Patents by Inventor Hyung Ju Ryu

Hyung Ju Ryu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Block copolymer
    Patent number: 10287429
    Abstract: The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, and can be provided with a variety of required functions without constraint.
    Type: Grant
    Filed: September 30, 2015
    Date of Patent: May 14, 2019
    Assignee: LG Chem, Ltd.
    Inventors: Mi Sook Lee, Jung Keun Kim, Se Jin Ku, No Jin Park, Je Gwon Lee, Eun Young Choi, Sung Soo Yoon, Hyung Ju Ryu
  • Block copolymer
    Patent number: 10281820
    Abstract: The present application relates to a block copolymer and uses thereof. The present application can provide a block copolymer—which exhibits an excellent self-assembling property and thus can be used effectively in a variety of applications—and uses thereof.
    Type: Grant
    Filed: September 30, 2015
    Date of Patent: May 7, 2019
    Assignee: LG Chem, Ltd.
    Inventors: Jung Keun Kim, Je Gwon Lee, Jeong Kyu Lee, Se Jin Ku, No Jin Park, Mi Sook Lee, Eun Young Choi, Sung Soo Yoon, Hyung Ju Ryu
  • Block copolymer
    Patent number: 10240035
    Abstract: The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation.
    Type: Grant
    Filed: September 30, 2015
    Date of Patent: March 26, 2019
    Assignee: LG Chem, Ltd.
    Inventors: Je Gwon Lee, No Jin Park, Jung Keun Kim, Se Jin Ku, Mi Sook Lee, Eun Young Choi, Sung Soo Yoon, Hyung Ju Ryu
  • BLOCK COPOLYMER
    Publication number: 20170306139
    Abstract: The present application relates to a block copolymer and uses thereof. The present application can provide a block copolymer—which exhibits an excellent self-assembling property and thus can be used effectively in a variety of applications—and uses thereof.
    Type: Application
    Filed: September 30, 2015
    Publication date: October 26, 2017
    Applicant: LG Chem, Ltd.
    Inventors: Jung Keun Kim, Je Gwon Lee, Jeong Kyu Lee, Se Jin Ku, No Jin Park, Mi Sook Lee, Eun Young Choi, Sung Soo Yoon, Hyung Ju Ryu
  • BLOCK COPOLYMER
    Publication number: 20170247492
    Abstract: The present application relates to a block copolymer and uses thereof. The present application can provide a block copolymer—which exhibits an excellent self-assembling property and thus can be used effectively in a variety of applications—and uses thereof.
    Type: Application
    Filed: September 30, 2015
    Publication date: August 31, 2017
    Applicant: LG Chem, Ltd.
    Inventors: Eun Young CHOI, No Jin PARK, Jung Keun KIM, Je Gwon LEE, Se Jin KU, Mi Sook LEE, Hyung Ju RYU, Sung Soo YOON
  • BLOCK COPOLYMER
    Publication number: 20170226261
    Abstract: The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation.
    Type: Application
    Filed: September 30, 2015
    Publication date: August 10, 2017
    Applicant: LG Chem, Ltd.
    Inventors: Je Gwon Lee, No Jin Park, Jung Keun Kim, Se Jin Ku, Mi Sook Lee, Eun Young Choi, Sung Soo Yoon, Hyung Ju Ryu
  • BLOCK COPOLYMER
    Publication number: 20170226260
    Abstract: The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation.
    Type: Application
    Filed: September 30, 2015
    Publication date: August 10, 2017
    Applicant: LG Chem, Ltd.
    Inventors: Mi Sook Lee, Jung Keun Kim, Se Jin Ku, No Jin Park, Je Gwon Lee, Eun Young Choi, Sung Soo Yoon, Hyung Ju Ryu
  • BLOCK COPOLYMER
    Publication number: 20170226258
    Abstract: The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, and can be provided with a variety of required functions without constraint.
    Type: Application
    Filed: September 30, 2015
    Publication date: August 10, 2017
    Applicant: LG Chem, Ltd.
    Inventors: Mi Sook Lee, Jung Keun Kim, Se Jin Ku, No Jin Park, Je Gwon Lee, Eun Young Choi, Sung Soo Yoon, Hyung Ju Ryu
  • BLOCK COPOLYMER
    Publication number: 20170226235
    Abstract: The present application relates to a monomer, a method for preparing a block copolymer, a block copolymer, and uses thereof. Each monomer of the present application exhibits an excellent self-assembling property and is capable of forming a block copolymer to which a variety of required functions are granted as necessary without constraint.
    Type: Application
    Filed: September 30, 2015
    Publication date: August 10, 2017
    Applicant: LG Chem, Ltd.
    Inventors: No Jin Park, Jung Keun Kim, Je Gwon Lee, Sung Soo Yoon, Se Jin Ku, Mi Sook Lee, Eun Young Choi, Hyung Ju Ryu
  • METHOD OF MANUFACTURING PATTERNED SUBSTRATE
    Publication number: 20170219922
    Abstract: Provided is a method of manufacturing a patterned substrate. The method may be applied to a process of manufacturing a device such as an electronic device or integrated circuit, or another use, for example, to manufacture an integrated optical system, a guidance and detection pattern of a magnetic domain memory, a flat panel display, a LCD, a thin film magnetic head or an organic light emitting diode, and used to construct a pattern on a surface to be used to manufacture a discrete tract medium such as an integrated circuit, a bit-patterned medium and/or a magnetic storage device such as a hard drive.
    Type: Application
    Filed: September 30, 2015
    Publication date: August 3, 2017
    Applicant: LG Chem, Ltd.
    Inventors: Se Jin Ku, Mi Sook Lee, Hyung Ju Ryu, Jung Keun Kim, Sung Soo Yoon, No Jin Park, Je Gwon Lee, Eun Young Choi
  • METHOD OF MANUFACTURING PATTERNED SUBSTRATE
    Publication number: 20170210938
    Abstract: Provided is a method of manufacturing a patterned substrate. The method may be applied to a process of manufacturing a device such as an electronic device or integrated circuit, or another use, for example, to manufacture an integrated optical system, a guidance and detection pattern of a magnetic domain memory, a flat panel display, a LCD, a thin film magnetic head or an organic light emitting diode, and used to construct a pattern on a surface to be used to manufacture a discrete tract medium such as an integrated circuit, a bit-patterned medium and/or a magnetic storage device such as a hard drive.
    Type: Application
    Filed: September 30, 2015
    Publication date: July 27, 2017
    Applicant: LG Chem, Ltd.
    Inventors: Se Jin Ku, Mi Sook Lee, Hyung Ju Ryu, Jung Keun Kim, Sung Soo Yoon, No Jin Park, Je Gwon Lee, Eun Young Choi