Patents by Inventor Hyun-Sang Joo
Hyun-Sang Joo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11411273Abstract: A secondary battery including an electrode assembly; a can accommodating the electrode assembly; a cap assembly sealing the can; a first insulation member on a side of the electrode assembly, the first insulation member having an opening exposing at least a portion of a bottom surface of the electrode assembly; and a second insulation member on a bottom of the can and facing the bottom surface of the electrode assembly, the second insulation member having an area corresponding to an area of the opening in the first insulation member.Type: GrantFiled: January 30, 2020Date of Patent: August 9, 2022Assignee: SAMSUNG SDI CO., LTD.Inventors: Chi Hoon Heo, Hyun Sang Joo, Jong Dae Kim, Sung Ho Lee
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Publication number: 20200287172Abstract: A secondary battery including an electrode assembly; a can accommodating the electrode assembly; a cap assembly sealing the can; a first insulation member on a side of the electrode assembly, the first insulation member having an opening exposing at least a portion of a bottom surface of the electrode assembly; and a second insulation member on a bottom of the can and facing the bottom surface of the electrode assembly, the second insulation member having an area corresponding to an area of the opening in the first insulation member.Type: ApplicationFiled: January 30, 2020Publication date: September 10, 2020Inventors: Chi Hoon HEO, Hyun Sang JOO, Jong Dae KIM, Sung Ho LEE
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Publication number: 20190237797Abstract: Various embodiments of the present invention provide a stacking device for a secondary battery configured to stack electrode plates at a high rate, a stacking method using the same, and a secondary battery obtained thereby.Type: ApplicationFiled: June 21, 2017Publication date: August 1, 2019Inventors: Jae Kyung CHO, Hyun Sang JOO, Chan Jin CHOI, Kyoung Heon HEO, Dae Wook KI, Gi Sung KIM
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Patent number: 9063411Abstract: A resist additive represented by Formula 1 below and a resist composition including the additive are disclosed. The resist additive improves hydrophobicity of the surface of the resist film to prevent materials from being leached in water during exposure of immersion lithography and is converted to have hydrophilicity by deprotection reaction during development. As a result, a micropattern of a resist film with excellent sensitivity and high resolution is formed. In Formula 1, the substituents are defined as described in the specification.Type: GrantFiled: December 13, 2012Date of Patent: June 23, 2015Assignee: KOREA KUMHO PETROCHEMICAL CO., LTD.Inventors: Joon Hee Han, Hyun Sang Joo, Jin Ho Kim, Hyun Soon Lim
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Patent number: 8980526Abstract: Disclosed are a hydrophilic photoacid generator prepared by copolymerization of a first (meth)acrylic acid ester having a structure represented by the following Formula 1 or 2, with a polymerizable monomer selected from the group consisting of a second (meth)acrylic acid ester, an olefin-based compound and a mixture thereof, each of which contains a functional group selected from the group consisting of a hydroxyl group, a carboxyl group, a lactone group, a nitrile group and a halogen group: wherein respective substituents are defined in the specification, and a resist composition comprising the same. The hydrophilic photoacid generator is uniformly dispersed in a resist film, thus improving a line edge roughness of resist patterns.Type: GrantFiled: December 13, 2012Date of Patent: March 17, 2015Assignee: Korea Kumho Petrochemical Co., Ltd.Inventors: Dae Kyung Yoon, Kyoung Jin Ryu, Sung Jae Lee, Hyun Sang Joo
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Patent number: 8865919Abstract: A sulfonium compound represented by formula (1), a photo-acid generator, and a method for producing a sulfonium compound are provided: wherein X represents an electron-donating group; R1 and R2 each represent an alkyl group, a cycloalkyl group, or the like; R3 and R4 each represent an arylene group or a heteroarylene group; R5 and R6 each represent an alkyl group, a cycloalkyl group, or the like; and A? and B? are anions that are different from each other. The sulfonium compound, when used as a photo-acid generator, can produce a uniform and excellent resist pattern.Type: GrantFiled: December 30, 2011Date of Patent: October 21, 2014Assignee: Korea Kumho Petrochemical Co., Ltd.Inventors: Hyun Sang Joo, Dong Chul Seo, Dae Kyung Yoon, Dae Hyeon Shin
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Patent number: 8853345Abstract: Provided is a copolymer. The copolymer, when incorporated into a resist composition, can provide a satisfactory resist pattern with high sensitivity, high resolution, high etching resistance and a reduced amount of outgas.Type: GrantFiled: December 20, 2011Date of Patent: October 7, 2014Assignee: Korea Kumho Petrochemical Co., Ltd.Inventors: Jung-Hoon Oh, Joon Hee Han, Tae Gon Kim, Hyun Sang Joo
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Patent number: 8779183Abstract: An acid generating agent used for chemically amplified resist compositions is provided, which agent is represented by the following formula (1): wherein X represents a monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, and having at least one hydrogen atom on the ring substituted by an alkyl or alkoxy group which may be unsubstituted or substituted with a group selected from an ether group, an ester group, a carbonyl group, an acetal group, an epoxy group, a nitrile group and an aldehyde group, or by a perfluoroalkyl group, a hydroxyalkyl group, or a cyano group; R6 is an alkyl group, an alkoxy group, or a heteroatom selected from the group consisting of N, S and F; m is an integer from 0 to 2; and A+ is an organic counterion.Type: GrantFiled: June 19, 2008Date of Patent: July 15, 2014Assignee: Korea Kumho Petrochemical Co., Ltd.Inventors: Jung-Hoon Oh, Dong-Cheol Seo, Hyun-Sang Joo, Chang-Soo Lee
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Publication number: 20120172606Abstract: A sulfonium compound represented by formula (1), a photo-acid generator, and a method for producing a sulfonium compound are provided: wherein X represents an electron-donating group; R1 and R2 each represent an alkyl group, a cycloalkyl group, or the like; R3 and R4 each represent an arylene group or a heteroarylene group; R5 and R6 each represent an alkyl group, a cycloalkyl group, or the like; and A? and B? are anions that are different from each other. The sulfonium compound, when used as a photo-acid generator, can produce a uniform and excellent resist pattern.Type: ApplicationFiled: December 30, 2011Publication date: July 5, 2012Applicant: Korea Kumho Petrochemical Co., Ltd.Inventors: Hyun Sang JOO, Dong Chul Seo, Dae Kyung Yoon, Dae Hyeon Shin
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Publication number: 20120165499Abstract: Provided is a copolymer containing a repeating unit represented by the following formula (1): wherein R1 represents an alkanediyl group, a heteroalkanediyl group, a cycloalkanediyl group, a heterocycloalkanediyl group, an arylene group, a heteroarylene group, or an alkylarylene group; R2 represents a hydrogen atom, an alkyl group, a heteroalkyl group, a cycloalkyl group, a heterocycloalkyl group, an aryl group, a heteroaryl group, an alkoxy group, or an alkylalkoxy group; R3, R4, R5 and R6 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms; n1 represents an integer from 0 to 10; and n2 represents an integer from 0 to 10. The copolymer, when incorporated into a resist composition, can provide a satisfactory resist pattern with high sensitivity, high resolution, high etching resistance and a reduced amount of outgas.Type: ApplicationFiled: December 20, 2011Publication date: June 28, 2012Applicant: Korea Kumho Petrochemical Co., LtdInventors: Jung-Hoon OH, Joon Hee Han, Tae Gon Kim, Hyun Sang Joo
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Patent number: 8158327Abstract: A compound represented by the following formula (1) is provided: wherein R1 represents a hydrogen atom, a trifluoromethyl group, an alkyl group, or an alkoxy group; and A represents a group represented by the following formula (2) or formula (3): wherein R2, R3, R4, R5 and R6 each independently represent a substituted or unsubstituted alkyl group, a substituted or unsubstituted allyl group, a substituted or unsubstituted perfluoroalkyl group, a substituted or unsubstituted benzyl group, or a substituted or unsubstituted aryl group; and two or more of R2, R3 and R4 may be linked to each other to form a saturated or unsaturated carbon ring or a saturated or unsaturated heterocyclic ring. The chemically amplified resist composition comprising a polymer compound which is produced from the compound of formula 1 according to the present invention provides a chemically amplified resist sensitive to far-ultraviolet radiation, which is represented by KrF excimer laser or ArF excimer laser.Type: GrantFiled: January 15, 2009Date of Patent: April 17, 2012Assignee: Korea Kumho Petrochemical Co., Ltd.Inventors: Hyun-Sang Joo, Joo-Hyeon Park, Jung-Hoon Oh, Dae-Hyeon Shin
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Publication number: 20110201528Abstract: The present invention provides compositions for forming an oligomer array and methods for using the same. Such a composition may include an acid stable polymer, a photoacid generator and an organic solvent and may allow for the selective attachment of oligormers at one or more desired positions on a substrate using long wavelength light.Type: ApplicationFiled: February 18, 2011Publication date: August 18, 2011Inventors: Se-Kyung Baek, Joo-Hyeon Park, Hyo-Jin Yun, Hyun-Sang Joo, Ran-Ra Park, Sung-Ouk Jung, Ji-Yun Ham
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Publication number: 20100075256Abstract: A compound represented by the following formula (1) is provided: wherein R1 represents a hydrogen atom, a trifluoromethyl group, an alkyl group, or an alkoxy group; and A represents a group represented by the following formula (2) or formula (3): wherein R2, R3, R4, R5 and R6 each independently represent a substituted or unsubstituted alkyl group, a substituted or unsubstituted allyl group, a substituted or unsubstituted perfluoroalkyl group, a substituted or unsubstituted benzyl group, or a substituted or unsubstituted aryl group; and two or more of R2, R3 and R4 may be linked to each other to form a saturated or unsaturated carbon ring or a saturated or unsaturated heterocyclic ring. The chemically amplified resist composition comprising a polymer compound which is produced from the compound of formula 1 according to the present invention provides a chemically amplified resist sensitive to far-ultraviolet radiation, which is represented by KrF excimer laser or ArF excimer laser.Type: ApplicationFiled: January 15, 2009Publication date: March 25, 2010Applicant: Korea Kumho Petrochemical Co., Ltd.Inventors: Hyun-Sang Joo, Joo-Hyeon Park, Jung-Hoon Oh, Dae-Hyeon Shin
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Publication number: 20090234155Abstract: An acid generating agent used for chemically amplified resist compositions is provided, which agent is represented by the following formula (1): wherein X represents a monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, and having at least one hydrogen atom on the ring substituted by an alkyl or alkoxy group which and may be unsubstituted or substituted with a group selected from an ether group, an ester group, a carbonyl group, an acetal group, an epoxy group, a nitrile group and an aldehyde group, or by a perfluoroalkyl group, a hydroxyalkyl group, or a cyano group; R6 is an alkyl group, an alkoxy group, or a heteroatom selected from the group consisting of N, S and F; m is an integer from 0 to 2; and A+ is an organic counterion.Type: ApplicationFiled: June 19, 2008Publication date: September 17, 2009Applicant: Korea Kumho Petrochemical Co., Ltd.Inventors: Jung-Hoon Oh, Dong-Cheol Seo, Hyun-Sang Joo, Chang-Soo Lee
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Patent number: 7326520Abstract: The present invention provides a polymer represented by the following formula 1 and a chemically amplified resist composition including the polymer, which resist composition is excellent in adhesion, storage stability and dry etch resistance, with good resolution in both C/H and L/S patterns, and provides a good pattern profile irrespective of the type of the substrate due to its good process window:Type: GrantFiled: April 18, 2005Date of Patent: February 5, 2008Assignee: Korea Kumho Petrochemical Co., Ltd.Inventors: Hyun-Sang Joo, Joo-Hyeon Park, Dong-Chul Seo, Young-Taek Lim, Seong-Duk Cho, Ji-Young Song, Kyoung-Mun Kim
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Patent number: 7285373Abstract: A chemically amplified resist composition includes a novel polymer, a photoacid generator, and a solvent. The chemically amplified resist can form a resist pattern that is excellent in adhesiveness with a low dependency to the substrate, transparency at the far ultraviolet wavelength range such as KrF Excimer laser or ArF Excimer laser, dry etch resistance, sensitivity, resolution, and developability. In addition, the polymer contains a maximum number of saturated aliphatic rings to enhance etching resistance, and additionally includes an alkoxyalkyl acrylate monomer introduced as a solution to the problem with the conventional polyacrylate resist in regard to edge roughness of the pattern, to form a uniform edge of the pattern because the alkylalcohol compound generated together with a formaldehyde and a carboxylate compound by a deprotection reaction of the alkoxyalkyl acrylate monomer with an acid acts as a solvent or an antifoaming agent in the pattern.Type: GrantFiled: September 14, 2004Date of Patent: October 23, 2007Assignee: Korea Kumho Petrochemical Co., LtdInventors: Young-Taek Lim, Joo-Hyeon Park, Dong-Chul Seo, Chang-Min Kim, Seong-Duk Cho, Hyun-Sang Joo
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Publication number: 20060057490Abstract: The present invention provides a polymer represented by the following formula 1 and a chemically amplified resist composition including the polymer, which resist composition is excellent in adhesion, storage stability and dry etch resistance, with good resolution in both C/H and L/S patterns, and provides a good pattern profile irrespective of the type of the substrate due to its good process window:Type: ApplicationFiled: April 18, 2005Publication date: March 16, 2006Applicant: Korea Kumbo Petrochemical Co., Ltd.Inventors: Hyun-Sang Joo, Joo-Hyeon Park, Dong-Chul Seo, Young-Taek Lim, Seong-Duk Cho, Ji-Young Song, Kyoung-Mun Kim
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Publication number: 20050153236Abstract: The present invention provides a chemically amplified resist composition including a novel polymer, a photoacid generator, and a solvent: The chemically amplified resist can form a resist pattern that is excellent in adhesiveness with a low dependency to the substrate, transparency at the far ultraviolet wavelength range such as KrF Excimer laser or ArF Excimer laser, dry etch resistance, sensitivity, resolution, and developability. In addition, the polymer contains a maximum number of saturated aliphatic rings to enhance etching resistance, and additionally includes an alkoxyalkyl acrylate monomer introduced as a solution to the problem with the conventional polyacrylate resist in regard to edge roughness of the pattern, to form a uniform edge of the pattern because the alkylalcohol compound generated together with a formaldehyde and a carboxylate compound by a deprotection reaction of the alkoxyalkyl acrylate monomer with an acid acts as a solvent or an antifoaming agent in the pattern.Type: ApplicationFiled: September 14, 2004Publication date: July 14, 2005Applicant: Korea Kumho Petrochemical Co., Ltd.Inventors: Young-Taek Lim, Joo-Hyeon Park, Dong-Chul Seo, Chang-Min Kim, Seong-Duk Cho, Hyun-Sang Joo