Patents by Inventor Hyun-Yong Cho

Hyun-Yong Cho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240293569
    Abstract: Provided herein are a linker compound, a linker-drug conjugate where the linker compound is conjugated to a drug, an antibody-drug conjugate where a drug is conjugated to an antibody or an antigen binding fragment thereof via the linker compound, and a method for treating cancer by administering the antibody-drug conjugate to a subject in need thereof.
    Type: Application
    Filed: February 9, 2024
    Publication date: September 5, 2024
    Applicant: PINOTBIO, INC.
    Inventors: Doo Young JUNG, Hyun Yong Cho, Gangadhar Rao Mathi
  • Publication number: 20240108632
    Abstract: Ophthalmic therapeutic agents having as pharmaceutically active ingredient a poorly water soluble drug of formula 1 are described. Specifically, an ophthalmic formulation containing an inclusion complex of a poorly soluble drug of formula 1 enclosed in cyclodextrin or a cyclodextrin derivative in an aqueous solution of pH 10 or higher is administered to a patient in need of optic nerve protection.
    Type: Application
    Filed: April 28, 2023
    Publication date: April 4, 2024
    Applicants: PINOTBIO, INC., AJOU UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION
    Inventors: Young-joon Park, Sang-won Jeon, Ju-yeong Kim, Jin-soo Lee, Hyun-yong Cho
  • Publication number: 20220281910
    Abstract: The present disclosure provides the dinucleotide compounds which is useful for treating various cancers. The present disclosure also provides a composition comprising the compound or its pharmaceutically acceptable salt. The present disclosure also provides a medical use of the compound, its salt or the composition comprising the compound or its pharmaceutically acceptable salt for treating cancer. The present disclosure also provides a method of treatment of cancer comprising administering the compound, its salt or the composition comprising the compound or its salt to a subject in need of such treatment.
    Type: Application
    Filed: July 29, 2020
    Publication date: September 8, 2022
    Inventors: Doo-Young JUNG, Jin-Soo LEE, Hyun-Yong CHO
  • Patent number: 10343541
    Abstract: A method is provided for controlling engagement between a vehicle and a charging device includes: attempting to discover a charging device; when the charging device is discovered, identifying the discovered charging device on a list of charging equipment stored in the vehicle; determining a charging history count of the discovered charging device according to the stored list of charging equipment; when the charging history count of the discovered charging device is greater than or equal to a predetermined number, performing a charging operation with the discovered charging device; and when the charging history count of the discovered charging device is less than the predetermined number, performing a Signal Level Attenuation Characterization (SLAC) procedure against the discovered charging device.
    Type: Grant
    Filed: September 8, 2016
    Date of Patent: July 9, 2019
    Assignees: Hyundai Motor Company, Kia Motors Corporation, Yura Corporation Co., Ltd.
    Inventors: Myung Sun Jeong, Young Jong Lee, Hyun Yong Cho, Myoung Sik Kim
  • Publication number: 20170197519
    Abstract: A method is provided for controlling engagement between a vehicle and a charging device includes: attempting to discover a charging device; when the charging device is discovered, identifying the discovered charging device on a list of charging equipment stored in the vehicle; determining a charging history count of the discovered charging device according to the stored list of charging equipment; when the charging history count of the discovered charging device is greater than or equal to a predetermined number, performing a charging operation with the discovered charging device; and when the charging history count of the discovered charging device is less than the predetermined number, performing a Signal Level Attenuation Characterization (SLAC) procedure against the discovered charging device.
    Type: Application
    Filed: September 8, 2016
    Publication date: July 13, 2017
    Inventors: Myung Sun Jeong, Young Jong Lee, Hyun Yong Cho, Myoung Sik Kim
  • Patent number: 9487694
    Abstract: Disclosed are a photosensitive resin composition including a composite dye that includes a red fluorescent dye re-emitting light at a 400 to 800 nm fluorescent wavelength; and a metal complex dye including at least one metal ion selected from Mg, Ni, Co, Zn, Cr, Pt, and Pd, and a color filter using the same.
    Type: Grant
    Filed: May 30, 2012
    Date of Patent: November 8, 2016
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Yun Kwon, Youn-Je Ryu, Gyu-Seok Han, Hwan-Sung Cheon, Hyun-Yong Cho
  • Patent number: 9425550
    Abstract: A lever type connector includes a housing capable of accommodating a terminal in an outlet; and levers connected onto both sides of the housing, respectively so as to pivot in a detachable direction of the terminal. In the housing, fixation protrusions, connected with the levers, are formed on both sides of the housing, respectively, and the respective fixation protrusions have different shapes.
    Type: Grant
    Filed: May 22, 2015
    Date of Patent: August 23, 2016
    Assignees: HYUNDAI MOTOR COMPANY, KIA MOTORS CORPORATION
    Inventors: Hyun Yong Cho, Jin Soo Ryu, Bong Hun Choi
  • Publication number: 20160134052
    Abstract: A lever type connector includes a housing capable of accommodating a terminal in an outlet; and levers connected onto both sides of the housing, respectively so as to pivot in a detachable direction of the terminal. In the housing, fixation protrusions, connected with the levers, are formed on both sides of the housing, respectively, and the respective fixation protrusions have different shapes.
    Type: Application
    Filed: May 22, 2015
    Publication date: May 12, 2016
    Inventors: Hyun Yong CHO, Jin Soo RYU, Bong Hun CHOI
  • Patent number: 9268221
    Abstract: Provided is a positive photosensitive resin composition that includes (A) a polybenzoxazole precursor including a first polybenzoxazole precursor including a repeating unit represented by Chemical Formula 1 and a repeating unit represented by Chemical Formula 2, and having a thermally polymerizable functional group at least one terminal end; (B) a photosensitive diazoquinone compound; (C) a silane compound; (D) a phenol compound; and (E) a solvent. A photosensitive resin film fabricated using the positive photosensitive resin composition is provided.
    Type: Grant
    Filed: July 26, 2011
    Date of Patent: February 23, 2016
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Young Jeong, Min-Kook Chung, Jong-Hwa Lee, Mi-Ra Im, Hyun-Yong Cho, Myoung-Hwan Cha, Hwan-Sung Cheon
  • Patent number: 9256118
    Abstract: Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin selected from a polybenzoxazole precursor, a polyimide precursor, and a combination thereof, (B) a photosensitive diazoquinone compound, (C) a phenol compound, (D) an organic dye and (E) a solvent, wherein the organic dye (D) includes at least one red dye having an absorption wavelength of 590 to 700 nm, at least one yellow dye having an absorption wavelength of 550 to 590 nm, and at least one blue dye having an absorption wavelength of 450 to 500 nm.
    Type: Grant
    Filed: July 17, 2012
    Date of Patent: February 9, 2016
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Yun Kwon, Jong-Hwa Lee, Hyun-Yong Cho, Dae-Yun Kim, Sang-Kyeon Kim, Sang-Kyun Kim, Sang-Soo Kim, Eun-Kyung Yoon, Jun-Ho Lee, Jin-Young Lee, Hwan-Sung Cheon, Chung-Beom Hong, Eun-Ha Hwang
  • Patent number: 9176381
    Abstract: This disclosure relates to a positive photosensitive resin composition including (A) a resin precursor including a polybenzoxazole precursor, a polyamic acid, or a combination thereof, (B) a dissolution-controlling agent having a boiling point ranging from about 210° C. to about 400° C. and a polarity ranging from about 1 D to about 4 D, (C) an acid generator, (D) a silane-based compound, and (E) a solvent. The polybenzoxazole precursor includes a repeating unit represented by Chemical Formula 1, or both of repeating units represented by Chemical Formulae 1 and 2 and has a thermally polymerizable functional group at at least one end. The polyamic acid includes a repeating unit of Chemical Formulae 50 and 51.
    Type: Grant
    Filed: December 9, 2010
    Date of Patent: November 3, 2015
    Assignee: Cheil Industries Inc.
    Inventors: Jeong-Woo Lee, Yong-Sik Yoo, Hyun-Yong Cho, Ji-Young Jeong, Doo-Young Jung, Jong-Hwa Lee, Min-Kook Chung, Myoung-Hwan Cha, Hwan-Sung Cheon
  • Patent number: 9040213
    Abstract: Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin prepared by a phosphorous-containing diamine represented by the following Chemical Formula 1, (B) a photosensitive diazoquinone compound, and (C) a solvent. A photosensitive resin film prepared using the same and a semiconductor device including the photosensitive resin film are also disclosed. In Chemical Formula 1, each substituent is the same as defined in the detailed description.
    Type: Grant
    Filed: September 5, 2012
    Date of Patent: May 26, 2015
    Assignee: Cheil Industries Inc.
    Inventors: Hyun-Yong Cho, Sang-Soo Kim, Eun-Kyung Yoon, Jong-Hwa Lee, Jun-Ho Lee, Eun-Ha Hwang, Ji-Yun Kwon, Jin-Young Lee
  • Patent number: 9023559
    Abstract: Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin; (B) a novolac resin including a repeating unit represented by Chemical Formula 6; (C) a photosensitive diazoquinone compound; (D) a silane compound; and (E) a solvent, a photosensitive resin film prepared by using the positive photosensitive resin composition, and a semiconductor device including the photosensitive resin film.
    Type: Grant
    Filed: November 23, 2011
    Date of Patent: May 5, 2015
    Assignee: Cheil Industries Inc.
    Inventors: Jong-Hwa Lee, Hyun-Yong Cho, Mi-Ra Im, Hwan-Sung Cheon, Min-Kook Chung, Ji-Young Jeong, Myoung-Hwan Cha
  • Patent number: 8921019
    Abstract: Disclosed are a positive photosensitive resin composition that includes (A) an alkali soluble resin including a polybenzoxazole precursor, a polyimide precursor, or a combination thereof, (B) a photosensitive diazoquinone compound, (C) a phenol compound, (D) at least one organic dye having an absorption wavelength of about 400 nm to about 700 nm, and (E) a solvent, wherein the organic dye (D) is included in an amount of about 1 to about 40 parts by weight based on about 100 parts by weight of the alkali soluble resin (A), and a photosensitive resin layer and a display device using the same.
    Type: Grant
    Filed: September 5, 2012
    Date of Patent: December 30, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Yun Kwon, Jin-Hee Kang, Dae-Yun Kim, Sang-Kyeon Kim, Sang-Kyun Kim, Sang-Soo Kim, Kun-Bae Noh, Eun-Kyung Yoon, Jong-Hwa Lee, Jun-Ho Lee, Jin-Young Lee, Hwan-Sung Cheon, Hyun-Yong Cho, Chung-Beom Hong, Eun-Ha Hwang
  • Publication number: 20140319421
    Abstract: Disclosed are a photosensitive resin composition including a composite dye that includes a red fluorescent dye re-emitting light at a 400 to 800 nm fluorescent wavelength; and a metal complex dye including at least one metal ion selected from Mg, Ni, Co, Zn, Cr, Pt, and Pd, and a color filter using the same.
    Type: Application
    Filed: May 30, 2012
    Publication date: October 30, 2014
    Inventors: Ji-Yun Kwon, Youn-Je Ryu, Gyu-Seok Han, Hwan-Sung Cheon, Hyun-Yong Cho
  • Patent number: 8841064
    Abstract: Disclosed are a positive photosensitive resin composition that includes (A) an alkali soluble resin; (B) a dissolution controlling agent including the compound represented by Chemical Formula 6; (C) a photosensitive diazoquinone compound; (D) a silane compound; and (E) a solvent, and a photosensitive resin film prepared by using the same.
    Type: Grant
    Filed: November 11, 2011
    Date of Patent: September 23, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Myoung-Hwan Cha, Jong-Hwa Lee, Mi-Ra Im, Min-Kook Chung, Ji-Young Jeong, Hyun-Yong Cho, Hwan-Sung Cheon
  • Patent number: 8815489
    Abstract: Disclosed are a positive photosensitive resin composition that includes (A) a polybenzoxazole precursor including a first polybenzoxazole precursor including a repeating unit represented by the following Chemical Formula 1 and a repeating unit represented by the following Chemical Formula 2, and having a thermally polymerizable functional group at at least one of the terminal end; (B) a dissolution controlling agent including a novolac resin including a repeating unit represented by the following Chemical Formula 4; (C) a photosensitive diazoquinone compound; (D) a silane compound; (E) an acid generator; and (F) a solvent, a photosensitive resin film prepared using the same, and a semiconductor device including the photosensitive resin film.
    Type: Grant
    Filed: August 21, 2012
    Date of Patent: August 26, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Young Jeong, Jin-Young Lee, Jong-Hwa Lee, Hyun-Yong Cho, Sang-Soo Kim, Eun-Kyung Yoon, Jun-Ho Lee, Myoung-Hwan Cha, Eun-Ha Hwang
  • Patent number: 8785103
    Abstract: Disclosed is a photosensitive novolac resin including a structural unit represented by the following Chemical Formula 1 and structural unit represented by the following Chemical Formula 2, wherein R11, R12, R13, and R14 in Chemical Formulae 1 and 2 are the same as defined in the detailed description, a positive photosensitive resin composition including the same, a photosensitive resin film fabricated using the same, and a semiconductor device including the photosensitive resin composition.
    Type: Grant
    Filed: August 21, 2012
    Date of Patent: July 22, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Jong-Hwa Lee, Hyun-Yong Cho, Min-Kook Chung, Ji-Young Jeong, Myoung-Hwan Cha
  • Publication number: 20140170562
    Abstract: Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin selected from a polybenzoxazole precursor, a polyimide precursor, and a combination thereof, (B) a photosensitive diazoquinone compound, (C) a phenol compound, (D) an organic dye and (E) a solvent, wherein the organic dye (D) includes at least one red dye having an absorption wavelength of 590 to 700 nm, at least one yellow dye having an absorption wavelength of 550 to 590 nm, and at least one blue dye having an absorption wavelength of 450 to 500 nm.
    Type: Application
    Filed: July 17, 2012
    Publication date: June 19, 2014
    Inventors: Ji-Yun Kwon, Jong-Hwa Lee, Hyun-Yong Cho, Dae-Yun Kim, Sang-Kyeon Kim, Sang-Kyun Kim, Sang-Soo Kim, Eun-Kyung Yoon, Jun-Ho Lee, Jin-Young Lee, Hwan-Sung Cheon, Chung-Beom Hong, Eun-Ha Hwang
  • Patent number: 8735029
    Abstract: Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin including a polybenzoxazole precursor, a polyimide precursor, or a combination thereof, (B) a photosensitive diazoquinone compound, (C) a compound represented by the following Chemical Formula 1, and (D) a solvent, and a display device and an organic light emitting device using the same. The Chemical Formula 1 is the same as defined in the detailed description.
    Type: Grant
    Filed: September 5, 2012
    Date of Patent: May 27, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Eun-Kyung Yoon, Eun-Ha Hwang, Jong-Hwa Lee, Ji-Yun Kwon, Dae-Yun Kim, Sang-Kyeon Kim, Sang-Kyun Kim, Sang-Soo Kim, Kun-Bae Noh, Jun-Ho Lee, Jin-Young Lee, Hyun-Yong Cho, Chung-Beom Hong