Patents by Inventor Hyung-Gu Jeong

Hyung-Gu Jeong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10884335
    Abstract: Disclosed herein are a black photosensitive resin composition and a black column spacer prepared therefrom. The black photosensitive resin composition may form a cured film exhibiting good adhesion to a substrate, good height difference property, good surface roughness and high light shielding property (optical density), and may be effectively used for the formation of a cured film, particularly a black column spacer, of a liquid crystal display (LCD) or an organic light-emitting diode (OLED) display.
    Type: Grant
    Filed: November 21, 2016
    Date of Patent: January 5, 2021
    Assignee: Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Hyung Gu Jeong, Seok-Bong Park, Ji Ung Kim
  • Publication number: 20190018318
    Abstract: Disclosed herein are a black photosensitive resin composition and a black column spacer prepared therefrom. The black photosensitive resin composition may form a cured film exhibiting good adhesion to a substrate, good height difference property, good surface roughness and high light shielding property (optical density), and may be effectively used for the formation of a cured film, particularly a black column spacer, of a liquid crystal display (LCD) or an organic light-emitting diode (OLED) display.
    Type: Application
    Filed: November 21, 2016
    Publication date: January 17, 2019
    Inventors: Hyung Gu Jeong, Seok-Bong Park, Ji Ung Kim
  • Patent number: 9065056
    Abstract: A semi-fluoroalkyl group substituted organic semiconductor polymer and an organic thin film transistor including the same are disclosed. A structure in which hydrogen of only a terminal of an alkyl group is substituted with fluorine exhibits significantly increased hole mobility, and significantly improved properties in terms of thermal stability and chemical stability, as compared to a structure in which all hydrogens coupled to a thiophene ring are substituted with fluorine, or a structure in which hydrogen of the terminal thereof is not substituted with fluorine and only hydrogens of the remaining portion are coupled to the thiophene ring.
    Type: Grant
    Filed: October 18, 2013
    Date of Patent: June 23, 2015
    Assignee: GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Dong-Yu Kim, Hyung-Gu Jeong, Bogyu Lim
  • Publication number: 20140110689
    Abstract: A semi-fluoroalkyl group substituted organic semiconductor polymer and an organic thin film transistor including the same are disclosed. A structure in which hydrogen of only a terminal of an alkyl group is substituted with fluorine exhibits significantly increased hole mobility, and significantly improved properties in terms of thermal stability and chemical stability, as compared to a structure in which all hydrogens coupled to a thiophene ring are substituted with fluorine, or a structure in which hydrogen of the terminal thereof is not substituted with fluorine and only hydrogens of the remaining portion are coupled to the thiophene ring.
    Type: Application
    Filed: October 18, 2013
    Publication date: April 24, 2014
    Applicant: GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Dong-Yu KIM, Hyung-Gu JEONG, Bogyu LIM
  • Patent number: 8263431
    Abstract: Provided are an organic semiconductor compound using thiazole, and an organic thin film transistor having an organic semiconductor layer formed of the organic semiconductor compound using thiazole. The novel organic semiconductor compound including thiazole has liquid crystallinity and excellent thermal stability, and thus is provided to form an organic semiconductor layer in the organic thin film transistor. To this end, a silicon oxide layer is formed on a silicon substrate, and an organic semiconductor layer including thiazole is formed on the silicon oxide layer. In addition, source and drain electrodes are formed on both edge portions of the organic semiconductor layer. The organic thin film transistor using the organic semiconductor layer has an improved on/off ratio and excellent thermal stability. Also, a solution process can be applied in its manufacture.
    Type: Grant
    Filed: January 24, 2011
    Date of Patent: September 11, 2012
    Assignee: Gwangju Institute of Sciences and Technology
    Inventors: Dong-Yu Kim, Bogyu Lim, Kang-Jun Baeg, Hyung-Gu Jeong, Seung-Hwan Oh, Hong-Ju Park
  • Publication number: 20110177653
    Abstract: Provided are an organic semiconductor compound using thiazole, and an organic thin film transistor having an organic semiconductor layer formed of the organic semiconductor compound using thiazole. The novel organic semiconductor compound including thiazole has liquid crystallinity and excellent thermal stability, and thus is provided to form an organic semiconductor layer in the organic thin film transistor. To this end, a silicon oxide layer is formed on a silicon substrate, and an organic semiconductor layer including thiazole is formed on the silicon oxide layer. In addition, source and drain electrodes are formed on both edge portions of the organic semiconductor layer. The organic thin film transistor using the organic semiconductor layer has an improved on/off ratio and excellent thermal stability. Also, a solution process can be applied in its manufacture.
    Type: Application
    Filed: January 24, 2011
    Publication date: July 21, 2011
    Applicant: Gwangju Institute of Science and Technology
    Inventors: Dong-Yu Kim, Bogyu Lim, Kang-Jun Baeg, Hyung-Gu Jeong, Seung-Hwan Oh, Hong-Ju Park
  • Patent number: 7897963
    Abstract: Provided are an organic semiconductor compound using thiazole, and an organic thin film transistor having an organic semiconductor layer formed of the organic semiconductor compound using thiazole. The novel organic semiconductor compound including thiazole has liquid crystallinity and excellent thermal stability, and thus is provided to form an organic semiconductor layer in the organic thin film transistor. To this end, a silicon oxide layer is formed on a silicon substrate, and an organic semiconductor layer including thiazole is formed on the silicon oxide layer. In addition, source and drain electrodes are formed on both edge portions of the organic semiconductor layer. The organic thin film transistor using the organic semiconductor layer has an improved on/off ratio and excellent thermal stability. Also, a solution process can be applied in its manufacture.
    Type: Grant
    Filed: December 1, 2008
    Date of Patent: March 1, 2011
    Assignee: Gwangju Institute of Science and Technology
    Inventors: Dong-Yu Kim, Bogyu Lim, Kang-Jun Baeg, Hyung-Gu Jeong, Seung-Hwan Oh, Hong-Ju Park
  • Publication number: 20090152538
    Abstract: Provided are an organic semiconductor compound using thiazole, and an organic thin film transistor having an organic semiconductor layer formed of the organic semiconductor compound using thiazole. The novel organic semiconductor compound including thiazole has liquid crystallinity and excellent thermal stability, and thus is provided to form an organic semiconductor layer in the organic thin film transistor. To this end, a silicon oxide layer is formed on a silicon substrate, and an organic semiconductor layer including thiazole is formed on the silicon oxide layer. In addition, source and drain electrodes are formed on both edge portions of the organic semiconductor layer. The organic thin film transistor using the organic semiconductor layer has an improved on/off ratio and excellent thermal stability. Also, a solution process can be applied in its manufacture.
    Type: Application
    Filed: December 1, 2008
    Publication date: June 18, 2009
    Applicant: Gwangju Institute of Science and Technology
    Inventors: Dong-Yu Kim, Bogyu Lim, Kang-Jun Baeg, Hyung-Gu Jeong, Seung-Hwan Oh, Hong-Ju Park