Patents by Inventor Hyun Joon Cho

Hyun Joon Cho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • 4-thio substituted quinoline and naphthyridine compounds
    Patent number: 8143276
    Abstract: The present invention relates to 4-thio substituted quinoline and naphthyridine derivatives and processes for their preparation. The invention also related to methods for treating infection of Hepatitis C virus by administering a 4-thio substituted quinoline or naphthyridine derivative.
    Type: Grant
    Filed: August 22, 2007
    Date of Patent: March 27, 2012
    Assignee: XTL Biopharmaceuticals Ltd.
    Inventors: Zhen Yang, Reza Fathi, Qiang Zhu, Hyun-Joon Cho, Yixin Liu, Anthony Sandrasagra, C. Richard Wobbe
  • 3,4-disubstituted coumarin and quinolone compounds
    Patent number: 8048889
    Abstract: The present invention relates to 3,4-disubstituted coumarin and quinolone derivatives and processes for their preparation. The invention also related to methods for treating infection of Hepatitis C virus by administering a 3,4-disubstituted coumarin or quinolone derivative.
    Type: Grant
    Filed: March 29, 2005
    Date of Patent: November 1, 2011
    Assignee: XTL Biopharmaceuticals Ltd.
    Inventors: Bin Xu, Qiang Zhu, Hyun-Joon Cho, Reza Fathi, Zhen Yang, Anthony Sandrasagra, Yixin Liu
  • 4-ethynyl pyrazole derivative compounds and methods for treatment of HCV
    Patent number: 7923004
    Abstract: Aryl substituted pyrazole derivatives are provided, as well as processes for their preparation. The invention also provides compositions and methods for the treatment of HCV by administering a compound of the present invention, alone or in combination with additional antiviral agents, in a therapeutically effective amount.
    Type: Grant
    Filed: October 15, 2007
    Date of Patent: April 12, 2011
    Assignee: XTL Biopharmaceuticals Ltd.
    Inventors: Guolin Li, Reza Fathi, Zhen Yang, Yun Liao, Qiang Zhu, Angela Lam, Anthony Sandrasagra, Kenneth Nawoschik, Hyun-Joon Cho, Jie Cao, Wu Ruoqiu, C. Richard Wobbe, Yixin Liu
  • 4-thio substituted quinoline and naphthyridine compounds
    Publication number: 20090054477
    Abstract: The present invention relates to 4-thio substituted quinoline and naphthyridine derivatives and processes for their preparation. The invention also related to methods for treating infection of Hepatitis C virus by administering a 4-thio substituted quinoline or naphthyridine derivative.
    Type: Application
    Filed: August 22, 2007
    Publication date: February 26, 2009
    Inventors: Zhen Yang, Reza Fathi, Qiang Zhu, Hyun-Joon Cho, Yixin Liu, Anthony Sandrasagra, C. Richard Wobbe
  • Compounds and methods for treatment of HCV
    Publication number: 20090041723
    Abstract: Aryl substituted pyrazole derivatives are provided, as well as processes for their preparation. The invention also provides compositions and methods for the treatment of HCV by administering a compound of the present invention, alone or in combination with additional antiviral agents, in a therapeutically effective amount.
    Type: Application
    Filed: October 15, 2007
    Publication date: February 12, 2009
    Inventors: Guolin Li, Reza Fathi, Zhen Yang, Yun Liao, Qiang Zhu, Angela Man Iu Lam, Anthony Sandrasagra, Kenneth Nawoschik, Hyun-Joon Cho, Jie Cao, Wu Rouqiu, C. Richard Wobbe
  • Method for cleaning a photomask
    Patent number: 7377984
    Abstract: Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.
    Type: Grant
    Filed: January 18, 2007
    Date of Patent: May 27, 2008
    Assignee: PKL Co., Ltd.
    Inventors: Yong Dae Kim, Jong Min Kim, Han Byul Kang, Hyun Joon Cho, Sang Soo Choi
  • METHOD FOR CLEANING A PHOTMASK
    Publication number: 20070215181
    Abstract: Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.
    Type: Application
    Filed: January 18, 2007
    Publication date: September 20, 2007
    Applicant: PKL CO., LTD.
    Inventors: Yong Dae KIM, Jong Min KIM, Han Byul KANG, Hyun Joon CHO, Sang Soo CHOI
  • DEVICE FOR CLEANING A PHOTOMASK
    Publication number: 20070215188
    Abstract: Disclosed herein is a device for cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.
    Type: Application
    Filed: January 18, 2007
    Publication date: September 20, 2007
    Applicant: PKL CO., LTD.
    Inventors: Yong Dae KIM, Jong Min KIM, Han Byul KANG, Hyun Joon CHO, Sang Soo CHOI
  • Device and method for cleaning photomask
    Patent number: 7186301
    Abstract: Disclosed herein is a device and a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.
    Type: Grant
    Filed: March 20, 2006
    Date of Patent: March 6, 2007
    Assignee: PKL Co., Ltd.
    Inventors: Yong Dae Kim, Jong Min Kim, Han Byul Kang, Hyun Joon Cho, Sang Soo Choi
  • PHASE SHIFT MASK FOR PREVENTING HAZE
    Publication number: 20060257752
    Abstract: Disclosed is a phase shift mask. Residual ions, which are considered a factor of occurrence of haze which is a growth defect of a surface of a photomask during a photolithography step of a wafer process, are controlled in order to change the content of a surface of the phase shift mask. Diffusion of the residual ions into the surface of the mask is suppressed during a photomask wet cleaning process in order to prevent the haze.
    Type: Application
    Filed: March 22, 2006
    Publication date: November 16, 2006
    Applicant: PKL CO., Ltd.
    Inventors: Yong Dae Kim, Jong Min Kim, Han Byul Kang, Hyun Joon Cho, Sang Soo Choi
  • 3,4-Disubstituted coumarin and quinolone compounds
    Publication number: 20060223783
    Abstract: The present invention relates to 3,4-disubstituted coumarin and quinolone derivatives and processes for their preparation. The invention also related to methods for treating infection of Hepatitis C virus by administering a 3,4-disubstituted coumarin or quinolone derivative.
    Type: Application
    Filed: March 29, 2005
    Publication date: October 5, 2006
    Inventors: Bin Xu, Qiang Zhu, Hyun-Joon Cho, Reza Fathi, Zhen Yang, Anthony Sandrasagra, Yixin Liu
  • DEVICE AND METHOD FOR CLEANING PHOTOMASK
    Publication number: 20060207633
    Abstract: Disclosed herein is a device and a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.
    Type: Application
    Filed: March 20, 2006
    Publication date: September 21, 2006
    Applicant: PKL CO., Ltd.
    Inventors: Yong Dae KIM, Jong Min KIM, Han Byul KANG, Hyun Joon CHO, Sang Soo CHOI
  • Handler for testing semiconductor device
    Publication number: 20040181961
    Abstract: A handler for testing semiconductor devices is provided, wherein a soaking plate is fitted on a handler body having temperature control means for heating and/or cooling semiconductor devices placed thereon. Loading/unloading shuttles are movably fitted, such that they can move in a forward/backward direction, for carrying the semiconductor deices to/from a test site, thereby simplifying a handler system and permitting accurate temperature testing under in high or low temperature environments.
    Type: Application
    Filed: March 4, 2003
    Publication date: September 23, 2004
    Applicant: Mirae Corporation
    Inventors: Ji Hyun Hwang, Gil Ho Bae, Hyun Joo Hwang, Sang Jeon Park, Hyun Joon Cho, Seung Hwan Kim, In Hee Oh, Yon Choul Baek, Young Mi Choi, Sung Hoe Kim, Jae Myeong Song