Patents by Inventor Hyun-Moo Choi

Hyun-Moo Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10048528
    Abstract: A liquid crystal display (LCD) includes a thin film transistor positioned on a lower substrate; a plurality of color filters positioned on the thin film transistor and aligned to be spaced apart from each other; an insulation layer positioned on the plurality of color filters; a light-blocking layer positioned on the insulation layer; a transparent layer positioned on the light-blocking layer and having a convex shape; an upper substrate facing the lower substrate; and a liquid crystal layer interposed between the lower substrate and the upper substrate, wherein the light-blocking layer includes an organic black pigment, and the transparent layer having the convex shape has a different shape from the light-blocking layer.
    Type: Grant
    Filed: July 1, 2015
    Date of Patent: August 14, 2018
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Arum Yu, Do-Uk Kim, Ji-Hye Kim, Ho-Jeong Paek, Haeni Song, Kyung-Won Ahn, Young-Tai Lee, Jun-Ho Lee, Hye-Min Lee, Seung-Jib Choi, Hyun-Moo Choi
  • Publication number: 20160139455
    Abstract: A liquid crystal display (LCD) includes a thin film transistor positioned on a lower substrate; a plurality of color filters positioned on the thin film transistor and aligned to be spaced apart from each other; an insulation layer positioned on the plurality of color filters; a light-blocking layer positioned on the insulation layer; a transparent layer positioned on the light-blocking layer and having a convex shape; an upper substrate facing the lower substrate; and a liquid crystal layer interposed between the lower substrate and the upper substrate, wherein the light-blocking layer includes an organic black pigment, and the transparent layer having the convex shape has a different shape from the light-blocking layer.
    Type: Application
    Filed: July 1, 2015
    Publication date: May 19, 2016
    Inventors: Arum YU, Do-Uk KIM, Ji-Hye KIM, Ho-Jeong PAEK, Haeni SONG, Kyung-Won AHN, Young-Tai LEE, Jun-Ho LEE, Hye-Min LEE, Seung-Jib CHOI, Hyun-Moo CHOI
  • Patent number: 9334399
    Abstract: Disclosed are a photosensitive resin composition including (A) a thermally curing initiator having a half-life of about one hour at a temperature ranging from about 100 to about 150° C.; (B) a photopolymerization initiator; (C) a binder resin; (D) a photopolymerizable compound; (E) a colorant; and (F) a solvent, and a black spacer using the same.
    Type: Grant
    Filed: October 28, 2013
    Date of Patent: May 10, 2016
    Assignee: Cheil Industries Inc.
    Inventors: A-Rum Yu, Ji-Hye Kim, Kyung-Won Ahn, Jae-Bum Yim, Hwan-Sung Cheon, Ju-Ho Jung, Hyun-Moo Choi
  • Patent number: 9250520
    Abstract: Disclosed are a black photosensitive resin composition including (A) a binder resin; (B) a colorant including a pigment and a silica nanoparticle; (C) a photopolymerizable compound; (D) a photopolymerization initiator; and (E) a solvent, wherein the silica nanoparticle is included in an amount of about 1 part by weight to about 11 parts by weight based on about 100 parts by weight of the pigment, and a light blocking layer and a color filter using the same.
    Type: Grant
    Filed: May 16, 2014
    Date of Patent: February 2, 2016
    Assignee: Cheil Industries Inc.
    Inventors: Hyun-Moo Choi, Arum Yu, Ho-Jeong Paek, Chang-Min Lee, Seung-Jib Choi
  • Patent number: 9170486
    Abstract: Disclosed are a method of manufacturing a black column spacer that includes preparing a substrate; forming a first organic layer on the substrate; forming a second organic layer on the first organic layer; performing exposure on the substrate on which the first organic layer and the second organic layer are formed using a half-tone mask; and developing the substrate and curing the resultant product, a black column spacer manufactured using the manufacturing method, and a color filter including the black column spacer.
    Type: Grant
    Filed: June 16, 2014
    Date of Patent: October 27, 2015
    Assignee: Cheil Industries Inc.
    Inventors: Arum Yu, Ji-Hye Kim, Kyung-Won Ahn, Jun-Ho Lee, Seung-Jib Choi, Hyun-Moo Choi
  • Publication number: 20150277224
    Abstract: Disclosed are a method of manufacturing a black column spacer that includes preparing a substrate; forming a first organic layer on the substrate; forming a second organic layer on the first organic layer; performing exposure on the substrate on which the first organic layer and the second organic layer are formed using a half-tone mask; and developing the substrate and curing the resultant product, a black column spacer manufactured using the manufacturing method, and a color filter including the black column spacer.
    Type: Application
    Filed: June 16, 2014
    Publication date: October 1, 2015
    Inventors: Arum YU, Ji-Hye KIM, Kyung-Won AHN, Jun-Ho LEE, Seung-Jib CHOI, Hyun-Moo CHOI
  • Patent number: 9069132
    Abstract: A photosensitive resin composition for a light blocking layer includes (A) a colorant including a blue material including a dye represented by the following Chemical Formula 1, and a red material, (B) a binder resin, (C) a photopolymerizable monomer, (D) a photopolymerization initiator, and (E) a solvent, and a light blocking layer using the same. In Chemical Formula 1, each substituent is the same as defined in the detailed description.
    Type: Grant
    Filed: May 29, 2013
    Date of Patent: June 30, 2015
    Assignee: Cheil Industries Inc.
    Inventors: Ju-Ho Jung, Ji-Hye Kim, Kyung-Won Ahn, A-Rum Yu, Jae-Bum Yim, Hwan-Sung Cheon, Hyun-Moo Choi
  • Publication number: 20150147700
    Abstract: Disclosed are a black photosensitive resin composition including (A) a binder resin; (B) a colorant including a pigment and a silica nanoparticle; (C) a photopolymerizable compound; (D) a photopolymerization initiator; and (E) a solvent, wherein the silica nanoparticle is included in an amount of about 1 part by weight to about 11 parts by weight based on about 100 parts by weight of the pigment, and a light blocking layer and a color filter using the same.
    Type: Application
    Filed: May 16, 2014
    Publication date: May 28, 2015
    Applicant: Cheil Industries Inc.
    Inventors: Hyun-Moo CHOI, Arum YU, Ho-Jeong PAEK, Chang-Min LEE, Seung-Jib CHOI
  • Patent number: 9005491
    Abstract: A photosensitive resin composition for a color filter includes (A) an acrylic-based binder resin including a structural unit represented by the following Chemical Formula 1, wherein the definitions of R1, R2, R3 and R4 are the same as set forth in specification; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant; and (E) a solvent.
    Type: Grant
    Filed: January 19, 2012
    Date of Patent: April 14, 2015
    Assignee: Cheil Industries Inc.
    Inventors: Chang-Min Lee, Yeon-Soo Lee, Yong-Hee Kang, Man-Suk Kim, Taek-Jin Baek, Hyun-Moo Choi, Kyung-Hee Hyung, Sang-Hyun Hong
  • Publication number: 20140353557
    Abstract: A photosensitive resin composition includes (A) a colorant including an organic black pigment or an organic mixed pigment capable of showing black; (B) a binder resin; (C) a photopolymerizable compound; (D) a photopolymerization initiator; (E) an inorganic filler; and (F) a solvent. The composition has an O.D. of greater than or equal to about 2.0 after being coated on a substrate to a thickness of about 4 ?m and being cured, and a transmittance of greater than or equal to about 12% in a 950 nm wavelength region. A black spacer includes the photosensitive resin composition.
    Type: Application
    Filed: April 9, 2014
    Publication date: December 4, 2014
    Applicant: Cheil Industries Inc.
    Inventors: Arum YU, Ji-Hye KIM, Kyung-Won AHN, Jae-Bum YIM, Hwan-Sung CHEON, Hyun-Moo CHOI
  • Publication number: 20140308618
    Abstract: Disclosed are an organic solution for surface-treating an indium zinc oxide (IZO) substrate that is used for surface treatment of an indium zinc oxide (IZO) substrate, and includes an organic material, and a method of preparing a display substrate using the same.
    Type: Application
    Filed: November 12, 2013
    Publication date: October 16, 2014
    Applicant: Cheil Industries Inc.
    Inventors: Hyun-Moo CHOI, Ji-Hye KIM, Kyung-Won AHN, A-Rum YU, Jae-Bum YIM, Hwan-Sung CHEON, Gun-Young HEO
  • Patent number: 8834749
    Abstract: Disclosed are a photosensitive resin composition including (A) a binder resin including a cardo-based resin including a repeating unit represented by the following Chemical Formula 1, (B) a photopolymerizable monomer, (C) a photopolymerization initiator, (D) a colorant and (E) a solvent, and a light blocking layer using the same. In the above Chemical Formula 1, each substituent is the same as defined in the detailed description.
    Type: Grant
    Filed: July 22, 2013
    Date of Patent: September 16, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Hyun-Moo Choi, Chang-Min Lee, Ji-Hye Kim, Kyung-Won Ahn, A-Rum Yu, Jae-Bum Yim, Hwan-Sung Cheon, Ju-Ho Jung
  • Patent number: 8822110
    Abstract: Disclosed is a photosensitive resin composition for a color filter that includes (A) an acrylic-based copolymer including a structural unit represented by the following Chemical Formula 1, wherein R1, R2, Q, and n are the same as defined in the specification; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant; and (E) a solvent.
    Type: Grant
    Filed: August 20, 2012
    Date of Patent: September 2, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Chang-Min Lee, Kwang-Seop Kim, Hyun-Moo Choi, Ho-Jeong Paek, Hwan-Sung Cheon
  • Publication number: 20140175343
    Abstract: Disclosed are a photosensitive resin composition including (A) a binder resin including a cardo-based resin including a repeating unit represented by the following Chemical Formula 1, (B) a photopolymerizable monomer, (C) a photopolymerization initiator, (D) a colorant and (E) a solvent, and a light blocking layer using the same. In the above Chemical Formula 1, each substituent is the same as defined in the detailed description.
    Type: Application
    Filed: July 22, 2013
    Publication date: June 26, 2014
    Applicant: Cheil Industries Inc.
    Inventors: Hyun-Moo CHOI, Chang-Min LEE, Ji-Hye KIM, Kyung-Won AHN, A-Rum YU, Jae-Bum YIM, Hwan-Sung CHEON, Ju-Ho JUNG
  • Publication number: 20140178815
    Abstract: A photosensitive resin composition for a light blocking layer includes (A) a colorant including a blue material including a dye represented by the following Chemical Formula 1, and a red material, (B) a binder resin, (C) a photopolymerizable monomer, (D) a photopolymerization initiator, and (E) a solvent, and a light blocking layer using the same. In Chemical Formula 1, each substituent is the same as defined in the detailed description.
    Type: Application
    Filed: May 29, 2013
    Publication date: June 26, 2014
    Applicant: Cheil Industries Inc.
    Inventors: Ju-Ho JUNG, Ji-Hye KIM, Kyung-Won AHN, A-Rum YU, Jae-Bum YIM, Hwan-Sung CHEON, Hyun-Moo CHOI
  • Publication number: 20140163131
    Abstract: Disclosed are a photosensitive resin composition including (A) a thermally curing initiator having a half-life of about one hour at a temperature ranging from about 100 to about 150° C.; (B) a photopolymerization initiator; (C) a binder resin; (D) a photopolymerizable compound; (E) a colorant; and (F) a solvent, and a black spacer using the same.
    Type: Application
    Filed: October 28, 2013
    Publication date: June 12, 2014
    Applicant: Cheil Industries Inc.
    Inventors: A-Rum YU, Ji-Hye KIM, Kyung-Won AHN, Jae-Bum YIM, Hwan-Sung CHEON, Ju-Ho JUNG, Hyun-Moo CHOI
  • Patent number: 8530537
    Abstract: Disclosed are a black photosensitive resin composition that includes (A) an organic binder resin, (B) a reactive unsaturated compound, (C) a photopolymerization initiator, (D) a black pigment including carbon black and a silver-tin-containing alloy, and (E) a solvent, and a light blocking layer using the same.
    Type: Grant
    Filed: June 16, 2011
    Date of Patent: September 10, 2013
    Assignee: Cheil Industries Inc.
    Inventors: Hyun-Moo Choi, Hye-Kyoung Cho, Ji-Won Woo, Choun-Woo Lee, Gyu-Seok Han
  • Publication number: 20130143158
    Abstract: Disclosed is a photosensitive resin composition for a color filter that includes (A) an acrylic-based copolymer including a structural unit represented by the following Chemical Formula 1, wherein R1, R2, Q, and n are the same as defined in the specification; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant; and (E) a solvent.
    Type: Application
    Filed: August 20, 2012
    Publication date: June 6, 2013
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Chang-Min LEE, Kwang-Seop KIM, Hyun-Moo CHOI, Ho-Jeong PAEK, Hwan-Sung CHEON
  • Publication number: 20130001483
    Abstract: Disclosed is a photosensitive resin composition for a color filter that includes (A) an acrylic-based binder resin including a structural unit represented by the following Chemical Formula 1; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant; and (E) a solvent. In the above Chemical Formula, each definition of R1, R2, R3 and R4 is the same as defined in the detailed description.
    Type: Application
    Filed: January 19, 2012
    Publication date: January 3, 2013
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Chang-Min LEE, Yeon-Soo LEE, Yong-Hee KANG, Man-Suk KIM, Taek-Jin BAEK, Hyun-Moo CHOI, Kyung-Hee HYUNG, Sang-Hyun HONG
  • Patent number: 8304034
    Abstract: The present invention relates to one-solution type thermosetting resin composition for a protective film of a color filter, and a color filter including the same. The one-solution type thermosetting resin composition includes a copolymer (A) including (meth)acrylate with an epoxy cyclic structure at the side chain, (meth)acrylate with a hydroxyl terminal, acid anhydride, and maleimide with a substituent; an epoxy resin (B); a base-generating agent (C); and an organic solvent (D). When a protective film of a color filter is prepared by using the one-solution type thermosetting resin composition according to the present invention, it has excellent storage stability as well as excellent flatness, close-contacting property, transmission properties, heat resistance, and chemical resistance.
    Type: Grant
    Filed: December 31, 2007
    Date of Patent: November 6, 2012
    Assignee: Cheil Industries Inc.
    Inventors: Hyun-Moo Choi, O-Bum Kwon, Sun-Yul Lee