Patents by Inventor Hyotcherl Ihee

Hyotcherl Ihee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for generating femtosecond electron beam
    Patent number: 8278813
    Abstract: An apparatus and method for generating femtosecond electron beam are disclosed. The apparatus for generating electron beam by discharging an electron generated via a cathode to an anode includes a transmission window provided at one side of the cathode to allow incident laser to pass therethrough, a pinhole formed on the anode such that the pinhole corresponds to the position of the electron generated from the transmission window, and a focusing unit provided at one side of the cathode and generating an electric field to accelerate and at the same time concentrate the electron to the pinhole. Electrons are simultaneously concentrated and accelerated to the pinhole by an electric field generated by the focusing unit positioned at the cathode to generate femtosecond electron beam.
    Type: Grant
    Filed: June 10, 2009
    Date of Patent: October 2, 2012
    Assignee: POSTECH Academy-Industry Foundation
    Inventors: Yong Woon Park, Hyotcherl Ihee, Chang Bum Kim, In Soo Ko
  • APPARATUS AND METHOD FOR GENERATING FEMTOSECOND ELECTRON BEAM
    Publication number: 20100117510
    Abstract: An apparatus and method for generating femtosecond electron beam are disclosed. The apparatus for generating electron beam by discharging an electron generated via a cathode to an anode includes a transmission window provided at one side of the cathode to allow incident laser to pass therethrough, a pinhole formed on the anode such that the pinhole corresponds to the position of the electron generated from the transmission window, and a focusing unit provided at one side of the cathode and generating an electric field to accelerate and at the same time concentrate the electron to the pinhole. Electrons are simultaneously concentrated and accelerated to the pinhole by an electric field generated by the focusing unit positioned at the cathode to generate femtosecond electron beam.
    Type: Application
    Filed: June 10, 2009
    Publication date: May 13, 2010
    Applicant: POSTECH Acadamy-Industry Foundation
    Inventors: Yong Woon PARK, Hyotcherl Ihee, Chang Bum Kim, In Soo Ko