Patents by Inventor Hyouei Kawai

Hyouei Kawai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150018546
    Abstract: A heterocyclic compound represented by the general formula (In the formula, R1, R2 and R3 may be the same or different, and each represents a hydrogen atom, a halogen atom, or this general formula (X1—Y1—R4) (in the formula: X1 represents this general formula (NR5) (in the formula, R5 represents a hydrogen atom, etc.) or the like; Y1 represents an optionally substituted C1-6 alkylene group or the like; and R4 represents an optionally substituted aryl group or the like), and Z represents a nitrogen atom or this general formula (CR6) (in the formula, R6 represents a hydrogen atom, a halogen atom, or an optionally substituted C1-12 alkyl group or the like)), or a salt thereof, exhibits excellent anti-HIV activity and is useful as an anti-HIV agent.
    Type: Application
    Filed: January 30, 2013
    Publication date: January 15, 2015
    Applicant: TOYAMA CHEMICAL CO., LTD.
    Inventors: Hyouei Kawai, Daigo Murata, Yuko Suzumura
  • Publication number: 20130005760
    Abstract: A heterocyclic compound of formula (I) or a salt thereof: wherein R1 is an optionally protected amino group or an optionally substituted C1-6 alkyl group; R2 and R3 are each independently a C1-2 alkyl group; X is a hydrogen atom or a halogen atom; Z1 is N or C—R4; Z2 is N or C—R5; Z3 is N or C—R6; Z4 is N or C—R7; R4, R5, R6, and R7 are each independently a hydrogen atom, a halogen atom, an optionally protected amino group, or a C1-6 alkylsulfonyl group; Z is CH or N; and A is a methylene group or a bond, which has an excellent anti-HIV activity and is useful as an anti-HIV agent.
    Type: Application
    Filed: January 20, 2011
    Publication date: January 3, 2013
    Applicant: Toyama Chemical Co., Ltd.
    Inventors: Yuji Oonishi, Kenichiro Awasaguchi, Nobuhiko Nomura, Keisuke Tohdo, Hyouei Kawai, Tomomi Wakatsuki