Abstract: A method for measuring a semiconductor device is provided. A method for measuring a semiconductor device includes defining an interest area and an acceptable area in a chip area on a wafer; performing a first measurement of the chip area with a spectral imaging device to acquire spectrum data of the chip area; assuming the distribution of the spectrum data of a first pixel in the acceptable area is a normal distribution; calculating a distance from a central point on the normal distribution to second pixels in the interest area; selecting a position of a second pixel having a distance from the central point on the normal distribution greater than a predetermined range, among the second pixels, as a candidate position; and performing a second measurement of the candidate position.

Abstract: A method for measuring a semiconductor device is provided. A method for measuring a semiconductor device includes defining an interest area and an acceptable area in a chip area on a wafer; performing a first measurement of the chip area with a spectral imaging device to acquire spectrum data of the chip area; assuming the distribution of the spectrum data of a first pixel in the acceptable area is a normal distribution; calculating a distance from a central point on the normal distribution to second pixels in the interest area; selecting a position of a second pixel having a distance from the central point on the normal distribution greater than a predetermined range, among the second pixels, as a candidate position; and performing a second measurement of the candidate position.

Abstract: A surface inspecting method includes: irradiating an incident light beam of a first polarized state on a target object, the incident light beam comprising parallel light and having a cross-sectional area: measuring a second polarized state of a reflected light beam reflected from the target object; and performing inspection on an entire area of the target object on which the incident light beam is irradiated, based on a variation between the first polarized state and the second polarized state.

Abstract: An optical inspection apparatus includes a broadband light source, a monochromator, an image obtaining apparatus, and an analysis device. The monochromator is configured to convert light from the broadband light source into a plurality of monochromatic beams of different wavelengths and sequentially output the monochromatic beams, where each beam has a preset wavelength width and corresponds to one of a plurality of different wavelength regions. The image obtaining apparatus is configured to allow each monochromatic beam output from the monochromator to be incident to a top surface of an inspection target without using a beam splitter, allow light reflected by the inspection target to travel in a form of light of an infinite light source, and generate 2D images of the inspection target. The analysis device is configured to analyze the 2D images of the inspection target in the plurality of wavelength regions.

Abstract: A method for detecting an overlay error includes: forming a first overlay key including a plurality of spaced apart first target patterns having a first pitch on a first layer of a substrate; forming a second overlay key including a plurality of spaced apart second target patterns having a second pitch different than the first pitch on a second layer of the substrate below the first layer; irradiating the first layer and the second layer with incident light having a first wavelength; obtaining a phase pattern of light reflected from the first layer and the second layer; calculating a position of a peak point or a valley point of the phase pattern of the reflected light; and detecting an overlay error of the first layer and the second layer using the position of the peak point or the valley point of the phase pattern.

Abstract: A method for detecting an overlay error includes: forming a first overlay key including a plurality of spaced apart first target patterns having a first pitch on a first layer of a substrate; forming a second overlay key including a plurality of spaced apart second target patterns having a second pitch different than the first pitch on a second layer of the substrate below the first layer; irradiating the first layer and the second layer with incident light having a first wavelength; obtaining a phase pattern of light reflected from the first layer and the second layer; calculating a position of a peak point or a valley point of the phase pattern of the reflected light; and detecting an overlay error of the first layer and the second layer using the position of the peak point or the valley point of the phase pattern.

Abstract: A surface inspecting method includes: irradiating an incident light beam of a first polarized state on a target object, the incident light beam comprising parallel light and having a cross-sectional area: measuring a second polarized state of a reflected light beam reflected from the target object; and performing inspection on an entire area of the target object on which the incident light beam is irradiated, based on a variation between the first polarized state and the second polarized state.

Abstract: An ellipsometer for detecting a surface including a light source irradiating a substrate with light, a polarization unit polarizing the light irradiated from the light source and analyzing the polarized light, a detector measuring a light quantity of the polarized light passing through the polarization unit, and a driver rotating the detector by an azimuth angle as the substrate rotates in a direction of the azimuth angle direction may be provided.

Abstract: An ellipsometer for detecting a surface including a light source irradiating a substrate with light, a polarization unit polarizing the light irradiated from the light source and analyzing the polarized light, a detector measuring a light quantity of the polarized light passing through the polarization unit, and a driver rotating the detector by an azimuth angle as the substrate rotates in a direction of the azimuth angle direction may be provided.

Abstract: A method of inspecting a flat panel display including inputting an image data signal into the flat panel display, obtaining an image displayed on the flat panel display in response to the input image data signal with a camera, extracting a raw brightness information corresponding to each location from the obtained image, calculating a fitting brightness information corresponding to each location through the curve fitting based on the raw brightness information, calculating a brightness difference corresponding to each location between the raw brightness information and the fitting brightness information, and detecting stain locations with the brightness difference beyond a predetermined permitted limit.

Abstract: An optical system to attain a clear image of an object when the object is photographed in a state where an optical axis of a lens is inclined relative to the object, includes a lens which refracts light radiating from the object, an image producing surface on which the image of the object is produced according to the light refracted by the lens, and an image producing surface control unit which controls the image producing surface to move with respect to the lens. The image producing surface control unit includes an angle control unit to control an angle between an optical axis of the lens and the image producing surface.

Abstract: A panel inspection apparatus inspecting a display panel, including: a panel supporting table supporting the panel; a plurality of cameras installed being spaced from the panel supporting table and photographing the panel supported by the panel supporting table; and a rotatable camera support rotatably supporting at least one of the plurality of cameras. As a result, the number of cameras required is reduced, costing less, and easy installation.

Abstract: A method of inspecting a flat panel display including inputting an image data signal into the flat panel display, obtaining an image displayed on the flat panel display in response to the input image data signal with a camera, extracting a raw brightness information corresponding to each location from the obtained image, calculating a fitting brightness information corresponding to each location through the curve fitting based on the raw brightness information, calculating a brightness difference corresponding to each location between the raw brightness information and the fitting brightness information, and detecting stain locations with the brightness difference beyond a predetermined permitted limit.

Abstract: An optical system to attain a clear image of an object when the object is photographed in a state where an optical axis of a lens is inclined relative to the object, includes a lens which refracts light radiating from the object, an image producing surface on which the image of the object is produced according to the light refracted by the lens, and an image producing surface control unit which controls the image producing surface to move with respect to the lens. The image producing surface control unit includes an angle control unit to control an angle between an optical axis of the lens and the image producing surface.

Abstract: A panel inspection apparatus inspecting a display panel, including: a panel supporting table supporting the panel; a plurality of cameras installed being spaced from the panel supporting table and photographing the panel supported by the panel supporting table; and a rotatable camera support rotatably supporting at least one of the plurality of cameras. As a result, the number of cameras required is reduced, costing less, and easy installation.

Abstract: A radioactive image apparatus and a method of controlling a focus thereof. The radioactive image apparatus includes a radioactive ray generating unit, a robot table, and a radioactive ray detecting unit. The focus control method includes obtaining a radioactive transmission image of a test pattern, defining a circle with a given radius in the radioactive transmission image of the test pattern, detecting values of pixels located on a circumference of the circle, calculating the standard deviation of the values of the pixels located on the circumference of the circle, and determining the radius of the circle to be an index factor of a resolution in response to the calculated standard deviation being smaller than a preset threshold value.

Abstract: An image processing system and an image processing method which correct a moiré in an image taken from a displayed image. An imaging taking apparatus takes an image of an image displayed by an image displaying apparatus and an optical characteristic changing apparatus is provided between the image taking apparatus and the image displaying apparatus. A lightpath of the displayed image is changed before the image of the displayed image is taken and an image processor receives a plurality of the taken images from the image taking apparatus and generates a processed image with a removed moiré by correcting or superposing the plurality of the images. Thus, a processed image, in which a moiré of the displayed image is removed, is promptly obtainable, and a quality of the taken image is increased. The image processing system and method are adaptable to various systems for inspection and/or measurement.

Abstract: A radioactive image apparatus and a method of controlling a focus thereof. The radioactive image apparatus includes a radioactive ray generating unit, a robot table, and a radioactive ray detecting unit. The focus control method includes obtaining a radioactive transmission image of a test pattern, defining a circle with a given radius in the radioactive transmission image of the test pattern, detecting values of pixels located on a circumference of the circle, calculating the standard deviation of the values of the pixels located on the circumference of the circle, and determining the radius of the circle to be an index factor of a resolution in response to the calculated standard deviation being smaller than a preset threshold value.

Abstract: A method of reconstructing a tomogram of an X-ray apparatus. The tomogram reconstructing method includes obtaining model information and a transmission image of a subject. A tomogram is reconstructed from the transmission image using the model information. The reconstructed tomogram obtained is then displayed.

Abstract: A method of reconstructing a tomogram of an X-ray apparatus. The tomogram reconstructing method includes obtaining model information and a transmission image of a subject. A tomogram is reconstructed from the transmission image using the model information. The reconstructed tomogram obtained is then displayed.