Patents by Inventor Hyun Sin Kim

Hyun Sin Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240271297
    Abstract: Proposed is an electrochemical reaction device that generates products by subjecting a mixed solution inside a reactor to an electrochemical reaction using an electrode part. More particularly, proposed is an electrochemical reaction device that can increase the yield of products produced by an electrochemical reaction inside a reactor and prevent an explosion caused by residual gas during maintenance.
    Type: Application
    Filed: February 7, 2024
    Publication date: August 15, 2024
    Inventors: Mun Sik KANG, Hyun Sin Kim, Dae Ho Jung, Jin Beom Kim
  • Patent number: 11724268
    Abstract: The present invention relates to a nozzle for cleaning a substrate by discharging cleaning liquid to the substrate and a method of manufacturing the nozzle and, more particularly, to a nozzle for cleaning a substrate and a method of manufacturing the nozzle, the nozzle having pressure resistance performance capable of enduring high supply pressure of the cleaning liquid.
    Type: Grant
    Filed: June 20, 2019
    Date of Patent: August 15, 2023
    Assignee: HS HI-TECH CO., LTD.
    Inventors: Beom Jin Kim, Hyun Sin Kim
  • Patent number: 11684934
    Abstract: The present invention relates to a nozzle for cleaning a substrate by discharging cleaning liquid to the substrate and a method of manufacturing the nozzle and, more particularly, to a nozzle for cleaning a substrate and a method of manufacturing the nozzle, the nozzle having pressure resistance performance capable of enduring high supply pressure of the cleaning liquid.
    Type: Grant
    Filed: June 20, 2019
    Date of Patent: June 27, 2023
    Assignee: HS HI-TECH CO., LTD.
    Inventors: Beom Jin Kim, Hyun Sin Kim
  • Publication number: 20210331184
    Abstract: The present invention relates to a nozzle for cleaning a substrate by discharging cleaning liquid to the substrate and a method of manufacturing the nozzle and, more particularly, to a nozzle for cleaning a substrate and a method of manufacturing the nozzle, the nozzle having pressure resistance performance capable of enduring high supply pressure of the cleaning liquid.
    Type: Application
    Filed: June 20, 2019
    Publication date: October 28, 2021
    Inventors: Beom Jin KIM, Hyun Sin KIM
  • Patent number: 10847395
    Abstract: The present invention relates to a wafer storage container, more particularly, relates to a wafer storage container comprising a storage chamber forming an independent space separated from the wafer storage container, and a plurality of gas chambers communicating with the storage chamber, so that the gases are being supplied or exhausted through the area of the side surfaces of the storage chamber via the gas chambers in order to remove the fumes remaining on the surface of a wafer stored inside the wafer storage container efficiently.
    Type: Grant
    Filed: December 21, 2016
    Date of Patent: November 24, 2020
    Assignees: PICO & TERA CO., LTD.
    Inventors: Bum Je Woo, Seok Mun Yoon, Myoung Sok Han, Hyun Sin Kim
  • Patent number: 10720352
    Abstract: The present invention relates to a wafer storage container, more particularly, relates to a wafer storage container wherein the space of the wafer storage container is divided into the spaces, namely a storage room, a gas injection room, and a gas exhausting room, which are independent and separate from each other, so when the wafer storage container is transported to the load port and being coupled therewith, the purge gas is injected/exhausted through the separating walls inside the storage room, thereby efficiently removing the remaining fumes on the surface of the wafer.
    Type: Grant
    Filed: March 24, 2016
    Date of Patent: July 21, 2020
    Assignees: PICO & TERA CO., LTD.
    Inventors: Bum Je Woo, Seok Mun Yoon, Myoung Sok Han, Hyun Sin Kim
  • Patent number: 10580675
    Abstract: The present invention relates to a wafer storage container, more particularly, relates to a wafer storage container wherein the space of the wafer storage container is divided into the spaces, namely a storage room, a gas injection room, and a gas exhausting room, which are independent and separate from each other, so when the wafer storage container is transported to the load port and being coupled therewith, the purge gas is injected/exhausted through the separating walls inside the storage room, thereby efficiently removing the remaining fumes on the surface of the wafer.
    Type: Grant
    Filed: May 9, 2018
    Date of Patent: March 3, 2020
    Assignees: Pico & Tera Co., Ltd.
    Inventors: Bum Je Woo, Seok Mun Yoon, Myoung Sok Han, Hyun Sin Kim
  • Publication number: 20180374731
    Abstract: The present invention relates to a wafer storage container, more particularly, relates to a wafer storage container comprising a storage chamber forming an independent space separated from the wafer storage container, and a plurality of gas chambers communicating with the storage chamber, so that the gases are being supplied or exhausted through the area of the side surfaces of the storage chamber via the gas chambers in order to remove the fumes remaining on the surface of a wafer stored inside the wafer storage container efficiently,
    Type: Application
    Filed: December 21, 2016
    Publication date: December 27, 2018
    Applicants: PICO & TERA CO., LTD.
    Inventors: Bum Je WOO, Seok Mun YOON, Myoung Sok HAN, Hyun Sin KIM
  • Publication number: 20180261483
    Abstract: The present invention relates to a wafer storage container, more particularly, relates to a wafer storage container wherein the space of the wafer storage container is divided into the spaces, namely a storage room, a gas injection room, and a gas exhausting room, which are independent and separate from each other, so when the wafer storage container is transported to the load port and being coupled therewith, the purge gas is injected/exhausted through the separating walls inside the storage room, thereby efficiently removing the remaining fumes on the surface of the wafer.
    Type: Application
    Filed: May 9, 2018
    Publication date: September 13, 2018
    Inventors: Bum Je WOO, Seok Mun YOON, Myoung Sok HAN, Hyun Sin KIM
  • Publication number: 20160284580
    Abstract: The present invention relates to a wafer storage container, more particularly, relates to a wafer storage container wherein the space of the wafer storage container is divided into the spaces, namely a storage room, a gas injection room, and a gas exhausting room, which are independent and separate from each other, so when the wafer storage container is transported to the load port and being coupled therewith, the purge gas is injected/exhausted through the separating walls inside the storage room, thereby efficiently removing the remaining fumes on the surface of the wafer.
    Type: Application
    Filed: March 24, 2016
    Publication date: September 29, 2016
    Inventors: Bum Je Woo, Seok Mun Yoon, Myoung Sok Han, Hyun Sin Kim