., Dongjin Semichem Co., Ltd.
    Inventors: Jeong-Min Park, Doo-Hee Jung, Hi-Kuk Lee, Hyoc-Min Yoon, Ki-Hyuk Koo