Abstract: A solar cell includes a base substrate including a first surface and a second surface opposite the first surface, the base substrate being configured to have sunlight incident on the first surface, a doping layer on the first surface of the base substrate, a first passivation layer on the doping layer, the first passivation layer including hydrogen, a first capping layer on the first passivation layer, the first capping layer being configured to prevent discharge of hydrogen from the first passivation layer, a first electrode on the first capping layer, and a second electrode on the second surface of the base substrate.

Abstract: A solar cell including: a semiconductor substrate, a passivation film disposed on a side of the semiconductor substrate, a protective layer disposed on a side of the passivation film opposite the semiconductor substrate, and an electrode disposed on a side of the protective layer opposite the passivation film, wherein the electrode includes a product of a conductive paste including glass frit and a conductive material, and wherein the protective layer includes a material having an absolute value of a Gibb's free energy which is less than an absolute value of a Gibb's free energy of each component of the glass frit.

Abstract: Disclosed is a method and system of preventing browser-based abuse. The method of preventing browser-based abuse may include determining whether an access based on a browser function extension module is a malicious access for acquiring data of an Internet browser, and blocking the access based on the browser function extension module when the access is determined to be a malicious access.

Abstract: Provided is a service quality of experience (QoE) predicting and managing system. The service QoE predicting and managing system may include a media quality measurement system (MQMS) to measure a QoE of media, and a quality of service (QoS)/QoE control system (QCS) to measure QoS parameter information, to predict the QoE based on the measured QoS information, to calculate a QoS parameter adjustment value by comparing and analyzing the QoE measured by the MQMS and the predicted QoE, and to transmit the calculated QoS parameter adjustment value to a service quality control system (SCS).

Abstract: A facility for cleaning substrates such as semiconductor wafers includes a loading/unloading part, an aligning part where wafers are repositioned from a horizontal state to a vertical state, a cleaning part performing etchant-treating, rinsing, and drying processes for wafers and having a plurality of process chamber stacked, and an interface part where a transfer bath is disposed to transfer wafers between the process chambers. When the wafers are transferred between the process chamber, the transfer bath is filled with deionized water (DI water) to prevent their exposure to the air. Wafers drawn out of the loading/unlading part are repositioned from a horizontal state to a vertical state and are transferred to a first process chamber being one of the process chambers to be subjected to a part of processes.

Abstract: The present invention discloses an air-injection type tool for scrubbing off the dirt on a body including: an air-retaining body 2 formed of an elastic material expandable in an air-injection manner, the air-retaining body 2 having a scrubbing towel 40 encompassed on the external surface thereof; a disc-like support body 4 disposed at the inside of the air-retaining body 2 and having a cylindrical coupling protrusion 6 formed at the top central portion thereof, the cylindrical coupling protrusion 6 having a piston A reciprocated therein such that the air generated by the reciprocating motion of the piston A is sent to the air-retaining body 2; and a cover body 12 adapted to be pressurized by a handle 18 screw-coupled with the coupling protrusion 6 of the support body 4 thus to come into close contact with the support body 4 such that the air-retaining body 2 is kept airtight.

Abstract: A solar cell includes a semiconductor substrate including; a p-type layer, and an n-type layer disposed adjacent to the p-type layer, a dielectric layer positioned on one surface of the semiconductor substrate, a protective layer positioned on one surface of the dielectric layer, a first electrode electrically connected to the p-type layer of the semiconductor substrate and a second electrode electrically connected to the n-type layer of the semiconductor substrate.

Abstract: A spin head includes a rotatable plate, first chucking pins and second chucking pins for supporting a edge portion of a substrate loaded on the plate, and a driving unit for selectively driving the first and second chucking pins. The driving unit includes a first magnet connected to the first chucking pin and disposed at a first height, a second magnet connected to the second chucking pin and disposed at a second height, and a driving magnet for driving the first and second magnets. The driving magnet is elevated by means of an elevating member to selectively apply a magnetic force to the first or second magnet and moves in the radius outside direction of the first or second chucking pin due to a magnetic force.

Abstract: A light focusing unit and a spectrum measuring apparatus having the same are provided. The light focusing unit includes a light source section configured to emit light, a light guiding section configured to guide the light emitted from the light source section along multiple parallel light incidence paths, and a light focusing section configured to direct the light from the guiding section to be incident on a test position of a sample at different incidence angles.

Abstract: A substrate treating apparatus includes a substrate support unit with a chuck on which a substrate is loaded; a bottom chamber having an open top and configured to surround the circumference of the chuck; a top chamber configured to open or close the top of the bottom chamber such that the substrate is dried while the top chamber is sealed from the outside; and a direct injection nozzle member installed at the top chamber to inject fluid directly to the substrate while the top of the bottom chamber is closed. According to the substrate treating apparatus, drying efficiency of an entire substrate is enhanced, external contaminants are blocked, and generation of an oxide layer is suppressed.

Abstract: A capacity-variable air conditioner is capable of controlling capacity and consumed electricity in response to operation mode. The refrigerant compression quantity of a compressor is variably adjusted by control of open/close operation modes via selective combination of open/close valves of bypass pipes and bypass valve of the compressor in response to the operation mode. The capacity-variable air conditioner discharges some of the refrigerant infused into the compressor while the bypass valve of the compressor is opened under energy saving operation mode, such that refrigerant circulation quantity can be adjustably reduced under the energy saving operation mode where load of the compressor is less than that of a normal operation mode, thereby enabling a reduction in the capacity and consumed electricity.

Abstract: A heat exchanger of an air conditioner comprising: at least one or more refrigerant inlets for connecting a compressor for compressing refrigerant to an expansion device for expanding condensed refrigerant via a piping and for receiving high temperature/pressure refrigerant coming from the compressor via a four-way valve; at least one or more refrigerant outlets for discharging the refrigerant to the expansion device, wherein the number of the refrigerant outlets is greater than that of the refrigerant inlets, such that same performances can be achieved for both the cooling and heating purposes albeit the heat exchanger being simplified in the structure thereof, and manufacturing cost can be reduced to thereby improve the productivity.

Abstract: The present invention discloses an air-injection type tool for scrubbing off the dirt on a body including: an air-retaining body 2 formed of an elastic material expandable in an air-injection manner, the air-retaining body 2 having a scrubbing towel 40 encompassed on the external surface thereof; a disc-like support body 4 disposed at the inside of the air-retaining body 2 and having a cylindrical coupling protrusion 6 formed at the top central portion thereof, the cylindrical coupling protrusion 6 having a piston A reciprocated therein such that the air generated by the reciprocating motion of the piston A is sent to the air-retaining body 2; and a cover body 12 adapted to be pressurized by a handle 18 screw-coupled with the coupling protrusion 6 of the support body 4 thus to come into close contact with the support body 4 such that the air-retaining body 2 is kept airtight.

Abstract: A substrate treating apparatus includes a substrate support unit with a chuck on which a substrate is loaded; a bottom chamber having an open top and configured to surround the circumference of the chuck; a top chamber configured to open or close the top of the bottom chamber such that the substrate is dried while the top chamber is sealed from the outside; and a direct injection nozzle member installed at the top chamber to inject fluid directly to the substrate while the top of the bottom chamber is closed. According to the substrate treating apparatus, drying efficiency of an entire substrate is enhanced, external contaminants are blocked, and generation of an oxide layer is suppressed.

Abstract: A spin head includes a rotatable plate, first chucking pins and second chucking pins for supporting a edge portion of a substrate loaded on the plate, and a driving unit for selectively driving the first and second chucking pins. The driving unit includes a first magnet connected to the first chucking pin and disposed at a first height, a second magnet connected to the second chucking pin and disposed at a second height, and a driving magnet for driving the first and second magnets. The driving magnet is elevated by means of an elevating member to selectively apply a magnetic force to the first or second magnet and moves in the radius outside direction of the first or second chucking pin due to a magnetic force.

Abstract: A refrigerator, and more particularly, a refrigerator equipped with a machinery chamber door, which is provided to open or close a machinery chamber formed at an upper portion of a body of the refrigerator. The refrigerator includes a body with a storage chamber, and with a machinery chamber provided at an upper portion of the body such that the machinery chamber is partitioned from the storage chamber, an opening portion provided at one side of the machinery chamber, a machinery chamber door hingably coupled to the opening portion such that the machinery chamber door can be rotated up and down to open or close the machinery chamber, a recess member provided to the machinery chamber door and defined with a recess, and an insertion member inserted into the recess and fixed to the body.

Abstract: Provided are an injection head, and a substrate treatment apparatus and method using the same. The substrate treatment apparatus includes a rotatable spin head supporting a substrate, an injection head installed on the spin head to supply a fluid to a bottom surface of the substrate supported on the spin head, and a fluid supply unit supplying the fluid to the injection head.

Abstract: A facility for cleaning substrates such as semiconductor wafers includes a loading/unloading part, an aligning part where wafers are repositioned from a horizontal state to a vertical state, a cleaning part performing etchant-treating, rinsing, and drying processes for wafers and having a plurality of process chamber stacked, and an interface part where a transfer bath is disposed to transfer wafers between the process chambers. When the wafers are transferred between the process chamber, the transfer bath is filled with deionized water (DI water) to prevent their exposure to the air. Wafers drawn out of the loading/unlading part are repositioned from a horizontal state to a vertical state and are transferred to a first process chamber being one of the process chambers to be subjected to a part of processes.

Abstract: A water-treating device having a water jar, a magnetic agitator, an additive container having a bottom plate and a sleeve attached to the bottom plate, and an agitator driver that rotates the magnetic driver. The sleeve of the additive container has an outer wall, an inner wall, and mineral particles filled between the inner wall and the outer wall. The magnetic agitator has a base and a Y-shaped fin that protrudes upward from the base. The magnetic agitator has a magnetic bar between the fin and the base. The base has a shape of a disc having an upper surface and a lower surface, wherein the lower surface is convex. A metal plate is attached to the lower surface. The bottom plate also has a metal plate that contacts the metal plate of the base.