Abstract: A touch screen panel including first sense electrodes including a plurality of first sense cells arranged on a substrate in a first direction and first connection patterns electrically connecting adjacent first sense cells of the plurality of first sense cells; second sense electrodes including a plurality of second sense cells arranged on the substrate in a second direction that crosses the first direction, relay patterns arranged within the first sense electrodes, and metal patterns connected between the relay patterns and second sense cells of the plurality of second sense cells adjacent to the relay patterns; and auxiliary patterns electrically connecting two regions of the first sense electrodes divided by the relay patterns and the metal patterns.

Abstract: In a method of manufacturing a display device, a first insulating layer is formed on a semiconductor pattern. Ions of a first concentration are injected into source and drain domains of the semiconductor pattern and a lower electrode of the semiconductor pattern by using a mask pattern that selectively overlaps a channel domain of the semiconductor pattern and is positioned on the top of the first insulating layer. The mask pattern is removed. An ion injection process of injecting ions of a second concentration lower than the first concentration into the semiconductor pattern of the channel domain is directly performed in the first insulating layer. A gate electrode that overlaps the channel domain is formed on the top of the first insulating layer. An upper electrode that overlaps the lower electrode is formed on the top of the first insulating layer.

Abstract: Provided are a liquid crystal display device and a method of manufacturing the same. The liquid crystal display device includes opposing first and second substrates, the first and second substrates including a display area for displaying an image and a non-display area surrounding the display area, a first black matrix disposed in the non-display area on the first substrate, a first insulation layer disposed on the second substrate, first and second alignment layers disposed on at least one of the first black matrix and the first insulation layer, the first and second alignment layers extending from the display area toward the non-display area, and a seal pattern disposed on the first insulation layer in the non-display area. The seal pattern is spaced apart from at least one of the first and second alignment layers.

Abstract: Present embodiments may include a liquid crystal display apparatus, using a line reversal method, wherein at least one pulse is inserted between charging periods, and a method of driving the liquid crystal display apparatus. According to present embodiments, in a liquid crystal display apparatus employing a polarity reversal method, audible noise may be removed without increasing a frame frequency and reducing a charging time of a storage capacitor.

Abstract: A liquid crystal display (LCD) device is disclosed. The LCD device includes a noise removal unit configured to reduce noise coupled to the data lines.

Abstract: A data driver connected to the display panel and applying an image data signal to the plurality of pixels; a scan driver connected to the display panel and applying an image scan signal to the plurality of pixels for the image data signal to be applied to the plurality of pixels, and a signal controller controlling the data driver and the scan driver. The data driver applies a data signal having a predetermined pattern to the display panel in a data porch period for adjusting synchronization between frames. The data signal applied during the data porch period may be determined in accordance with frames adjacent the data porch period.

Abstract: In a method of manufacturing a display device, a first insulating layer is formed on a semiconductor pattern. Ions of a first concentration are injected into source and drain domains of the semiconductor pattern and a lower electrode of the semiconductor pattern by using a mask pattern that selectively overlaps a channel domain of the semiconductor pattern and is positioned on the top of the first insulating layer. The mask pattern is removed. An ion injection process of injecting ions of a second concentration lower than the first concentration into the semiconductor pattern of the channel domain is directly performed in the first insulating layer. A gate electrode that overlaps the channel domain is formed on the top of the first insulating layer. An upper electrode that overlaps the lower electrode is formed on the top of the first insulating layer.

Abstract: A method or manufacturing an array substrate at a low cost. Silicon patterns are formed. A first impurity is implanted at a high concentration. Gate metal patterns are formed. A second impurity is implanted. The first impurity is implanted at a low concentration. A pixel electrode is formed. The first impurity is simultaneously implanted into partial portions of the pixel pattern part, the storage pattern part, and the driving pattern part.

Abstract: A display substrate includes a pixel, a first pad part and a second pad part. The pixel is disposed in a display area and includes a switching element connected to a gate line and a data line and a pixel electrode electrically connected to the switching element. The first pad part is disposed in a peripheral area outside the display area. The first pad part includes a first pad having a first conductive pattern formed from a first conductive layer, a second conductive pattern overlapped with the first conductive pattern and formed from a second conductive layer and an insulation layer disposed between the first and second conductive patterns. The second pad part is disposed in the peripheral area. The second pad part includes a second pad having a third conductive pattern connected to the first conductive pattern of the first pad.

Abstract: A method or manufacturing an array substrate at a low cost. Silicon patterns are formed. A first impurity is implanted at a high concentration. Gate metal patterns are formed. A second impurity is implanted. The first impurity is implanted at a low concentration. A pixel electrode is formed. The first impurity is simultaneously implanted into partial portions of the pixel pattern part, the storage pattern part, and the driving pattern part.