Patents by Inventor Hyun Chul Lee

Hyun Chul Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12282068
    Abstract: A lithium precipitation detecting apparatus according to an embodiment of the present disclosure includes a measuring unit configured to calculate a charge amount of a battery in a charging process and calculate a discharge amount of the battery in a discharging process; and a control unit configured to estimate a state of charge (SOC) of the battery in the charging process and the discharging process and determine whether lithium precipitation occurs in the battery based on the estimated SOC, the charge amount and the discharge amount.
    Type: Grant
    Filed: April 1, 2022
    Date of Patent: April 22, 2025
    Assignee: LG ENERGY SOLUTION, LTD.
    Inventors: Seung-Hyun Kim, Hyun-Chul Lee, Dong-Keun Kwon, An-Soo Kim, Chae-Bin Shin
  • Patent number: 12280325
    Abstract: A porous composite structure including a substrate including a plurality of nanostructures; a particle layer disposed on a surface of the substrate; and a liquid, a method of preparing the porous composite structure, an article including the porous composite structure, and an air purifier including the porous composite structure.
    Type: Grant
    Filed: May 23, 2022
    Date of Patent: April 22, 2025
    Assignees: SAMSUNG ELECTRONICS CO., LTD., POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION
    Inventors: Hyoungwoo Choi, Hyomin Lee, Min Ryu, Jinkyu Kang, Joonseon Jeong, Dongwook Kim, Daehoon Park, Hyun Chul Lee
  • Publication number: 20250125063
    Abstract: Disclosed is an apparatus for reducing floating radioactive material in a containment building capable of reducing radioactive material in the event of a major accident in a containment building such as a nuclear power plant. A radioactive material reduction unit configured to reduce radioactive material in the air is provided upstream of a flow induction unit configured to induce an air flow through catalytic reaction with hydrogen in the air in the event of a major accident. The flow induction unit may have a replaceable modular form. The radioactive material reduction unit may include an adsorber module configured to remove gaseous radioactive material, such as iodine or an iodine compound. The adsorber module may have a replaceable modular form. In addition, the radioactive material reduction unit may further include an aerosol filter fixed to an inlet to remove particulate radioactive material.
    Type: Application
    Filed: December 25, 2023
    Publication date: April 17, 2025
    Applicant: FNC TECHNOLOGY CO., LTD.
    Inventors: Hyun Chul LEE, Min Beom HEO, Jung Jin BANG, Ki Wan JANG, Doo Yong LEE, Jae Seon CHO
  • Publication number: 20250044364
    Abstract: A battery state of charge estimating apparatus according to an embodiment of the present disclosure includes a charging and discharging unit for receiving a control signal including a C-rate and for charging and discharging a battery at the C-rate included in the control signal; a measuring unit for measuring a voltage of the battery in a charging and discharging process of the battery; and a control unit for transmitting the control signal to the charging and discharging unit, changing the C-rate included in the control signal whenever the voltage value measured by the measuring unit reaches a preset threshold value, and estimating SOC of the battery based on the result of comparing the changed C-rate with a preset cutoff value.
    Type: Application
    Filed: January 26, 2023
    Publication date: February 6, 2025
    Applicant: LG ENERGY SOLUTION, LTD.
    Inventors: Seung-Hyun KIM, Hyun-Chul LEE, Dong-Keun KWON, An-Soo KIM, Chae-Bin SHIN
  • Publication number: 20250044360
    Abstract: A battery state estimating apparatus and method that adds system noise to a recursive filter and corrects parameters used in an extended Kalman filter in consideration of an offset and variance of a current sensor and a voltage sensor.
    Type: Application
    Filed: December 21, 2022
    Publication date: February 6, 2025
    Applicant: LG ENERGY SOLUTION, LTD.
    Inventors: An-Soo KIM, Dong-Keun KWON, Seung-Hyun KIM, Chae-Bin SHIN, Hyun-Chul LEE
  • Patent number: 12207423
    Abstract: A display device includes a display module, a first support film disposed under the display module, a second support film disposed under the first support film, a plurality of first support bars disposed on a lower surface of the first support film between the first support film and the second support film, and a plurality of second support bars disposed on an upper surface of the second support film between the first support film and the second support film. The plurality of first support bars and the plurality of second support bars are alternately arranged.
    Type: Grant
    Filed: June 18, 2020
    Date of Patent: January 21, 2025
    Assignees: SAMSUNG DISPLAY CO., LTD., INNO6 INC.
    Inventors: Hyun Chul Lee, Jeongho Kim, Hyungsik Kim
  • Publication number: 20250010257
    Abstract: A process apparatus includes a gas supplier which supplies a reaction gas having a constant concentration, and a processor which performs a predetermined process by the reaction gas supplied from the gas supplier, where the gas supplier includes a reactor which accommodates a solid phase reactant, a heater which applies heat to the solid phase reactant to convert the solid phase reactant to a reaction gas in a gas phase, a gas pump which applies a predetermined pumping pressure to the reactor, and a gas outlet which discharges the reaction gas to the processor.
    Type: Application
    Filed: September 25, 2024
    Publication date: January 9, 2025
    Inventors: Dongsik Yang, Hyukjae Kwon, Minseok Koo, Sukeun Kuk, Sehyeong Oh, Hyun Chul Lee, Sangmin Ji
  • Publication number: 20250015625
    Abstract: Disclosed is an apparatus and method for managing an Open Circuit Voltage (OCV)-State Of Charge (SOC) profile of a battery. The apparatus according to the present disclosure includes a storage means to store a plurality of OCV-SOC profiles having an overlapping zone in which the OCV-SOC profiles overlap in a predetermined SOC range; and a control means coupled to the storage means. The control means is configured to calculate a partial capacity of the battery in the SOC range of the overlapping zone during charging or discharging of the battery, determine a reduction ratio of the current partial capacity to the partial capacity of the battery at Beginning Of Life (BOL), select the OCV-SOC profile corresponding to the reduction ratio among the plurality of OCV-SOC profiles, change the current OCV-SOC profile to the selected OCV-SOC profile, and control the charge or discharge of the battery using the changed OCV-SOC profile.
    Type: Application
    Filed: November 2, 2022
    Publication date: January 9, 2025
    Applicant: LG ENERGY SOLUTION, LTD.
    Inventors: Hyun-Chul Lee, Seung-Hyun KIM, An-soo KIM, Chae-Bin SHIN
  • Patent number: 12128395
    Abstract: A process apparatus includes a gas supplier which supplies a reaction gas having a constant concentration, and a processor which performs a predetermined process by the reaction gas supplied from the gas supplier, where the gas supplier includes a reactor which accommodates a solid phase reactant, a heater which applies heat to the solid phase reactant to convert the solid phase reactant to a reaction gas in a gas phase, a gas pump which applies a predetermined pumping pressure to the reactor, and a gas outlet which discharges the reaction gas to the processor.
    Type: Grant
    Filed: August 25, 2021
    Date of Patent: October 29, 2024
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Dongsik Yang, Hyukjae Kwon, Minseok Koo, Sukeun Kuk, Sehyeong Oh, Hyun Chul Lee, Sangmin Ji
  • Patent number: 12107052
    Abstract: An overlay mark forming a Moire pattern, an overlay measurement method using the overlay mark, an overlay measurement apparatus using the overlay mark, and a manufacturing method of a semiconductor device using the overlay mark are provided. The overlay mark for measuring an overlay based on an image is configured to determine a relative misalignment between at least two pattern layers. The overlay mark includes a first overlay mark including a pair of first grating patterns which has a first pitch along a first direction and which is rotationally symmetrical by 180 degrees, and includes a second overlay mark including a pair of second grating patterns and a pair of third grating patterns. The second grating patterns partially overlap the first grating patterns and are rotationally symmetrical by 180 degrees, and the third grating patterns partially overlap the first grating patterns and are rotationally symmetrical by 180 degrees.
    Type: Grant
    Filed: May 4, 2023
    Date of Patent: October 1, 2024
    Assignee: AUROS TECHNOLOGY, INC.
    Inventors: Hyun Chul Lee, Hyun Jin Chang
  • Publication number: 20240299882
    Abstract: A filtering system includes: a catalyst filter including a filter frame including a first surface and a second surface opposite to the first surface, and a photocatalyst layer provided on the second surface of the filter frame; a light source unit configured to irradiate light for activating the photocatalyst layer; and a plurality of waveguides inserted into at least some of a plurality of channels, respectively, to increase light transmission into the at least some of the plurality of channels of the catalyst filter.
    Type: Application
    Filed: September 9, 2023
    Publication date: September 12, 2024
    Inventors: Min Seok Koo, Jawon Kim, Jongkyu Kim, Hyun Chul Lee, Hyukjae Kwon, Sangmin Ji
  • Patent number: 12067474
    Abstract: A method implemented by one or more computing systems includes accessing a first data matrix including a plurality of row data and a plurality of column data. The method further includes providing, to a first generative adversarial network (GAN), a first data input including a plurality of row vectors corresponding to the plurality of row data, and providing, to a second GAN, a second data input including a plurality of column vectors corresponding to the plurality of column data. The method further includes generating, by simultaneous co-clustering the plurality of row vectors and the plurality of column vectors by the first GAN and the second GAN, a co-clustered correlation matrix based on the plurality of row vectors and the plurality of column vectors. The method further includes the co-clustered correlation matrix includes co-clustered associations between the plurality of row data and the plurality of column data.
    Type: Grant
    Filed: September 24, 2020
    Date of Patent: August 20, 2024
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hyun Chul Lee, Jaejun Lee, Tomasz Jan Palczewski
  • Patent number: 12064536
    Abstract: A photocatalyst for air purification, a photocatalyst film including the photocatalyst, and an air purification device including the photocatalyst. The photocatalyst for air purification includes: a first metal oxide particle having ultraviolet absorptivity, and fluorine bound to a surface of the first metal oxide particle; second metal oxide particles present on the surface of the first metal oxide particle. The use of the photocatalyst for air purification to remove or degrade volatile organic compounds (VOCs) and viruses.
    Type: Grant
    Filed: July 19, 2021
    Date of Patent: August 20, 2024
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Minseok Koo, Hyukjae Kwon, Hyun Chul Lee, Sukeun Kuk, Dongsik Yang, Sehyeong Oh, Sangmin Ji
  • Publication number: 20240271805
    Abstract: A composite catalyst filter includes a porous filter substrate, and particles of at least one type of catalyst on a surface of the porous filter substrate. The particles of the catalyst include particles of a photocatalyst, and particles of at least one type of adsorbent and oxidation catalyst.
    Type: Application
    Filed: August 10, 2023
    Publication date: August 15, 2024
    Inventors: Hyeonsu HEO, Jongmin LEE, Wooyul KIM, Hyun Chul LEE, Cheolwoo PARK, Gahye SHIN
  • Patent number: 12055320
    Abstract: An outdoor air cleaning system includes a partition surrounding a purification space to isolate the purification space from an external space and having at least one opening connecting the purification space to the external space, an air purifying device configured to supply purified air to the purification space, and a controller configured to control the air purifying device. An openness level defined as an area ratio of the opening with respect to a surface area of the partition is about 10% or more and about 50% or less.
    Type: Grant
    Filed: December 2, 2020
    Date of Patent: August 6, 2024
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hyukjae Kwon, Taeksoo Kim, Hyun Chul Lee, Joonseon Jeong, Inhyuock Cho, Sangmin Ji, Jaeseung Han, Jinkyu Kang, Ilhwan Kim, Kitae Park, Seokwhan Chung, Hyoungwoo Choi
  • Publication number: 20240235560
    Abstract: A clock generation circuit includes a control clock generation circuit and first and second clock synchronization circuits. The control clock generation circuit compares a reference voltage with first and second feedback clock signals to generate first and second control clock signals. The first clock synchronization circuit makes the first and second feedback clock signals transit in synchronization with the first and second control clock signals. The second clock synchronization circuit generates first and second phase clock signals in synchronization with the first feedback clock signal and the second feedback clock signal.
    Type: Application
    Filed: March 25, 2024
    Publication date: July 11, 2024
    Applicant: SK hynix Inc.
    Inventor: Hyun Chul LEE
  • Patent number: 12021040
    Abstract: An overlay mark, an overlay measurement method using the same, and a manufacturing method of a semiconductor device using the same are provided. The overlay mark is for measuring an overlay based on an image, is configured to determine a relative misalignment between at least two pattern layers, and includes first to fourth overlay marks. The first overlay mark has a pair of first Moire patterns disposed on a center portion of the overlay mark. The second overlay mark has a pair of second Moire patterns disposed so as to face each other with the first Moire patterns interposed therebetween. The third overlay mark has a pair of third Moire patterns disposed on a first diagonal line with the first Moire patterns interposed therebetween. The fourth overlay mark has a pair of fourth Moire patterns disposed on a second diagonal line with the first Moire patterns interposed therebetween.
    Type: Grant
    Filed: May 9, 2023
    Date of Patent: June 25, 2024
    Assignee: AUROS TECHNOLOGY, INC.
    Inventors: Hyun Chul Lee, Hyun Jin Chang, Sung Hoon Hong, Young Je Woo
  • Patent number: 12016982
    Abstract: A filter and a filter system including the filter. The filter includes a porous filter frame having a first upstream-side surface, and a second downstream-side surface based on a thickness direction, the porous filter frame filtering particulate matter. A copper material layer is disposed on at least a portion of the first upstream-side surface of the filter frame.
    Type: Grant
    Filed: July 8, 2021
    Date of Patent: June 25, 2024
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Hyukjae Kwon, Minseok Koo, Hyun Chul Lee, Sukeun Kuk, Dongsik Yang, Sehyeong Oh, Inhyuock Cho, Sangmin Ji
  • Publication number: 20240173710
    Abstract: A p-n heterojunction photocatalyst, an air purifier including the p-n heterojunction photocatalyst, and a method of preparing the p-n heterojunction photocatalyst. The p-n heterojunction photocatalyst includes a granule type composite which includes: first compound particles; and second compound particles on at least a portion of surfaces of the first compound particles, wherein the composite has a size of about 0.9 ?m to about 5 ?m based on a major axis, a standard deviation of the size is about ±0.9 ?m or less, and upon exposure to energy irradiation, the composite generates a reactive oxygen species of singlet oxygen (1O2) to induce photolysis of gaseous pollutants.
    Type: Application
    Filed: May 18, 2023
    Publication date: May 30, 2024
    Inventors: Su Keun KUK, Hyun Chul LEE, Sang Min JI, Sungwoo KANG, Dong Sik YANG
  • Publication number: 20240136300
    Abstract: An overlay mark forming a Moire pattern, an overlay measurement method using the overlay mark, an overlay measurement apparatus using the overlay mark, and a manufacturing method of a semiconductor device using the overlay mark are provided. The overlay mark for measuring an overlay based on an image is configured to determine a relative misalignment between at least two pattern layers. The overlay mark includes a first overlay mark including a pair of first grating patterns which has a first pitch along a first direction and which is rotationally symmetrical by 180 degrees, and includes a second overlay mark including a pair of second grating patterns and a pair of third grating patterns. The second grating patterns partially overlap the first grating patterns and are rotationally symmetrical by 180 degrees, and the third grating patterns partially overlap the first grating patterns and are rotationally symmetrical by 180 degrees.
    Type: Application
    Filed: May 4, 2023
    Publication date: April 25, 2024
    Inventors: Hyun Chul LEE, Hyun Jin CHANG