Patents by Inventor Hyun Churl Kim

Hyun Churl Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of crystallizing an amorphous silicon layer
    Patent number: 6312979
    Abstract: The present invention relates to a method of crystallizing an amorphous silicon layer which is carried out by depositing a crystallization-inducing substance on an amorphous silicon layer on crystallizing the amorphous silicon layer by metal-induced crystallization whereby speed of crystallizing silicon is increased and metal contamination by MIC is reduced. The present invention includes the steps of depositing a crystallizing-induced layer of an induced substance for crystallizing silicon on an amorphous silicon layer wherein the crystallizing induced layer is formed to the thickness under 0.03 angstroms, and treating thermally the amorphous silicon layer on which the crystallizing-induced layer is deposited.
    Type: Grant
    Filed: April 27, 1999
    Date of Patent: November 6, 2001
    Assignees: LG.Philips LCD Co., Ltd.
    Inventors: Jin Jang, Soo Young Yoon, Hyun Churl Kim