Patents by Inventor Hyun-Lae Cho

Hyun-Lae Cho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate plasma-processing apparatus
    Patent number: 8901008
    Abstract: A substrate plasma-processing apparatus for plasma-processing a surface of an electrode of an organic light emitting device. The substrate plasma-processing apparatus may adjust the distance between a first electrode and a substrate and adjust the distance between a second electrode and the substrate.
    Type: Grant
    Filed: August 21, 2013
    Date of Patent: December 2, 2014
    Assignee: Samsung Display Co., Ltd.
    Inventors: Tae-Wook Kang, Ou-Hyen Kim, Chang-Soon Ji, Hyun-Lae Cho, Cheng-Guo An, Jeong-Yeol Lee, Jae-Mork Park
  • SUBSTRATE PLASMA-PROCESSING APPARATUS
    Publication number: 20130337605
    Abstract: A substrate plasma-processing apparatus for plasma-processing a surface of an electrode of an organic light emitting device. The substrate plasma-processing apparatus may adjust the distance between a first electrode and a substrate and adjust the distance between a second electrode and the substrate.
    Type: Application
    Filed: August 21, 2013
    Publication date: December 19, 2013
    Applicant: Samsung Display Co., Ltd.
    Inventors: Tae-Wook KANG, Ou-Hyun Kim, Chang-Soon Jl, Hyun-Lae Cho, Chang-Guo An, Jeong-Yeol Lee, Jae-Mork Park
  • SUBSTRATE PLASMA-PROCESSING APPARATUS
    Publication number: 20100282709
    Abstract: A substrate plasma-processing apparatus for plasma-processing a surface of an electrode of an organic light emitting device. The substrate plasma-processing apparatus may adjust the distance between a first electrode and a substrate and adjust the distance between a second electrode and the substrate.
    Type: Application
    Filed: May 6, 2010
    Publication date: November 11, 2010
    Applicant: Samsung Mobile Display Co., Ltd.
    Inventors: Tae-Wook KANG, Ou-Hyon KIM, Chang-Soon JI, Hyun-Lae CHO, Chang-Guo AN, Jeong-Yeol LEE, Jae-Mork PARK
  • Deposition apparatus and method
    Publication number: 20080098957
    Abstract: A deposition apparatus includes at least one deposition chamber having a source and a substrate holder, the source being configured to deposit a deposition material on a substrate on the substrate holder, a measurement chamber electrically connected to the deposition chamber, the measurement chamber configured to measure in real time a thickness of the deposition material on the substrate, and at least one layer thickness controller in contact with the deposition chamber, the layer thickness controller being configured to control deposition of the deposition material on the substrate to a predetermined thickness in real time.
    Type: Application
    Filed: October 30, 2007
    Publication date: May 1, 2008
    Inventors: Seung-Yoon Ryu, Hyun-Lae Cho