Patents by Inventor Hyun I. Kim

Hyun I. Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10562209
    Abstract: A deposition assembly generally comprises a first deposition apparatus that is configured to receive a substrate, such as a glass mandrel. The first deposition apparatus is further configured to deposit a plurality of first monolayer molecules onto at least a surface of the substrate to generate a first coating structure on the substrate. A second deposition apparatus is coupled to the first deposition apparatus, and wherein the second deposition apparatus is configured to deposit a plurality of second monolayer molecules onto at least the surface of the substrate such that the second monolayer molecules are diffused through the first coating structure and at least one aperture is filled by at least one of the second monolayer molecules to generate at least one mold release layer on at least the surface of the substrate.
    Type: Grant
    Filed: February 4, 2016
    Date of Patent: February 18, 2020
    Assignee: The Aerospace Corporation
    Inventors: Hyun I. Kim, Rafael J. Zaldivar, James M. Helt
  • Publication number: 20200025663
    Abstract: A system includes a curing assembly for low temperature curing and residual stress relief of material substrates. The curing assembly includes a first exposure chamber configured to expose the material substrate to UV radiation, and a second exposure chamber configured to expose the material substrate to Gamma radiation. In some embodiments, a mixing apparatus may mix nano-filler particles into the material substrate prior to exposure to Gamma radiation. The cure assembly may also include a control system for determining exposure dosages and exposure times based at least in part, on the material properties of the material substrate.
    Type: Application
    Filed: July 23, 2018
    Publication date: January 23, 2020
    Inventors: Rafael J. ZALDIVAR, Geena L. FERRELLI, Hyun I. KIM
  • Publication number: 20190167026
    Abstract: A juicer including: a driving part composed of a housing having a housing hollow part formed therein, and having a through-hole through which inner air is discharged at the position eccentric to one side in the width direction from the central portion formed on the bottom portion thereof, and a motor provided the housing hollow part by being surrounded by a motor housing; a juice part connected to the driving part to be driven to squeeze the juice; and a fastening part for detachably coupling the juice part to the driving part.
    Type: Application
    Filed: August 29, 2017
    Publication date: June 6, 2019
    Applicant: ANGEL CO., LTD.
    Inventors: Mun Hyun LEE, Chom Tu I KIM, Mong Ryong LEE, Jin Woo SON, Han Sung YANG, Jeong Su JANG, Seong-hwan PARK, Na Hyun KWON, Eun Hui JI, Min Ji KIM, Hye-Jung PARK
  • Patent number: 10022747
    Abstract: A fabrication assembly comprises an apparatus that receives a composite substrate and a glass substrate having a surface with a release coating layer. A resin layer is deposited between the composite and glass substrates such that a first portion of the resin layer is positioned adjacent to a surface of the composite substrate and a second portion of the resin layer is positioned adjacent to the surface with the release coating layer to prevent aperture(s) from forming. A curing of the resin layer is conducted using electromagnetic radiation. A post-processing chamber receives the resin layer positioned between the composite substrate and the glass substrate and conducts another curing of the resin layer. The resin layer and the composite substrate are released from the glass substrate. Another deposition apparatus receives the resin layer and the composite substrate. A metallic coating is deposited to form a composite mirror object.
    Type: Grant
    Filed: December 18, 2017
    Date of Patent: July 17, 2018
    Assignee: The Aerospace Corporation
    Inventors: Rafael J. Zaldivar, Geena L. Ferrelli, Hyun I. Kim, Dhruv N. Patel
  • Patent number: 9956587
    Abstract: A fabrication assembly comprises an apparatus that receives a composite substrate and a glass substrate having a surface with a release coating layer. A resin layer is deposited between the composite and glass substrates such that a first portion of the resin layer is positioned adjacent to a surface of the composite substrate and a second portion of the resin layer is positioned adjacent to the surface with the release coating layer to prevent aperture(s) from forming. A curing of the resin layer is conducted using electromagnetic radiation. A post-processing chamber receives the resin layer positioned between the composite substrate and the glass substrate and conducts another curing of the resin layer. The resin layer and the composite substrate are released from the glass substrate. Another deposition apparatus receives the resin layer and the composite substrate. A metallic coating is deposited to form a composite mirror object.
    Type: Grant
    Filed: August 29, 2016
    Date of Patent: May 1, 2018
    Assignee: The Aerospace Corporation
    Inventors: Rafael J. Zaldivar, Geena L. Ferrelli, Hyun I. Kim, Dhruv N. Patel
  • Publication number: 20180099310
    Abstract: A fabrication assembly comprises an apparatus that receives a composite substrate and a glass substrate having a surface with a release coating layer. A resin layer is deposited between the composite and glass substrates such that a first portion of the resin layer is positioned adjacent to a surface of the composite substrate and a second portion of the resin layer is positioned adjacent to the surface with the release coating layer to prevent aperture(s) from forming. A curing of the resin layer is conducted using electromagnetic radiation. A post-processing chamber receives the resin layer positioned between the composite substrate and the glass substrate and conducts another curing of the resin layer. The resin layer and the composite substrate are released from the glass substrate. Another deposition apparatus receives the resin layer and the composite substrate. A metallic coating is deposited to form a composite mirror object.
    Type: Application
    Filed: December 18, 2017
    Publication date: April 12, 2018
    Inventors: Rafael J. ZALDIVAR, Geena L. FERRELLI, Hyun I. KIM, Dhruv N. PATEL
  • Publication number: 20180056327
    Abstract: A fabrication assembly comprises an apparatus that receives a composite substrate and a glass substrate having a surface with a release coating layer. A resin layer is deposited between the composite and glass substrates such that a first portion of the resin layer is positioned adjacent to a surface of the composite substrate and a second portion of the resin layer is positioned adjacent to the surface with the release coating layer to prevent aperture(s) from forming. A curing of the resin layer is conducted using electromagnetic radiation. A post-processing chamber receives the resin layer positioned between the composite substrate and the glass substrate and conducts another curing of the resin layer. The resin layer and the composite substrate are released from the glass substrate. Another deposition apparatus receives the resin layer and the composite substrate. A metallic coating is deposited to form a composite mirror object.
    Type: Application
    Filed: August 29, 2016
    Publication date: March 1, 2018
    Inventors: Rafael J. ZALDIVAR, Geena L. FERRELLI, Hyun I. KIM, Dhruv N. PATEL
  • Publication number: 20170225365
    Abstract: A deposition assembly generally comprises a first deposition apparatus that is configured to receive a substrate, such as a glass mandrel. The first deposition apparatus is further configured to deposit a plurality of first monolayer molecules onto at least a surface of the substrate to generate a first coating structure on the substrate. A second deposition apparatus is coupled to the first deposition apparatus, and wherein the second deposition apparatus is configured to deposit a plurality of second monolayer molecules onto at least the surface of the substrate such that the second monolayer molecules are diffused through the first coating structure and at least one aperture is filled by at least one of the second monolayer molecules to generate at least one mold release layer on at least the surface of the substrate.
    Type: Application
    Filed: February 4, 2016
    Publication date: August 10, 2017
    Inventors: Hyun I. Kim, Rafael J. Zaldivar, James M. Helt
  • Patent number: 8916067
    Abstract: A method and composition wherein carbonaceous nano-scaled filler material is subjected to atmospheric plasma treatment using carbon monoxide as the active gas. The treatment with carbon monoxide plasma has been found to significantly increase the incorporation of oxygen groups on the surface of the filler material without degrading the surface and thus serves to increase wettability and dispersion throughout the matrix. The composite that incorporates the treated filler material has enhanced mechanical and electrical properties.
    Type: Grant
    Filed: October 19, 2011
    Date of Patent: December 23, 2014
    Assignee: The Aerospace Corporation
    Inventors: Rafael J. Zaidivar, James P. Nokes, Hyun I. Kim
  • Publication number: 20130099170
    Abstract: A method and composition wherein carbonaceous nano-scaled filler material is subjected to atmospheric plasma treatment using carbon monoxide as the active gas. The treatment with carbon monoxide plasma has been found to significantly increase the incorporation of oxygen groups on the surface of the filler material without degrading the surface and thus serves to increase wettability and dispersion throughout the matrix. The composite that incorporates the treated filler material has enhanced mechanical and electrical properties.
    Type: Application
    Filed: October 19, 2011
    Publication date: April 25, 2013
    Applicant: THE AEROSPACE CORPORATION
    Inventors: RAFAEL J. ZALDIVAR, James P. Nokes, Hyun I. Kim
  • Patent number: 8189981
    Abstract: The invention provides stable lithium niobate waveguides, and systems and methods for making same. In accordance with one aspect of the invention, a waveguide includes a lithium niobate substrate having an upper surface; and a soft proton-exchanged layer embedded within the substrate, the soft proton-exchanged layer formed by exposing the lithium niobate substrate to a proton exchange solution including a proton exchange acid and a lithium salt of the proton exchange acid at a temperature of less than an atmospheric boiling point of the solution, followed by annealing the lithium niobate substrate under a vapor pressure of water preselected to inhibit protons in the substrate from forming water and evaporating from the upper surface of the substrate. The preselected water vapor pressure may be between 0.1 atm and about 0.9 atm, for example, between about 0.4 atm and about 0.6 atm, in one embodiment about 0.47 atm.
    Type: Grant
    Filed: November 23, 2009
    Date of Patent: May 29, 2012
    Assignee: The Aerospace Corporation
    Inventors: Heinrich G. Muller, Hyun I. Kim, Brendan J. Foran
  • Publication number: 20110123163
    Abstract: The invention provides stable lithium niobate waveguides, and systems and methods for making same. In accordance with one aspect of the invention, a waveguide includes a lithium niobate substrate having an upper surface; and a soft proton-exchanged layer embedded within the substrate, the soft proton-exchanged layer formed by exposing the lithium niobate substrate to a proton exchange solution including a proton exchange acid and a lithium salt of the proton exchange acid at a temperature of less than an atmospheric boiling point of the solution, followed by annealing the lithium niobate substrate under a vapor pressure of water preselected to inhibit protons in the substrate from forming water and evaporating from the upper surface of the substrate. The preselected water vapor pressure may be between 0.1 atm and about 0.9 atm, for example, between about 0.4 atm and about 0.6 atm, in one embodiment about 0.47 atm.
    Type: Application
    Filed: November 23, 2009
    Publication date: May 26, 2011
    Inventors: Heinrich G. Muller, Hyun I. Kim, Brendan J. Foran