Patents by Inventor Hyun Suk WANG

Hyun Suk WANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190322787
    Abstract: Disclosed is a triblock copolymer including two terminal blocks derived from a block copolymer and a middle block incorporated between the terminal blocks. The middle block has a higher surface energy than the terminal blocks. Also disclosed is a method for preparing the triblock copolymer. The preparation method provides a generalized approach that is highly applicable to processes for the mass production of block copolymers and can be applied to various combinations of block copolymers as well as to specific combinations of copolymers. Also disclosed is a method for nanopatterning using the triblock copolymer. The nanopatterning method enables the formation of nanopatterns with sub-10 nm feature size with simple process and reduced cost. Therefore, the nanopatterning method can be widely used in various industrial fields such as semiconductor lithography and memory devices.
    Type: Application
    Filed: April 8, 2019
    Publication date: October 24, 2019
    Applicants: Korea University Research and Business Foundation, Institute for Research & Industry Cooperation, Pusan National University
    Inventors: Joona BANG, Sanghoon WOO, Youngson CHOE, June HUH, Hyun Suk WANG