Patents by Inventor Hyun-Chan Cho

Hyun-Chan Cho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240168360
    Abstract: A display assembly includes a display device having an upper surface on which an image is output, and a lens device detachably connected to the upper surface of the display device. The lens device includes a lens panel that refracts the image from the display device, and a connection layer disposed on a lower surface of the lens panel facing the display device and detachably connected to the upper surface of the display device. The upper surface of the display device includes first contact interfaces, and the connection layer includes second contact interfaces detachably connected to the first contact interfaces.
    Type: Application
    Filed: August 22, 2023
    Publication date: May 23, 2024
    Inventors: Su Jung HUH, Byeong Hee WON, Hyun Jin CHO, Beom Shik KIM, Sung-Chan JO
  • Publication number: 20240134478
    Abstract: A method of driving an electronic device includes displaying a plurality of fingerprint recognition icons on a display device configured to perform fingerprint recognition, and releasing a lock state of the display device through a fingerprint authentication process upon determining at least one first fingerprint recognition icon among the plurality of fingerprint recognition icons is touched. The plurality of fingerprint recognition icons include at least one first fingerprint recognition icon configured to support the fingerprint recognition and at least one second fingerprint recognition icon configured to not support the fingerprint recognition.
    Type: Application
    Filed: September 7, 2023
    Publication date: April 25, 2024
    Inventors: Byung Han YOO, Jung Woo PARK, Hyang A PARK, Dae Young LEE, Hyun Dae LEE, Kang Bin JO, Sang Hwan CHO, Sung-Chan JO
  • Patent number: 11935986
    Abstract: A display device may include: a substrate including a display area and a non-display area; and pixels in the display area, and each including sub-pixels. Each sub-pixel may include a pixel circuit layer, and a display element layer including at least one light emitting element. The display element layer may include: a first electrode on the pixel circuit layer; a second electrode on the first electrode and electrically insulated from the first electrode; the light emitting element including a first end portion coupled to the first electrode and a second end portion coupled to the second electrode, and between the first electrode and the second electrode; an intermediate layer enclosing at least one area of the light emitting element, and on the first electrode; a connection line electrically connected to the second electrode. The second electrode may be on the intermediate layer.
    Type: Grant
    Filed: May 30, 2019
    Date of Patent: March 19, 2024
    Assignee: Samsung Display Co., Ltd.
    Inventors: Dong Uk Kim, Jin Oh Kwag, Keun Kyu Song, Sung-Chan Jo, Hyun Min Cho
  • Publication number: 20240088198
    Abstract: A display device comprises a first electrode, a second electrode disposed to be spaced apart from the first electrode and face the first electrode, a first insulating layer disposed to cover the first electrode and the second electrode, a second insulating layer disposed on at least a part of the first insulating layer and exposing at a part of a region where the first electrode and the second electrode overlaps the first insulating layer and at least one light emitting element on the exposed first insulating layer between the first electrode and the second electrode, wherein the second insulating layer includes at least one opening exposing the first insulating layer and disposed to be spaced apart from each other on a region where the first electrode and the second electrode face each other, and a bridge portion between the openings, and the light emitting element is disposed on the opening.
    Type: Application
    Filed: November 13, 2023
    Publication date: March 14, 2024
    Inventors: Hyun Min CHO, Dae Hyun KIM, Jin Oh KWAG, Dong Hyun KIM, Keun Kyu SONG, Hyun Deok IM, Sung Chan JO
  • Publication number: 20090250116
    Abstract: An apparatus for controlling a flow rate of fluid passing through a duct (10) includes a wedge (12) to produce a resistance against a flow of the fluid; pressure sensors (20-1, 20-2), to detect an inflow pressure and an outflow pressure at the upstream and the downstream of the duct (10), respectively, a flow rate controller (22) for measuring a flow rate corresponding to a differential pressure between the inflow and the outflow pressures, comparing the measured flow rate with a predetermined flow rate to regulate an opening angle at an outflow side of the duct (10) using a calculated opening angle, wherein the calculated opening angle being corresponded to a deviation of flow rate between the measured flow rate and the predetermined flow rate; and an error detector (28) for detecting an improper increase of the differential pressure to correctly adjust the opening angle regulated by the flow rate controller.
    Type: Application
    Filed: October 2, 2006
    Publication date: October 8, 2009
    Inventors: Sa-Mun Hong, Bo-Hyeok Chung, Chan-Kyoung Park, Choul-Su An, Beom-Oui Lee, Yun-Seok Oh, Sang-Yeoul Hwang, Hyun-Chan Cho
  • Publication number: 20070295063
    Abstract: A method for manufacturing a semiconductor and an apparatus for measuring slurry quality. The apparatus includes a plurality of slurry supply devices, a plurality of semiconductor processing devices, and an in-line monitoring system. The slurry supply devices have slurry supply lines. The semiconductor processing devices receive slurry from each of the slurry supply devices through the slurry supplying lines to perform semiconductor processing. The in-line monitoring system includes a plurality of sampling lines diverging from the plurality of slurry supplying lines. The particle sizes of the slurry are measured through each of the sampling lines. The monitoring system maintains the slurry quality in real time to increase yield from CMP (chemical-mechanical polishing).
    Type: Application
    Filed: June 26, 2007
    Publication date: December 27, 2007
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Hyun-Chan CHO, Sang-Gon LEE, Sang-Yeoul HWANG