Patents by Inventor Hyoung-Min Bahn

Hyoung-Min Bahn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Copolycarbonate resin and method for preparing the same
    Patent number: 10030096
    Abstract: The present disclosure relates to a polycarbonate resin and a method of preparing the same, has an effect of providing a polycarbonate resin having superior chemical resistance and wear resistance due to application of a predetermined comonomer thereto, and a method of preparing the same.
    Type: Grant
    Filed: June 22, 2016
    Date of Patent: July 24, 2018
    Assignee: LG CHEM, LTD.
    Inventors: Un Ko, Hyoung Min Bahn, Byoung Kyu Chun, Jung Jun Park, Ki Jae Lee, Young Wook Son, Moo Ho Hong, Young Young Hwang, Min Jeong Kim
  • COPOLYCARBONATE RESIN AND METHOD FOR PREPARING THE SAME
    Publication number: 20170283547
    Abstract: The present disclosure relates to a polycarbonate resin and a method of preparing the same, has an effect of providing a polycarbonate resin having superior chemical resistance and wear resistance due to application of a predetermined comonomer thereto, and a method of preparing the same.
    Type: Application
    Filed: June 22, 2016
    Publication date: October 5, 2017
    Inventors: Un KO, Hyoung Min BAHN, Byoung Kyu CHUN, Jung Jun PARK, Ki Jae LEE, Young Wook SON, Moo Ho HONG, Young Young HWANG, Min Jeong KIM
  • Acrylonitrile-butadiene-styrene copolymer transparent resin having superior chemical resistance and transparency and preparation thereof
    Patent number: 7217763
    Abstract: The present invention relates to acrylonitrile-butadiene-styrene copolymer transparent resin having superior chemical resistance and transparency and preparation thereof, and particularly to acrylonitrile-butadiene-styrene copolymer transparent resin having superior chemical resistance and transparency by graft-copolymerzing on a) conjugated diene rubber latex, b) methacrylate alkylester or acrylate alkylester compound, c) aromatic vinyl compound and d) vinyl cyanide compound, and preparation thereof. In addition, according to the present invention, chemical resistance and ESCR can be further improved by further adding e) polyester-amide copolymer to the acrylonitrile-butadiene-styrene copolymer transparent resin.
    Type: Grant
    Filed: October 24, 2002
    Date of Patent: May 15, 2007
    Assignee: LG Chem, Ltd.
    Inventors: Jeong-Su Choi, Sung-Hee Kim, Hyoung-Min Bahn, Keun-Hoon Yoo
  • Acrylonitrile-butadiene-styrene copolymer transparent resin having superior chemical resistance and transparency and preparation thereof
    Publication number: 20050032984
    Abstract: The present invention relates to acrylonitrile-butadiene-styrene copolymer transparent resin having superior chemical resistance and transparency and preparation thereof, and particularly to acrylonitrile-butadiene-styrene copolymer transparent resin having superior chemical resistance and transparency by graft-copolymerzing on a) conjugated diene rubber latex, b) methacrylate alkylester or acrylate alkylester compound, c) aromatic vinyl compound and d) vinyl cyanide compound, and preparation thereof. In addition, according to the present invention, chemical resistance and ESCR can be further improved by further adding e) polyester-amide copolymer to the acrylonitrile-butadiene-styrene copolymer transparent resin.
    Type: Application
    Filed: October 24, 2002
    Publication date: February 10, 2005
    Inventors: Jeong-Su Choi, Sung-Hee Kim, Hyoung-Min Bahn, Keun-Hoon Yoo