Abstract: Provided is an olfactory data sharing terminal including a receiver configured to receive olfactory data obtained by sensing an odor of an object through an olfactory sensor; a preference determiner configured to determine whether a user prefers the received olfactory data, based on a user olfactory function fuser(x); and a display displaying a user preference for the received olfactory data.

Abstract: A method for forming a junction in a germanium (Ge) layer of a substrate includes arranging the substrate in a processing chamber. The method includes performing a plasma pretreatment on the substrate in the processing chamber for a predetermined pretreatment period using a pretreatment plasma gas mixture including hydrogen gas species. The method includes supplying a doping plasma gas mixture to the processing chamber including a phosphorous (P) gas species and an antimony (Sb) gas species. The method includes striking plasma in the processing chamber for a predetermined doping period. The method includes annealing the substrate during a predetermined annealing period to form the junction in the germanium (Ge) layer.

Abstract: Provided is an olfactory data sharing terminal including a receiver configured to receive olfactory data obtained by sensing an odor of an object through an olfactory sensor; a preference determiner configured to determine whether a user prefers the received olfactory data, based on a user olfactory function fuser(x); and a display displaying a user preference for the received olfactory data.

Abstract: A method for forming a junction in a germanium (Ge) layer of a substrate includes arranging the substrate in a processing chamber. The method includes performing a plasma pretreatment on the substrate in the processing chamber for a predetermined pretreatment period using a pretreatment plasma gas mixture including hydrogen gas species. The method includes supplying a doping plasma gas mixture to the processing chamber including a phosphorous (P) gas species and an antimony (Sb) gas species. The method includes striking plasma in the processing chamber for a predetermined doping period. The method includes annealing the substrate during a predetermined annealing period to form the junction in the germanium (Ge) layer.

Abstract: A method for forming a junction in a germanium (Ge) layer of a substrate includes arranging the substrate in a processing chamber. The method includes performing a plasma pretreatment on the substrate in the processing chamber for a predetermined pretreatment period using a pretreatment plasma gas mixture including hydrogen gas species. The method includes supplying a doping plasma gas mixture to the processing chamber including a phosphorous (P) gas species and an antimony (Sb) gas species. The method includes striking plasma in the processing chamber for a predetermined doping period. The method includes annealing the substrate during a predetermined annealing period to form the junction in the germanium (Ge) layer.

Abstract: A method for isotropically etching film on a substrate with atomic layer control includes a) providing a substrate including a material selected from a group consisting of silicon (Si), germanium (Ge) and silicon germanium (SiGe). The method includes b) depositing a sacrificial layer on the material in a processing chamber by: cooling a lower portion of the substrate; one of creating or supplying an oxidant-containing plasma in the processing chamber; and increasing a surface temperature of the substrate for a predetermined period using rapid thermal heating while creating or supplying the oxidant-containing plasma in the processing chamber. The method includes c) purging the processing chamber. The method includes d) etching the sacrificial layer and the material by supplying an etch gas mixture and striking plasma in the processing chamber.

Abstract: A method for forming a junction in a germanium (Ge) layer of a substrate includes arranging the substrate in a processing chamber. The method includes performing a plasma pretreatment on the substrate in the processing chamber for a predetermined pretreatment period using a pretreatment plasma gas mixture including hydrogen gas species. The method includes supplying a doping plasma gas mixture to the processing chamber including a phosphorous (P) gas species and an antimony (Sb) gas species. The method includes striking plasma in the processing chamber for a predetermined doping period. The method includes annealing the substrate during a predetermined annealing period to form the junction in the germanium (Ge) layer.

Abstract: A method for isotropically etching film on a substrate with atomic layer control includes a) providing a substrate including a material selected from a group consisting of silicon (Si), germanium (Ge) and silicon germanium (SiGe). The method includes b) depositing a sacrificial layer on the material in a processing chamber by: cooling a lower portion of the substrate; one of creating or supplying an oxidant-containing plasma in the processing chamber; and increasing a surface temperature of the substrate for a predetermined period using rapid thermal heating while creating or supplying the oxidant-containing plasma in the processing chamber. The method includes c) purging the processing chamber. The method includes d) etching the sacrificial layer and the material by supplying an etch gas mixture and striking plasma in the processing chamber.

Abstract: A foldable display apparatus includes a bendable display panel which folds with respect to a folding axis. The display panel includes a plurality of display devices and a window layer. Each of the display devices includes a plurality of pixels each including a plurality of color elements having different colors from each other. A plurality of color elements of a same color is linearly arranged in a direct line direction which is non-parallel to the folding axis. The window layer includes a soft material part including a soft material in a folding part of the display panel, and a protective window part other than the soft material part. The protective window part protects the display part of the plurality of display devices.

Abstract: A anti-reflection film includes a light phase delay film which changes a phase of incident light, a polarizing film on the light phase delay film and transmitting light with a polarization component in a particular direction, and a protective film on the polarizing film and protecting the polarizing film. All of the polarizing film, the light phase delay film, and the protective film include flexible materials.

Abstract: A reflective display device including: a substrate; a reflective layer on the substrate and configured to reflect light incident on the reflective layer; a color filter layer on the reflective layer; and an optical shutter layer on the color filter layer. Each pixel of a plurality of pixels of the reflective display device includes a plurality of sub-pixels and each sub-pixel includes the substrate, the reflective layer, the color filter layer, and the optical shutter layer, and for each pixel, the color filter layer includes a plurality of color filter elements corresponding to colors respectively obtained by the plurality of sub-pixels.

Abstract: A foldable display apparatus includes a bendable display panel which folds with respect to a folding axis. The display panel includes a plurality of display devices and a window layer. Each of the display devices includes a plurality of pixels each including a plurality of color elements having different colors from each other. A plurality of color elements of a same color is linearly arranged in a direct line direction which is non-parallel to the folding axis. The window layer includes a soft material part including a soft material in a folding part of the display panel, and a protective window part other than the soft material part. The protective window part protects the display part of the plurality of display devices.

Abstract: A anti-reflection film includes a light phase delay film which changes a phase of incident light, a polarizing film on the light phase delay film and transmitting light with a polarization component in a particular direction, and a protective film on the polarizing film and protecting the polarizing film. All of the polarizing film, the light phase delay film, and the protective film include flexible materials.

Abstract: A reflective display device including: a substrate; a reflective layer on the substrate and configured to reflect light incident on the reflective layer; a color filter layer on the reflective layer; and an optical shutter layer on the color filter layer. Each pixel of a plurality of pixels of the reflective display device includes a plurality of sub-pixels and each sub-pixel includes the substrate, the reflective layer, the color filter layer, and the optical shutter layer, and for each pixel, the color filter layer includes a plurality of color filter elements corresponding to colors respectively obtained by the plurality of sub-pixels.