Patents by Inventor Hyun Jung Jung

Hyun Jung Jung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240177888
    Abstract: Disclosed is the present disclosure relates to a marine cable for offshore wind power having an improved water-tree property. More particularly, it relates to a marine cable for offshore wind power, which may effectively suppress formation of water trees caused by diffusion of moisture, having penetrated into cores of the cable, in insulating layers so as to improve dielectric strength and consequently secure a long lifespan.
    Type: Application
    Filed: October 9, 2023
    Publication date: May 30, 2024
    Inventors: Hyun Jung JUNG, Gi Joon NAM, Kyoung Soo KIM, Yi Seul YANG
  • Publication number: 20230377768
    Abstract: Provided is an ultra-high-voltage direct-current (DC) power cable. Specifically, the present invention relates to an ultra-high-voltage DC power cable capable of simultaneously preventing or minimizing electric field distortion, a decrease in DC dielectric strength, and a decrease in impulse breakdown strength due to accumulation of space charge in an insulator.
    Type: Application
    Filed: December 4, 2017
    Publication date: November 23, 2023
    Inventors: Hyun Jung JUNG, Jin Ho NAM, Jung Suk YOO, Yi Seul YANG, Min Sang CHO, Sung Ik HEO
  • Patent number: 11439601
    Abstract: The present invention relates to a solid colonic purgative for oral application, containing anhydrous magnesium sulfate, potassium sulfate, anhydrous sodium sulfate, and, additionally, simethicone. The present invention is more satisfactory in the colon cleansing effect even with the doses reduced by up to about 20 percent compared to those of a conventional colonic purgative consisting of anhydrous magnesium sulfate, potassium sulfate and anhydrous sodium sulfate. Besides, the present invention, due to the reduced doses, has less unpleasant taste or odor caused by the main ingredients and requires a less intake of the preparation and water, improving drug compliance significantly. Further, unlike the conventional solid colonic purgative, the present invention can be prepared into tablets without using a water-soluble lubricant.
    Type: Grant
    Filed: May 27, 2019
    Date of Patent: September 13, 2022
    Assignee: PHARMBIO KOREA CO., LTD.
    Inventors: Hyun Jung Jung, Zong Zhu Piao, Kyung Su Lee, Hwan Hyuk Lee
  • Publication number: 20210251908
    Abstract: The present invention relates to a solid colonic purgative for oral application, containing anhydrous magnesium sulfate, potassium sulfate, anhydrous sodium sulfate, and, additionally, simethicone. The present invention is more satisfactory in the colon cleansing effect even with the doses reduced by up to about 20 percent compared to those of a conventional colonic purgative consisting of anhydrous magnesium sulfate, potassium sulfate and anhydrous sodium sulfate. Besides, the present invention, due to the reduced doses, has less unpleasant taste or odor caused by the main ingredients and requires a less intake of the preparation and water, improving drug compliance significantly. Further, unlike the conventional solid colonic purgative, the present invention can be prepared into tablets without using a water-soluble lubricant.
    Type: Application
    Filed: May 27, 2019
    Publication date: August 19, 2021
    Inventors: Hyun Jung JUNG, Zong Zhu PIAO, Kyung Su LEE, Hwan Hyuk LEE
  • Publication number: 20200185123
    Abstract: Disclosed is an ultra-high-voltage direct-current power cable that is capable of simultaneously preventing or minimizing field enhancement and reductions in high-temperature volume resistance and direct-current dielectric strength due to accumulation of space charges in an insulator.
    Type: Application
    Filed: February 22, 2019
    Publication date: June 11, 2020
    Inventors: Hyun Jung JUNG, Jin Ho NAM, Jung Suk YOO, Yi Seul YANG, Sung IK HEO
  • Publication number: 20200185122
    Abstract: Disclosed are an insulation composition that is capable of simultaneously preventing reductions in volume resistance, direct-current dielectric strength, and dielectric breakdown strength due to accumulation of space charges and in which the extent of extrusion of an insulating layer is not reduced, and a direct-current power cable having an insulating layer formed from the same.
    Type: Application
    Filed: February 22, 2019
    Publication date: June 11, 2020
    Inventors: Yi Seul YANG, Jin Ho NAM, Jung Suk YOO, Hyun Jung JUNG, Sung IK HEO
  • Publication number: 20200143960
    Abstract: Provided is a direct-current (DC) power cable. Specifically, the present invention relates to a DC power cable capable of preventing both a decrease in DC dielectric strength and a decrease in impulse breakdown strength due to space charge accumulation, and reducing manufacturing costs without lowering the extrudability of an insulating layer and the like.
    Type: Application
    Filed: December 7, 2017
    Publication date: May 7, 2020
    Inventors: Hyun Jung JUNG, Jin Ho NAM, Gi Joon NAM, Young Eun CHO
  • Patent number: 10438716
    Abstract: Provided is an insulation composition having a low dielectric constant and a cable including an insulation layer formed of the insulation composition. More particularly, the present invention relates to an insulation composition for reducing a space charge to increase superimposed impulse breakdown strength when impulse voltages overlap during application of a direct-current (DC) voltage, having a low dielectric constant, and improving impulse breakdown strength, and a cable including an insulation layer formed of the insulation composition.
    Type: Grant
    Filed: February 27, 2017
    Date of Patent: October 8, 2019
    Assignee: LS CABLE & SYSTEM LTD.
    Inventors: Jin Ho Nam, Won Suck Lee, Ik Hyun Ryu, Yi Seul Yang, Hyun Jung Jung, Tae Hyun Lee
  • Publication number: 20190080816
    Abstract: Provided is an insulation composition having a low dielectric constant and a cable including an insulation layer formed of the insulation composition. More particularly, the present invention relates to an insulation composition for reducing a space charge to increase superimposed impulse breakdown strength when impulse voltages overlap during application of a direct-current(DC) voltage, having a low dielectric constant, and improving impulse breakdown strength, and a cable including an insulation layer formed of the insulation composition.
    Type: Application
    Filed: February 27, 2017
    Publication date: March 14, 2019
    Inventors: Jin Ho NAM, Won Suck LEE, Ik Hyun RYU, Yi Seul YANG, Hyun Jung JUNG, Tae Hyun LEE
  • Patent number: 9885886
    Abstract: UV absorbing appliances, such as contact lenses, are prepared by including at least one UV absorbing compound in the appliances. UV absorbing compounds can be water insoluble and/or reside in UV absorbing nanoparticles having a mean diameter less than 10 nm. The UV absorbing nanoparticles incorporate into an appliance by polymerizing a monomer mixture containing the UV absorbing nanoparticles to form an appliance comprising the UV absorbing nanoparticles. The UV absorbing compounds or the UV absorbing nanoparticles incorporate into an appliance by placing the appliance in a solution of the UV absorbing compound or a dispersion of the UV absorbing nanoparticles in a non-aqueous solvent that swells the appliance. The UV absorbing compound or the UV absorbing nanoparticles infuse into the swollen appliance and are retained within the appliance upon removal of the non-aqueous solvent.
    Type: Grant
    Filed: March 2, 2017
    Date of Patent: February 6, 2018
    Assignee: UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC.
    Inventors: Anuj Chauhan, Hyun-Jung Jung, Samuel B. Gause
  • Patent number: 9725550
    Abstract: A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.
    Type: Grant
    Filed: December 8, 2015
    Date of Patent: August 8, 2017
    Assignees: Samsung Display Co., Ltd., KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION, SOGANG UNIVERSITY RESEARCH FOUNDATION
    Inventors: Min Hyuck Kang, Su Mi Lee, Myung Im Kim, Tae Woo Kim, Seung-Won Park, Xie Lei, Na Na Kang, Bong-Jin Moon, Joona Bang, Sang Hoon Woo, Jin Yeong Lee, Hyun Jung Jung, June Huh
  • Publication number: 20170212365
    Abstract: UV absorbing appliances, such as contact lenses, are prepared by including at least one UV absorbing compound in the appliances. UV absorbing compounds can be water insoluble and/or reside in UV absorbing nanoparticles having a mean diameter less than 10 nm. The UV absorbing nanoparticles incorporate into an appliance by polymerizing a monomer mixture containing the UV absorbing nanoparticles to form an appliance comprising the UV absorbing nanoparticles. The UV absorbing compounds or the UV absorbing nanoparticles incorporate into an appliance by placing the appliance in a solution of the UV absorbing compound or a dispersion of the UV absorbing nanoparticles in a non-aqueous solvent that swells the appliance. The UV absorbing compound or the UV absorbing nanoparticles infuse into the swollen appliance and are retained within the appliance upon removal of the non-aqueous solvent.
    Type: Application
    Filed: March 2, 2017
    Publication date: July 27, 2017
    Inventors: Anuj Chauhan, Hyun-Jung Jung, Samuel B. Gause
  • Patent number: 9594188
    Abstract: UV absorbing appliances, such as contact lenses, are prepared by including at least one UV absorbing compound in the appliances. UV absorbing compounds can be water insoluble and/or reside in UV absorbing nanoparticles having a mean diameter less than 10 nm. The UV absorbing nanoparticles incorporate into an appliance by polymerizing a monomer mixture containing the UV absorbing nanoparticles to form an appliance comprising the UV absorbing nanoparticles. The UV absorbing compounds or the UV absorbing nanoparticles incorporate into an appliance by placing the appliance in a solution of the UV absorbing compound or a dispersion of the UV absorbing nanoparticles in a non-aqueous solvent that swells the appliance. The UV absorbing compound or the UV absorbing nanoparticles infuse into the swollen appliance and are retained within the appliance upon removal of the non-aqueous solvent.
    Type: Grant
    Filed: June 5, 2014
    Date of Patent: March 14, 2017
    Assignee: UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC.
    Inventors: Anuj Chauhan, Hyun-Jung Jung, Samuel B. Gause
  • Patent number: 9401831
    Abstract: An apparatus and method for removing a Direct Current (DC) offset at a receiving terminal in a wireless communication system are provided. In the method, a frame is divided into at least two time resource blocks. Resource allocation information is used to discriminate between at least one time resource block of a data-unmapped interval and at least one time resource block of a data-mapped interval. The DC offset is measured during the data-unmapped interval. The DC offset is compensated during the data-unmapped interval on a time resource block basis by using the measured DC offset.
    Type: Grant
    Filed: October 20, 2010
    Date of Patent: July 26, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hyun-Jung Jung, Young-Il Son, Hye-Won Nam, Yong-Won Shin, In-Chun Lim
  • Publication number: 20160090435
    Abstract: A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.
    Type: Application
    Filed: December 8, 2015
    Publication date: March 31, 2016
    Inventors: Min Hyuck KANG, Su Mi LEE, Myung Im KIM, Tae Woo KIM, Seung-Won PARK, Xie LEI, Na Na KANG, Bong-Jin MOON, Joona BANG, Sang Hoon WOO, Jin Yeong LEE, Hyun Jung JUNG, June HUH
  • Patent number: 9255170
    Abstract: A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.
    Type: Grant
    Filed: November 21, 2013
    Date of Patent: February 9, 2016
    Assignees: SAMSUNG DISPLAY CO., LTD., KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION, SOGANG UNIVERSITY RESEARCH FOUNDATION
    Inventors: Min Hyuck Kang, Su Mi Lee, Myung Im Kim, Tae Woo Kim, Seung-Won Park, Xie Lei, Na Na Kang, Bong-Jin Moon, Joona Bang, Sang Hoon Woo, Jin Yeong Lee, Hyun Jung Jung, June Huh
  • Patent number: 9074055
    Abstract: An approach is provided for manufacturing a nanostructure. A first thin film including a first block copolymer is formed on a substrate. A guide pattern is formed on the first thin film. A second thin film including a second block copolymer is formed between portions of the guide pattern. The second thin film is cured. The first block copolymer is a cylinder-type and the second block copolymer is a lamella-type.
    Type: Grant
    Filed: April 25, 2013
    Date of Patent: July 7, 2015
    Assignees: Samsung Display Co., Ltd., Korea University Research and Business Foundation
    Inventors: Eun-Ae Kwak, Min-Hyuck Kang, Su Mi Lee, Jun Han Lee, Moon Gyu Lee, Joona Bang, Hyun Jung Jung
  • Publication number: 20140288206
    Abstract: UV absorbing appliances, such as contact lenses, are prepared by including at least one UV absorbing compound in the appliances. UV absorbing compounds can be water insoluble and/or reside in UV absorbing nanoparticles having a mean diameter less than 10 nm. The UV absorbing nanoparticles incorporate into an appliance by polymerizing a monomer mixture containing the UV absorbing nanoparticles to form an appliance comprising the UV absorbing nanoparticles. The UV absorbing compounds or the UV absorbing nanoparticles incorporate into an appliance by placing the appliance in a solution of the UV absorbing compound or a dispersion of the UV absorbing nanoparticles in a non-aqueous solvent that swells the appliance. The UV absorbing compound or the UV absorbing nanoparticles infuse into the swollen appliance and are retained within the appliance upon removal of the non-aqueous solvent.
    Type: Application
    Filed: June 5, 2014
    Publication date: September 25, 2014
    Inventors: Anuj Chauhan, Hyun-Jung Jung, Samuel B. Gause
  • Patent number: 8795539
    Abstract: A method of forming patterns includes forming a layer composed of a ketene based random copolymer on a substrate, forming a block copolymer on the ketene based random copolymer layer and patterning the ketene based random copolymer layer by removing a part of the block copolymer and a portion of the ketene based random copolymer layer.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: August 5, 2014
    Assignees: Samsung Display Co., Ltd., Korea University Research and Business Foundation
    Inventors: Su Mi Lee, Mio Hyuck Kang, Eun-Ae Kwak, Moon Gyu Lee, Bong-Jin Moon, Joona Bang, Hyun Jung Jung
  • Publication number: 20140197132
    Abstract: A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.
    Type: Application
    Filed: November 21, 2013
    Publication date: July 17, 2014
    Applicants: Samsung Display Co., Ltd., Sogang University Research Foundation, KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
    Inventors: Min Hyuck KANG, Su Mi LEE, Myung Im KIM, Tae Woo KIM, Seung-Won PARK, Xie LEI, Na Na KANG, Bong-Jin MOON, Joona BANG, Sang Hoon WOO, Jin Yeong LEE, Hyun Jung JUNG, June HUH