Patents by Inventor Hyoung Won Kim

Hyoung Won Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9931663
    Abstract: A coating apparatus includes: a nozzle having a nozzle front end configured to spray a coating solution and a head configured to store the coating solution; a movement axis configured to cause the nozzle to move back and forth in a straight line; a rotating connection member configured to connect the movement axis with the nozzle and allow the nozzle to rotate; a stage disposed under the movement axis; and a cleaning means disposed at an end of the movement axis, and having a nozzle front end insertion unit in a concave shape of the nozzle front end and a base fixing the insertion unit, wherein the nozzle is fixed in a normal direction of a surface of the stage by the movement axis, moves back and forth in an extension direction of the movement axis, and rotates with respect to the movement axis.
    Type: Grant
    Filed: January 11, 2017
    Date of Patent: April 3, 2018
    Assignee: LG Display Co., Ltd.
    Inventors: Tae-Kyun Jeong, Kyong-Deuk Jeong, Jong-Ik Park, Myung-Shik Kim, Hyoung-Won Kim, Dong-Ki Shin, Jeong-Hak Choi
  • Publication number: 20170120282
    Abstract: A coating apparatus includes: a nozzle having a nozzle front end configured to spray a coating solution and a head configured to store the coating solution; a movement axis configured to cause the nozzle to move back and forth in a straight line; a rotating connection member configured to connect the movement axis with the nozzle and allow the nozzle to rotate; a stage disposed under the movement axis; and a cleaning means disposed at an end of the movement axis, and having a nozzle front end insertion unit in a concave shape of the nozzle front end and a base fixing the insertion unit, wherein the nozzle is fixed in a normal direction of a surface of the stage by the movement axis, moves back and forth in an extension direction of the movement axis, and rotates with respect to the movement axis.
    Type: Application
    Filed: January 11, 2017
    Publication date: May 4, 2017
    Applicant: LG Display Co., Ltd.
    Inventors: Tae-Kyun JEONG, Kyong-Deuk JEONG, Jong-Ik PARK, Myung-Shik KIM, Hyoung-Won KIM, Dong-Ki SHIN, Jeong-Hak CHOI
  • Patent number: 9561521
    Abstract: A coating apparatus includes: a nozzle having a nozzle front end configured to spray a coating solution and a head configured to store the coating solution; a movement axis configured to cause the nozzle to move back and forth in a straight line; a rotating connection member configured to connect the movement axis with the nozzle and allow the nozzle to rotate; a stage disposed under the movement axis; and a cleaning means disposed at an end of the movement axis, and having a nozzle front end insertion unit in a concave shape of the nozzle front end and a base fixing the insertion unit, wherein the nozzle is fixed in a normal direction of a surface of the stage by the movement axis, moves back and forth in an extension direction of the movement axis, and rotates with respect to the movement axis.
    Type: Grant
    Filed: December 29, 2010
    Date of Patent: February 7, 2017
    Assignee: LG Display Co., Ltd.
    Inventors: Tae-Kyun Jeong, Kyong-Deuk Jeong, Jong-Ik Park, Myung-Shik Kim, Hyoung-Won Kim, Dong-Ki Shin, Jeong-Hak Choi
  • Publication number: 20140332498
    Abstract: Provided are a substrate holder, a substrate supporting apparatus, a substrate processing apparatus, and a substrate processing method. Particularly, there are provided a substrate holder, a substrate supporting apparatus, a substrate processing apparatus, and a substrate processing method that are adapted to improve process efficiency and etch uniformity at the back surface of a substrate.
    Type: Application
    Filed: July 21, 2014
    Publication date: November 13, 2014
    Inventors: Young Ki HAN, Young Soo SEO, Hyoung Won KIM, Chi Kug YOON, Sang Hoon LEE
  • Patent number: 8373086
    Abstract: Provided are a plasma processing apparatus and method. The plasma processing apparatus includes a chamber, an upper electrode, a lower electrode, a substrate support, and a movement member. The upper electrode is disposed at an inner upper portion of the chamber. The lower electrode faces the upper electrode at an inner lower portion of the chamber to support a substrate such that a bevel of the substrate is exposed in a substrate level etching process. The substrate support is disposed between the upper electrode and the lower electrode to support the substrate such that a central region of a bottom surface of the substrate is exposed in a substrate backside etching process. The movement member is configured to move the substrate support to separate the substrate from the substrate support in the substrate backside etching process.
    Type: Grant
    Filed: April 6, 2009
    Date of Patent: February 12, 2013
    Assignee: Charm Engineering Co., Ltd.
    Inventors: Hyoung Won Kim, Young Soo Seo, Chi Kug Yoon, Jun Hyeok Lee, Young Ki Han, Jae Chul Choi
  • Publication number: 20120107514
    Abstract: A coating apparatus includes: a nozzle having a nozzle front end configured to spray a coating solution and a head configured to store the coating solution; a movement axis configured to cause the nozzle to move back and forth in a straight line; a rotating connection member configured to connect the movement axis with the nozzle and allow the nozzle to rotate; a stage disposed under the movement axis; and a cleaning means disposed at an end of the movement axis, and having a nozzle front end insertion unit in a concave shape of the nozzle front end and a base fixing the insertion unit, wherein the nozzle is fixed in a normal direction of a surface of the stage by the movement axis, moves back and forth in an extension direction of the movement axis, and rotates with respect to the movement axis.
    Type: Application
    Filed: December 29, 2010
    Publication date: May 3, 2012
    Inventors: Tae-Kyun JEONG, Kyong-Deuk Jeong, Jong-Ik Park, Myung-Shik Kim, Hyoung-Won Kim, Dong-Ki Shin, Jeong-Hak Choi
  • Publication number: 20110049100
    Abstract: Provided are a substrate holder, a substrate supporting apparatus, a substrate processing apparatus, and a substrate processing method. Particularly, there are provided a substrate holder, a substrate supporting apparatus, a substrate processing apparatus, and a substrate processing method that are adapted to improve process efficiency and etch uniformity at the back surface of a substrate.
    Type: Application
    Filed: January 15, 2009
    Publication date: March 3, 2011
    Applicant: CHARM ENGINEERING CO., LTD.
    Inventors: Young Ki Han, Young Soo Seo, Hyoung Won Kim, Chi Kug Yoon, Sang Hoon Lee
  • Publication number: 20110024399
    Abstract: Provided are a plasma processing apparatus and method. The plasma processing apparatus includes a chamber, an upper electrode, a lower electrode, a substrate support, and a movement member. The upper electrode is disposed at an inner upper portion of the chamber. The lower electrode faces the upper electrode at an inner lower portion of the chamber to support a substrate such that a bevel of the substrate is exposed in a substrate level etching process. The substrate support is disposed between the upper electrode and the lower electrode to support the substrate such that a central region of a bottom surface of the substrate is exposed in a substrate backside etching process. The movement member is configured to move the substrate support to separate the substrate from the substrate support in the substrate backside etching process.
    Type: Application
    Filed: April 6, 2009
    Publication date: February 3, 2011
    Applicant: CHARM ENGINEERING CO., LTD.
    Inventors: Hyoung Won Kim, Young Soo Seo, Chi Kug Yoon, Jun Hyeok Lee, Young Ki Han, Jae Chul Choi
  • Patent number: D526302
    Type: Grant
    Filed: March 9, 2005
    Date of Patent: August 8, 2006
    Assignee: LG Electronics Inc.
    Inventor: Hyoung Won Kim
  • Patent number: D526986
    Type: Grant
    Filed: March 9, 2005
    Date of Patent: August 22, 2006
    Assignee: LG Electronics Inc.
    Inventor: Hyoung Won Kim
  • Patent number: D527717
    Type: Grant
    Filed: April 18, 2005
    Date of Patent: September 5, 2006
    Assignee: LG Electronics Inc.
    Inventor: Hyoung Won Kim
  • Patent number: D563432
    Type: Grant
    Filed: December 12, 2006
    Date of Patent: March 4, 2008
    Assignee: LG Electronics Inc.
    Inventor: Hyoung Won Kim
  • Patent number: D584738
    Type: Grant
    Filed: September 19, 2007
    Date of Patent: January 13, 2009
    Assignee: LG Electronics Inc.
    Inventors: Hyoung Won Kim, Soo Young Park
  • Patent number: D630178
    Type: Grant
    Filed: February 17, 2010
    Date of Patent: January 4, 2011
    Assignee: LG Electronics Inc.
    Inventors: Seung Don Lee, Hyun Ju Kim, Hyoung Won Kim
  • Patent number: D635116
    Type: Grant
    Filed: August 5, 2010
    Date of Patent: March 29, 2011
    Assignee: LG Electronics Inc.
    Inventors: Seung Don Lee, Hyun Ju Kim, Hyoung Won Kim
  • Patent number: D639763
    Type: Grant
    Filed: July 2, 2010
    Date of Patent: June 14, 2011
    Assignee: LG Electronics Inc.
    Inventors: Hyoung Won Kim, Seung Don Lee
  • Patent number: D646247
    Type: Grant
    Filed: December 13, 2010
    Date of Patent: October 4, 2011
    Assignee: LG Electronics Inc.
    Inventors: Seung Don Lee, Woon Lee Park, Hyoung Won Kim
  • Patent number: D657766
    Type: Grant
    Filed: July 25, 2011
    Date of Patent: April 17, 2012
    Assignee: LG Electronics Inc.
    Inventors: Seung Don Lee, Woon Lee Park, Hyoung Won Kim