Patents by Inventor Hyuntaek OH
Hyuntaek OH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12360451Abstract: A method of manufacturing a semiconductor device, the method including forming a photoresist material layer on a lower film, the photoresist material layer including a crosslinking molecule having a molecular weight of about 1,000 to about 4,000; exposing a partial region of the photoresist material layer; removing an unexposed portion of the photoresist material layer to form a photoresist pattern; and processing the lower film using the photoresist pattern, wherein the crosslinking molecule includes a perfluoro alkyl moiety, the perfluoro alkyl moiety including a carbon-fluorine bond that dissociates in response to the exposing of the partial region of the photoresist material layer.Type: GrantFiled: March 16, 2022Date of Patent: July 15, 2025Assignees: SAMSUNG ELECTRONICS CO., LTD., INHA Industry Partnership InstituteInventors: Chawon Koh, Tsunehiro Nishi, Hyunwoo Kim, Jinkyun Lee, Junil Kim, Hyuntaek Oh, Jihoon Woo, Seungsoo Choi
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Publication number: 20250062771Abstract: There is provided a phase locked loop circuit including a phase-frequency detection circuit configured to receive a reference clock signal and a feedback clock signal having a first phase difference from each other, adjust a phase gain based on first phase difference, and generate a first and a second control signals based on the phase gain, a lock detection circuit configured to generate a lock detection signal based on the first phase difference, a charge pump circuit configured to generate a loop filter input signal based on the first and second control signals, a loop filter configured to adjust impedance based on the activated lock detection signal and generate a loop filter output signal based on the adjusted impedance, an oscillator configured to generate a clock signal based on the loop filter output signal, and a divider configured to generate the feedback clock signal by dividing the clock signal.Type: ApplicationFiled: August 14, 2024Publication date: February 20, 2025Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Dohun Jang, Junhyeok Yang, Hyuntaek Oh, Dokyung Lim, Chanyoung Jeong
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Patent number: 11964250Abstract: Methods and systems for synthesizing multicompartment capsules are disclosed, as well as multicompartment polymer capsules formed in accordance with disclosed techniques. At least one plurality of polymer capsules are formed via a capsule-forming process. A feed solution and a reservoir solution are provided, each comprising a biopolymer. The feed solution biopolymer and the reservoir solution biopolymer have opposite charges. Droplets of the feed solution are introduced into the reservoir solution, thereby forming via electrostatic complexation a plurality of polymer capsules. At least a portion of the resulting polymer capsules are then encapsulated in a larger polymer capsule via a similar process, wherein the feed solution utilized for the encapsulation process also comprises the formed smaller capsules.Type: GrantFiled: August 14, 2018Date of Patent: April 23, 2024Inventors: Hyuntaek Oh, Srinivasa R. Raghavan, William E. Bentley, Xi Lu, Jessica Lynn Terrell, So Hyun Ahn
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Publication number: 20220299874Abstract: A method of manufacturing a semiconductor device, the method including forming a photoresist material layer on a lower film, the photoresist material layer including a crosslinking molecule having a molecular weight of about 1,000 to about 4,000; exposing a partial region of the photoresist material layer; removing an unexposed portion of the photoresist material layer to form a photoresist pattern; and processing the lower film using the photoresist pattern, wherein the crosslinking molecule includes a perfluoro alkyl moiety, the perfluoro alkyl moiety including a carbon-fluorine bond that dissociates in response to the exposing of the partial region of the photoresist material layer.Type: ApplicationFiled: March 16, 2022Publication date: September 22, 2022Applicant: INHA Industry Partnership InstituteInventors: Chawon KOH, Tsunehiro NISHI, Hyunwoo KIM, Jinkyun LEE, Junil KIM, Hyuntaek OH, Jihoon WOO, Seungsoo CHOI
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Publication number: 20220137511Abstract: Provided are a resist composition and a method of forming a pattern using the same. According to the inventive concept, the resist composition may include a copolymer represented by Formula 1 below.Type: ApplicationFiled: November 1, 2021Publication date: May 5, 2022Applicant: Inha University Research and Business FoundationInventors: Jinkyun LEE, Yejin KU, Hyuntaek OH
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Publication number: 20200171456Abstract: Methods and systems for synthesizing multicompartment capsules are disclosed, as well as multicompartment polymer capsules formed in accordance with disclosed techniques. At least one plurality of polymer capsules are formed via a capsule-forming process. A feed solution and a reservoir solution are provided, each comprising a biopolymer. The feed solution biopolymer and the reservoir solution biopolymer have opposite charges. Droplets of the feed solution are introduced into the reservoir solution, thereby forming via electrostatic complexation a plurality of polymer capsules. At least a portion of the resulting polymer capsules are then encapsulated in a larger polymer capsule via a similar process, wherein the feed solution utilized for the encapsulation process also comprises the formed smaller capsules.Type: ApplicationFiled: August 14, 2018Publication date: June 4, 2020Applicant: University of Maryland, College ParkInventors: Hyuntaek Oh, Srinivasa R. Raghavan, William E. Bentley, Xi Lu, Jessica Lynn Terrell, So Hyun Ahn
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Patent number: 9952921Abstract: Provided are a system and method for detecting and predicting anomalies based on analysis of time-series data. According to an embodiment of the present disclosure, an abnormality detecting and predicting system includes a database configured to store past case data related to a state of a monitored object; a data collector configured to collect time-series status information of the monitored object; an abnormality detector configured to compare the status information with an abnormality detecting reference in a preset detecting interval and detect an occurrence of an abnormality of the monitored object; a similar case selector configured to select a similar case having a highest degree of similarity to the status information among the past case data when the occurrence of an abnormality is detected by the abnormality detector; and a predictor configured to predict proliferation or diminishing of a detected abnormality using the similar case and an abnormality proliferation predicting reference.Type: GrantFiled: December 24, 2014Date of Patent: April 24, 2018Assignee: SAMSUNG SDS CO., LTD.Inventors: Sundeuk Kim, Hyuntaek Oh, Sungil Kim
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Publication number: 20160103724Abstract: Provided are a system and method for detecting and predicting anomalies based on analysis of time-series data. According to an embodiment of the present disclosure, an abnormality detecting and predicting system includes a database configured to store past case data related to a state of a monitored object; a data collector configured to collect time-series status information of the monitored object; an abnormality detector configured to compare the status information with an abnormality detecting reference in a preset detecting interval and detect an occurrence of an abnormality of the monitored object; a similar case selector configured to select a similar case having a highest degree of similarity to the status information among the past case data when the occurrence of an abnormality is detected by the abnormality detector; and a predictor configured to predict proliferation or diminishing of a detected abnormality using the similar case and an abnormality proliferation predicting reference.Type: ApplicationFiled: December 24, 2014Publication date: April 14, 2016Applicant: SAMSUNG SDS CO., LTD.Inventors: Sundeuk KIM, Hyuntaek OH, Sungil KIM
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Patent number: 9263310Abstract: A substrate treating apparatus is provided. The substrate treating apparatus includes a loading/unloading unit, a process unit in which a substrate treating process is performed, a loadlock unit disposed between the loading/unloading unit and the process unit, and a carrying member transferring a substrate between the process unit and the loadlock unit. Herein, the carrying member is provided in the process unit and the loadlock unit, and the loading/unloading unit, the loadlock unit, and the process unit are sequentially disposed.Type: GrantFiled: June 21, 2011Date of Patent: February 16, 2016Assignee: SEMES CO., LTD.Inventors: Sungho Kim, Choonsik Kim, Yongtaek Eom, Hyuntaek Oh, Hyungkeun Park
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Publication number: 20110312189Abstract: A substrate treating apparatus is provided. The substrate treating apparatus includes a loading/unloading unit, a process unit in which a substrate treating process is performed, a loadlock unit disposed between the loading/unloading unit and the process unit, and a carrying member transferring a substrate between the process unit and the loadlock unit. Herein, the carrying member is provided in the process unit and the loadlock unit, and the loading/unloading unit, the loadlock unit, and the process unit are sequentially disposed.Type: ApplicationFiled: June 21, 2011Publication date: December 22, 2011Applicant: SEMES CO., LTD.Inventors: Sungho KIM, Choonsik KIM, Yongtaek EOM, Hyuntaek OH, Hyungkeun PARK