Abstract: A display device includes pixel circuits disposed in a display area and a driving circuit disposed in the peripheral area. The driving circuit includes a first transistor and each pixel circuit includes a second transistor. The first transistor includes a first active pattern disposed on the substrate, a first gate insulation layer having a first outer portion disposed on the first active pattern, and a first gate electrode disposed on the first gate insulation layer. The second transistor includes a second active pattern disposed on the substrate, a second gate insulation layer having a second outer portion disposed on the second active pattern, and a second gate electrode disposed on the second gate insulation layer. The first outer portion doesn't overlap the first gate electrode and has a first width. The second outer portion doesn't overlap the second gate electrode and has a second width smaller than the first width.

Abstract: A display device includes a substrate, a first conductive layer on the substrate, the first conductive layer including a data signal line, a first insulating layer on the first conductive layer, a semiconductor layer on the first insulating layer, the semiconductor layer including a first semiconductor pattern, a second insulating layer on the semiconductor layer, and a second conductive layer on the second insulating layer, the second conductive layer including a gate electrode disposed to overlap the first semiconductor pattern, a transistor first electrode disposed to overlap a part of the first semiconductor pattern, wherein the transistor first electrode is electrically connected to the data signal line through a contact hole that penetrates the first and second insulating layers, and a transistor second electrode disposed to overlap another part of the first semiconductor pattern.

Abstract: Provided is an ultra-high-voltage direct-current (DC) power cable. Specifically, the present invention relates to an ultra-high-voltage DC power cable capable of simultaneously preventing or minimizing electric field distortion, a decrease in DC dielectric strength, and a decrease in impulse breakdown strength due to accumulation of space charge in an insulator.

Abstract: The present invention relates to a solid colonic purgative for oral application, containing anhydrous magnesium sulfate, potassium sulfate, anhydrous sodium sulfate, and, additionally, simethicone. The present invention is more satisfactory in the colon cleansing effect even with the doses reduced by up to about 20 percent compared to those of a conventional colonic purgative consisting of anhydrous magnesium sulfate, potassium sulfate and anhydrous sodium sulfate. Besides, the present invention, due to the reduced doses, has less unpleasant taste or odor caused by the main ingredients and requires a less intake of the preparation and water, improving drug compliance significantly. Further, unlike the conventional solid colonic purgative, the present invention can be prepared into tablets without using a water-soluble lubricant.

Abstract: The present invention relates to a solid colonic purgative for oral application, containing anhydrous magnesium sulfate, potassium sulfate, anhydrous sodium sulfate, and, additionally, simethicone. The present invention is more satisfactory in the colon cleansing effect even with the doses reduced by up to about 20 percent compared to those of a conventional colonic purgative consisting of anhydrous magnesium sulfate, potassium sulfate and anhydrous sodium sulfate. Besides, the present invention, due to the reduced doses, has less unpleasant taste or odor caused by the main ingredients and requires a less intake of the preparation and water, improving drug compliance significantly. Further, unlike the conventional solid colonic purgative, the present invention can be prepared into tablets without using a water-soluble lubricant.

Abstract: Disclosed are an insulation composition that is capable of simultaneously preventing reductions in volume resistance, direct-current dielectric strength, and dielectric breakdown strength due to accumulation of space charges and in which the extent of extrusion of an insulating layer is not reduced, and a direct-current power cable having an insulating layer formed from the same.

Abstract: Disclosed is an ultra-high-voltage direct-current power cable that is capable of simultaneously preventing or minimizing field enhancement and reductions in high-temperature volume resistance and direct-current dielectric strength due to accumulation of space charges in an insulator.

Abstract: Provided is a direct-current (DC) power cable. Specifically, the present invention relates to a DC power cable capable of preventing both a decrease in DC dielectric strength and a decrease in impulse breakdown strength due to space charge accumulation, and reducing manufacturing costs without lowering the extrudability of an insulating layer and the like.

Abstract: Provided is an insulation composition having a low dielectric constant and a cable including an insulation layer formed of the insulation composition. More particularly, the present invention relates to an insulation composition for reducing a space charge to increase superimposed impulse breakdown strength when impulse voltages overlap during application of a direct-current (DC) voltage, having a low dielectric constant, and improving impulse breakdown strength, and a cable including an insulation layer formed of the insulation composition.

Abstract: Provided is an insulation composition having a low dielectric constant and a cable including an insulation layer formed of the insulation composition. More particularly, the present invention relates to an insulation composition for reducing a space charge to increase superimposed impulse breakdown strength when impulse voltages overlap during application of a direct-current(DC) voltage, having a low dielectric constant, and improving impulse breakdown strength, and a cable including an insulation layer formed of the insulation composition.

Abstract: UV absorbing appliances, such as contact lenses, are prepared by including at least one UV absorbing compound in the appliances. UV absorbing compounds can be water insoluble and/or reside in UV absorbing nanoparticles having a mean diameter less than 10 nm. The UV absorbing nanoparticles incorporate into an appliance by polymerizing a monomer mixture containing the UV absorbing nanoparticles to form an appliance comprising the UV absorbing nanoparticles. The UV absorbing compounds or the UV absorbing nanoparticles incorporate into an appliance by placing the appliance in a solution of the UV absorbing compound or a dispersion of the UV absorbing nanoparticles in a non-aqueous solvent that swells the appliance. The UV absorbing compound or the UV absorbing nanoparticles infuse into the swollen appliance and are retained within the appliance upon removal of the non-aqueous solvent.

Abstract: A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.

Abstract: UV absorbing appliances, such as contact lenses, are prepared by including at least one UV absorbing compound in the appliances. UV absorbing compounds can be water insoluble and/or reside in UV absorbing nanoparticles having a mean diameter less than 10 nm. The UV absorbing nanoparticles incorporate into an appliance by polymerizing a monomer mixture containing the UV absorbing nanoparticles to form an appliance comprising the UV absorbing nanoparticles. The UV absorbing compounds or the UV absorbing nanoparticles incorporate into an appliance by placing the appliance in a solution of the UV absorbing compound or a dispersion of the UV absorbing nanoparticles in a non-aqueous solvent that swells the appliance. The UV absorbing compound or the UV absorbing nanoparticles infuse into the swollen appliance and are retained within the appliance upon removal of the non-aqueous solvent.

Abstract: UV absorbing appliances, such as contact lenses, are prepared by including at least one UV absorbing compound in the appliances. UV absorbing compounds can be water insoluble and/or reside in UV absorbing nanoparticles having a mean diameter less than 10 nm. The UV absorbing nanoparticles incorporate into an appliance by polymerizing a monomer mixture containing the UV absorbing nanoparticles to form an appliance comprising the UV absorbing nanoparticles. The UV absorbing compounds or the UV absorbing nanoparticles incorporate into an appliance by placing the appliance in a solution of the UV absorbing compound or a dispersion of the UV absorbing nanoparticles in a non-aqueous solvent that swells the appliance. The UV absorbing compound or the UV absorbing nanoparticles infuse into the swollen appliance and are retained within the appliance upon removal of the non-aqueous solvent.

Abstract: An apparatus and method for removing a Direct Current (DC) offset at a receiving terminal in a wireless communication system are provided. In the method, a frame is divided into at least two time resource blocks. Resource allocation information is used to discriminate between at least one time resource block of a data-unmapped interval and at least one time resource block of a data-mapped interval. The DC offset is measured during the data-unmapped interval. The DC offset is compensated during the data-unmapped interval on a time resource block basis by using the measured DC offset.

Abstract: A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.

Abstract: A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.

Abstract: An approach is provided for manufacturing a nanostructure. A first thin film including a first block copolymer is formed on a substrate. A guide pattern is formed on the first thin film. A second thin film including a second block copolymer is formed between portions of the guide pattern. The second thin film is cured. The first block copolymer is a cylinder-type and the second block copolymer is a lamella-type.

Abstract: UV absorbing appliances, such as contact lenses, are prepared by including at least one UV absorbing compound in the appliances. UV absorbing compounds can be water insoluble and/or reside in UV absorbing nanoparticles having a mean diameter less than 10 nm. The UV absorbing nanoparticles incorporate into an appliance by polymerizing a monomer mixture containing the UV absorbing nanoparticles to form an appliance comprising the UV absorbing nanoparticles. The UV absorbing compounds or the UV absorbing nanoparticles incorporate into an appliance by placing the appliance in a solution of the UV absorbing compound or a dispersion of the UV absorbing nanoparticles in a non-aqueous solvent that swells the appliance. The UV absorbing compound or the UV absorbing nanoparticles infuse into the swollen appliance and are retained within the appliance upon removal of the non-aqueous solvent.

Abstract: A method of forming patterns includes forming a layer composed of a ketene based random copolymer on a substrate, forming a block copolymer on the ketene based random copolymer layer and patterning the ketene based random copolymer layer by removing a part of the block copolymer and a portion of the ketene based random copolymer layer.