Abstract: An elastic member according to an embodiment is an elastic member including a first region and a second region, wherein the elastic member has surface roughness having a longitudinal direction, the first region is defined as a folding region, the second region is defined as an unfolding region, a first pattern part having a long direction and a short direction is formed in the first region of the elastic member, and the long direction of the first pattern part is different from the longitudinal direction of the surface roughness.

Abstract: The present disclosure relates to an image encoding/decoding method for a machine and a device therefor. An image encoding method according to the present disclosure includes extracting an encoding method feature from an encoding input signal; determining an encoding method that is optimal for the encoding input signal based on the encoding method feature; transforming the encoding input signal based on the encoding method; and encoding an encoding target signal generated by transforming encoding method information and the encoding input signal.

Abstract: The present invention relates to an etching device and an etching method thereof, the etching device comprising: an etchant supply unit for supplying an etchant to an etching chamber, a rinsing liquid supply unit for supplying a rinsing liquid to the etching chamber; a cleaning liquid supply unit for supplying a cleaning liquid to the etching chamber; and a first pressurization maintaining unit for maintaining at least one of the etching chamber and the etchant supply unit in a pressurized atmosphere.

Abstract: An elastic member according to an embodiment is an elastic member including a first region and a second region, wherein the elastic member has surface roughness having a longitudinal direction, the first region is defined as a folding region, the second region is defined as an unfolding region, a first pattern part having a long direction and a short direction is formed in the first region of the elastic member, and the long direction of the first pattern part is different from the longitudinal direction of the surface roughness.

Abstract: A light route control member according to an embodiment comprises: a first substrate into which light is incident from an external area; a first electrode disposed on the top surface of the first substrate; a second substrate disposed above the first substrate; a second electrode disposed on the bottom surface of the second substrate; and a light conversion unit disposed between the second electrode and the second electrode, wherein the light conversion unit comprises partition wall units and receiving units which are alternately arranged, each of the receiving units has a light transmittance that changes according to the application of voltage, the refractive index of the partition wall units is larger than the refractive index of the external areas, and the difference between the refractive index of the partition wall units and the refractive index of the external areas is 0.3 or higher.

Abstract: The present invention relates to an etching device and an etching method thereof, the etching device comprising: an etchant supply unit for supplying an etchant to an etching chamber; a rinsing liquid supply unit for supplying a rinsing liquid to the etching chamber; a cleaning liquid supply unit for supplying a cleaning liquid to the etching chamber; and a first pressurization maintaining unit for maintaining at least one of the etching chamber and the etchant supply unit in a pressurized atmosphere.

Abstract: The present invention relates to an etching device using an etching chamber, comprising: an etchant storage chamber in which an etchant is stored; a connection unit communicating with the etching liquid storage chamber; an etching chamber which is connected with the etching liquid storage chamber through the connection unit, and in which an object is etched; and a pressurization maintaining unit for maintaining the etching liquid storage chamber and/or the etching chamber in a pressurized atmosphere.

Abstract: The present invention relates to an etching device comprising: an etching chamber; an opening/closing unit for opening/closing the etching chamber; and a locking unit for selectively locking the opening/closing unit.

Abstract: An optical path control member according to an embodiment comprises: a base substrate; a resin layer disposed on the base substrate and including a plurality of engraved parts spaced from each other; and a plurality of pattern parts disposed inside the plurality of engraved parts and spaced from each other, wherein each of the pattern parts comprises a first light shielding layer and a second light shielding layer disposed on the first light shielding layer, the height of the first light shielding layer is higher than the height of the second light shielding layer, and the overall height of each of the pattern parts is less than or equal to the overall height of the engraved parts and greater than or equal to 93% of the height of the engraved parts.