Patents by Inventor Hyun Joon Cho
Hyun Joon Cho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240143114Abstract: A driving circuit includes: a display driver to generate a horizontal synchronization signal and a vertical synchronization signal according to a first clock signal of a first oscillator; a sensor driver to generate a touch signal according to a second clock signal of a second oscillator; and a determination circuit to detect a cycle of at least one of the horizontal synchronization signal or the vertical synchronization signal according to the second clock signal, and output a detection signal when the cycle is out of a range. The determination circuit is a part of the display driver or the sensor driver.Type: ApplicationFiled: June 26, 2023Publication date: May 2, 2024Inventors: Jun Young KO, Tae Hyeon YANG, Han Su CHO, Tae Joon KIM, Hyun Wook CHO, Jae Woo CHOI
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Publication number: 20240108632Abstract: Ophthalmic therapeutic agents having as pharmaceutically active ingredient a poorly water soluble drug of formula 1 are described. Specifically, an ophthalmic formulation containing an inclusion complex of a poorly soluble drug of formula 1 enclosed in cyclodextrin or a cyclodextrin derivative in an aqueous solution of pH 10 or higher is administered to a patient in need of optic nerve protection.Type: ApplicationFiled: April 28, 2023Publication date: April 4, 2024Applicants: PINOTBIO, INC., AJOU UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATIONInventors: Young-joon Park, Sang-won Jeon, Ju-yeong Kim, Jin-soo Lee, Hyun-yong Cho
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Patent number: 11942018Abstract: A display device is described including a display panel for displaying an image and an input sensing unit disposed on the display panel for sensing a user input. The input sensing unit includes: an electrode unit including first electrodes and second electrodes which intersect each other and a control unit for determining the proximity of an object or the shape of the object, based on capacitance change values of the first electrodes and the second electrodes. In a first mode the input sensing unit is driven using a self-capacitance method. The control unit may merge the capacitance change values, and determine the proximity of the object based on the merged value. In a second mode based on mutual capacitance, the control unit may determine the shape of the object.Type: GrantFiled: October 4, 2022Date of Patent: March 26, 2024Assignee: SAMSUNG DISPLAY CO., LTD.Inventors: Jae Woo Choi, Tae Joon Kim, Eun Sol Seo, Hyun Wook Cho
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Patent number: 8143276Abstract: The present invention relates to 4-thio substituted quinoline and naphthyridine derivatives and processes for their preparation. The invention also related to methods for treating infection of Hepatitis C virus by administering a 4-thio substituted quinoline or naphthyridine derivative.Type: GrantFiled: August 22, 2007Date of Patent: March 27, 2012Assignee: XTL Biopharmaceuticals Ltd.Inventors: Zhen Yang, Reza Fathi, Qiang Zhu, Hyun-Joon Cho, Yixin Liu, Anthony Sandrasagra, C. Richard Wobbe
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Patent number: 8048889Abstract: The present invention relates to 3,4-disubstituted coumarin and quinolone derivatives and processes for their preparation. The invention also related to methods for treating infection of Hepatitis C virus by administering a 3,4-disubstituted coumarin or quinolone derivative.Type: GrantFiled: March 29, 2005Date of Patent: November 1, 2011Assignee: XTL Biopharmaceuticals Ltd.Inventors: Bin Xu, Qiang Zhu, Hyun-Joon Cho, Reza Fathi, Zhen Yang, Anthony Sandrasagra, Yixin Liu
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Patent number: 7923004Abstract: Aryl substituted pyrazole derivatives are provided, as well as processes for their preparation. The invention also provides compositions and methods for the treatment of HCV by administering a compound of the present invention, alone or in combination with additional antiviral agents, in a therapeutically effective amount.Type: GrantFiled: October 15, 2007Date of Patent: April 12, 2011Assignee: XTL Biopharmaceuticals Ltd.Inventors: Guolin Li, Reza Fathi, Zhen Yang, Yun Liao, Qiang Zhu, Angela Lam, Anthony Sandrasagra, Kenneth Nawoschik, Hyun-Joon Cho, Jie Cao, Wu Ruoqiu, C. Richard Wobbe, Yixin Liu
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Publication number: 20090054477Abstract: The present invention relates to 4-thio substituted quinoline and naphthyridine derivatives and processes for their preparation. The invention also related to methods for treating infection of Hepatitis C virus by administering a 4-thio substituted quinoline or naphthyridine derivative.Type: ApplicationFiled: August 22, 2007Publication date: February 26, 2009Inventors: Zhen Yang, Reza Fathi, Qiang Zhu, Hyun-Joon Cho, Yixin Liu, Anthony Sandrasagra, C. Richard Wobbe
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Publication number: 20090041723Abstract: Aryl substituted pyrazole derivatives are provided, as well as processes for their preparation. The invention also provides compositions and methods for the treatment of HCV by administering a compound of the present invention, alone or in combination with additional antiviral agents, in a therapeutically effective amount.Type: ApplicationFiled: October 15, 2007Publication date: February 12, 2009Inventors: Guolin Li, Reza Fathi, Zhen Yang, Yun Liao, Qiang Zhu, Angela Man Iu Lam, Anthony Sandrasagra, Kenneth Nawoschik, Hyun-Joon Cho, Jie Cao, Wu Rouqiu, C. Richard Wobbe
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Patent number: 7377984Abstract: Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.Type: GrantFiled: January 18, 2007Date of Patent: May 27, 2008Assignee: PKL Co., Ltd.Inventors: Yong Dae Kim, Jong Min Kim, Han Byul Kang, Hyun Joon Cho, Sang Soo Choi
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Publication number: 20070215181Abstract: Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.Type: ApplicationFiled: January 18, 2007Publication date: September 20, 2007Applicant: PKL CO., LTD.Inventors: Yong Dae KIM, Jong Min KIM, Han Byul KANG, Hyun Joon CHO, Sang Soo CHOI
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Publication number: 20070215188Abstract: Disclosed herein is a device for cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.Type: ApplicationFiled: January 18, 2007Publication date: September 20, 2007Applicant: PKL CO., LTD.Inventors: Yong Dae KIM, Jong Min KIM, Han Byul KANG, Hyun Joon CHO, Sang Soo CHOI
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Patent number: 7186301Abstract: Disclosed herein is a device and a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.Type: GrantFiled: March 20, 2006Date of Patent: March 6, 2007Assignee: PKL Co., Ltd.Inventors: Yong Dae Kim, Jong Min Kim, Han Byul Kang, Hyun Joon Cho, Sang Soo Choi
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Publication number: 20060257752Abstract: Disclosed is a phase shift mask. Residual ions, which are considered a factor of occurrence of haze which is a growth defect of a surface of a photomask during a photolithography step of a wafer process, are controlled in order to change the content of a surface of the phase shift mask. Diffusion of the residual ions into the surface of the mask is suppressed during a photomask wet cleaning process in order to prevent the haze.Type: ApplicationFiled: March 22, 2006Publication date: November 16, 2006Applicant: PKL CO., Ltd.Inventors: Yong Dae Kim, Jong Min Kim, Han Byul Kang, Hyun Joon Cho, Sang Soo Choi
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Publication number: 20060223783Abstract: The present invention relates to 3,4-disubstituted coumarin and quinolone derivatives and processes for their preparation. The invention also related to methods for treating infection of Hepatitis C virus by administering a 3,4-disubstituted coumarin or quinolone derivative.Type: ApplicationFiled: March 29, 2005Publication date: October 5, 2006Inventors: Bin Xu, Qiang Zhu, Hyun-Joon Cho, Reza Fathi, Zhen Yang, Anthony Sandrasagra, Yixin Liu
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Publication number: 20060207633Abstract: Disclosed herein is a device and a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.Type: ApplicationFiled: March 20, 2006Publication date: September 21, 2006Applicant: PKL CO., Ltd.Inventors: Yong Dae KIM, Jong Min KIM, Han Byul KANG, Hyun Joon CHO, Sang Soo CHOI
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Publication number: 20040181961Abstract: A handler for testing semiconductor devices is provided, wherein a soaking plate is fitted on a handler body having temperature control means for heating and/or cooling semiconductor devices placed thereon. Loading/unloading shuttles are movably fitted, such that they can move in a forward/backward direction, for carrying the semiconductor deices to/from a test site, thereby simplifying a handler system and permitting accurate temperature testing under in high or low temperature environments.Type: ApplicationFiled: March 4, 2003Publication date: September 23, 2004Applicant: Mirae CorporationInventors: Ji Hyun Hwang, Gil Ho Bae, Hyun Joo Hwang, Sang Jeon Park, Hyun Joon Cho, Seung Hwan Kim, In Hee Oh, Yon Choul Baek, Young Mi Choi, Sung Hoe Kim, Jae Myeong Song