Patents by Inventor Hyun-Cheol Kim

Hyun-Cheol Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6373178
    Abstract: Electron gun for a color CRT having main lens forming electrodes wherein a depth from a rim portion of an anode to an electrostatic field control electrode is deeper than the depth from the rim portion of a cathode to the electrostatic field control electrode, and a DQ lens action of a center beam portion formed by the DQ lens unit being weaker than the DQ lens action of an outer electron beam portion, whereby reducing a spot diameter by enlarging a main lens diameter and correcting inconsistency between a center beam and an outer beam in the DQ lens.
    Type: Grant
    Filed: January 12, 2000
    Date of Patent: April 16, 2002
    Assignee: LG Electronics Inc.
    Inventors: Sung Ho Cho, Hyun Cheol Kim, Won Hyun Kim, Gill Young Jung, Ki Bog Son, Tae Kyu Kim, Dong Young Kim
  • Publication number: 20020021077
    Abstract: There is provided an electron gun for a cathode-ray tube, comprising a triode having a control electrode and an accelerating electrode for controlling the amount of electron beams emitted from a plurality of cathodes and accelerating the electron beams, a front focusing lens part configured of a plurality of electrodes focusing and accelerating a predetermined amount of the electron beams, and a main lens part configured of a plurality of electrodes for focusing the electron beams on a screen, in which the diameter of beam passage hole of the accelerating electrode of the triode corresponds to 140-220% of that of the control electrode. The thickness of the control electrode corresponds to 20-30% of the diameter of beam passage hole of the control electrode, and the distance between the control electrode and the accelerating electrode corresponds to 40-80% of the beam passage hole diameter of the control electrode.
    Type: Application
    Filed: June 12, 2001
    Publication date: February 21, 2002
    Inventors: Tae-Kyu Kim, Hyun-Cheol Kim
  • Publication number: 20020008738
    Abstract: A bubble-jet type ink-jet printhead, and a manufacturing method thereof are provided, wherein, the printhead includes a substrate integrally having an ink supply manifold, an ink chamber, and an ink channel, a nozzle plate having a nozzle, a heater consisting of resistive heating elements, and an electrode for applying current to the heater. In particular, the ink chamber is formed in a substantially hemispherical shape on a surface of the substrate, a manifold is formed from its bottom side toward the ink chamber, and the ink channel linking the manifold and the ink chamber is formed at the bottom of the ink chamber. Thus, this simplifies the manufacturing process and facilitates high integration and high volume production. Furthermore, a doughnut-shaped bubble is formed to eject ink in the printhead, thereby preventing a back flow of ink as well as formation of satellite droplets that may degrade image resolution.
    Type: Application
    Filed: July 18, 2001
    Publication date: January 24, 2002
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Chang-seung Lee, Kyoung-won Na, Sang-wook Lee, Hyun-cheol Kim, Yong-soo Oh
  • Publication number: 20010055048
    Abstract: A bubble-jet type ink-jet printhead, a manufacturing method thereof and a method of ejecting ink, wherein, in the printhead, a manifold supplying ink, a hemispherical ink chamber, and an ink channel for connecting the manifold with the ink chamber are integrally formed on the substrate. A nozzle plate on the substrate having a nozzle, and a heater formed in an annular shape and centered around the nozzle are integrated without a complex process such as bonding. Thus, this simplifies the manufacturing process and facilitates high volume production. Furthermore, according to the ink ejection method, a doughnut-shaped bubble is formed to eject ink, thereby preventing a back flow of ink as well as formation of satellite droplets that may degrade image resolution.
    Type: Application
    Filed: April 26, 2001
    Publication date: December 27, 2001
    Inventors: Sang-Wook Lee, Hyun-Cheol Kim, Yong-Soo Oh
  • Publication number: 20010028378
    Abstract: A monolithic nozzle assembly for fluid, and a method for manufacturing the same with a single mono-crystalline silicon wafer by continuous self-alignment are provided. The monolithic nozzle assembly can be formed with a single (100) monocrystalline silicon wafer. Compared with a complicated nozzle assembly formed using a great number of silicon wafers and plates, the configuration of the monolithic nozzle assembly is simple, and can be manufactured on a mass production scale by semiconductor manufacturing processes. The monolithic nozzle assembly can be manufactured by continuous self-alignment, including anisotropic etching using the characteristic of the crystal plane of silicon, and LOCOS-based masking. Compared with a common photolithography process, the alignment error may be reduced below a few microns. The overall manufacturing process is simple and efficient with a high yield.
    Type: Application
    Filed: February 23, 2001
    Publication date: October 11, 2001
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Eun-sung Lee, Hyun-cheol Kim, Yong-soo Oh, Cimoo Song
  • Patent number: 6094004
    Abstract: Focusing electrode in an electron gun for a color cathode ray tube, is disclosed, which can reduce a man-power and a number of components in a fabrication of the electron gun and can prevent a center electron beam from being elongated horizontally depending on a fitted depth of an inner guide electrode, the focusing electrode including a first focusing electrode adapted to be applied of a low static voltage and having a face with three vertically elongated electron beam pass-through holes of a key hole type and an inner guide electrode with three electron beam passthrough holes disposed at an inner side of the face, and a second focusing electrode adapted to be applied of a high dynamic voltage and having correcting electrodes unitary with a face of the second focusing electrode opposite to the first focusing electrode formed in a cathode direction at upper and lower sides of each of the three electron beam pass-through holes, whereby facilitating changes of center and side powers of the dynamic quadrupole le
    Type: Grant
    Filed: April 1, 1998
    Date of Patent: July 25, 2000
    Assignee: LG Electronics Inc.
    Inventors: Youn Jin Kim, Hyun Cheol Kim, Sung Gi An, Sung Ho Cho
  • Patent number: 6051920
    Abstract: A focusing electrode in an electron gun for a color cathode ray tube comprises: a first focusing electrode including one end with vertical plate electrodes projected toward cathodes in three vertically elongated electron beam through holes, and an inner electrode having three electron beam through holes disposed therein, adapted to be applied of a static voltage; and a second focusing electrode including horizontal plate electrodes respectively formed at upper and lower sides of three electron beam through holes inserted into the vertically elongated electron beam through holes in the first focussing electrode, adapted to be applied of a dynamic voltage synchronous to a deflection of the electron beams, wherein a dynamic quadrupole lens is formed among the vertical plate electrodes, the horizontal plate electrodes, and the inner electrode when applying the dynamic voltage to the second focusing electrode, and the intensity of the dynamic quadrupole lens can be controlled by controlling the depth of the inner
    Type: Grant
    Filed: February 25, 1998
    Date of Patent: April 18, 2000
    Assignee: LG Electronics Inc.
    Inventors: Hyun Cheol Kim, Ki Bog Son
  • Patent number: 5994851
    Abstract: In a focusing electrode system in an electron gun for a color cathode ray tube, distortion of an electron beam, that takes place when horizontal and vertical diameters of a main focusing lens are different is corrected by adjusting power of a dynamic four polar lens. The system includes a first focusing electrode adapted to have applied a static voltage, and a second focusing electrode adapted to have applied a dynamic voltage synchronous to a deflection of electron beams. The second focusing electrode includes, one end having a burring part on a circumference of each of three electron beam pass-through holes at upper and lower portions thereof. A size of the burring part of the electron beam pass-through hole at a center thereof is different from a size of the burring part on each of the electron beam pass-through holes at outer portions thereof.
    Type: Grant
    Filed: November 6, 1997
    Date of Patent: November 30, 1999
    Assignee: LG Electronics, Inc.
    Inventor: Hyun Cheol Kim
  • Patent number: 5994827
    Abstract: A focusing electrode in an electron gun for a color cathode ray tube or high definition industrial picture tube includes a first and second focusing electrodes. A recess portion in one end of the first focusing electrode is oriented to face burring parts of the second focusing electrode. An electron beam and a surrounding portion pass through holes in the first focusing electrode to reduce the space between the first and second focusing electrodes. This improves the static convergence drift.
    Type: Grant
    Filed: October 21, 1997
    Date of Patent: November 30, 1999
    Assignee: LG Electronics Inc.
    Inventors: Hyun Cheol Kim, Gyeong Sang Lee, Sung Gi An
  • Patent number: 5869925
    Abstract: A Focusing electrode in an electron gun for a color cathode ray tube provides a higher degree of freedom in electron gun design and reduces errors during assembly of the electron gun. A first focusing electrode that receives a constant voltage has vertically elongated electron beam pass-through holes formed in it. A second focusing electrode that receives a dynamic voltage has electron beam pass-through holes that include a pair of burring parts formed on their upper and lower edges. The burring parts are disposed in each of the vertically elongated electron beam pass-through holes in the first focusing electrode without changing a horizontal diameter of the electron beam pass-through holes in the first focusing electrode.
    Type: Grant
    Filed: April 8, 1997
    Date of Patent: February 9, 1999
    Assignee: LG Electronics, Inc.
    Inventors: Hyun Cheol Kim, Won Hyun Kim, Sung Gi An, Hi Won Yoon, Sung Ho Cho
  • Patent number: 5302776
    Abstract: A method of automatically generating accompaniment chords in an electronic musical instrument system, whereby, as a melody is advanced, corresponding accompaniment chords can automatically be generated. The method comprises the steps of inputting the key of the tune to be played, drawing up fundamental chords to be used in the play tune according to the input tune key, inputting melody notes, comparing the input melody notes with the notes constituting the fundamental chords to select the highest priority one among the fundamental chords, and outputting the selected highest priority chord, together with the melody notes.
    Type: Grant
    Filed: May 27, 1992
    Date of Patent: April 12, 1994
    Assignee: Gold Star Co., Ltd.
    Inventors: Ik Beom Jeon, Tae Jhin Shin, Hyun Cheol Kim