Patents by Inventor Hyung-Kook Park

Hyung-Kook Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12008197
    Abstract: A touch detection module includes driving electrodes extending parallel to each other, sensing electrodes crossing the driving electrodes, and a touch driver circuit for supplying touch driving signals to the driving electrodes and for detecting touch sensing signals through the sensing electrodes to determine touch position coordinates. The touch driver circuit selects between a group driving scheme and a sequential driving scheme for at least one frame. According to the group driving scheme, the touch driver circuit sorts the driving electrodes into groups, simultaneously drives driving electrodes in a same group among the groups, and drives the groups at different times. According to the sequential driving scheme, the touch driving circuit sequentially drives the driving electrodes.
    Type: Grant
    Filed: January 26, 2023
    Date of Patent: June 11, 2024
    Assignee: Samsung Display Co., Ltd.
    Inventors: Hyung Bae Kim, Sang Kook Kim, Tae Joon Kim, Jae Hyun Park, Ji Yeong Lee, Hyun Wook Cho
  • Publication number: 20240134487
    Abstract: A touch sensor includes first touch cells disposed in a first touch sensing area, the first touch cells each including a first touch pattern and a first dummy pattern, and second touch cells disposed in a second touch sensing area, the second touch cells each including a second touch pattern and a second dummy pattern. An area of a first dummy pattern area in which the first dummy pattern is disposed is greater than an area of a second dummy pattern area in which the second dummy pattern is disposed.
    Type: Application
    Filed: January 2, 2024
    Publication date: April 25, 2024
    Inventors: Hyung Bae KIM, Min Hong KIM, Sang Kook KIM, Tae Joon KIM, Jae Hyun PARK, Ji Yeong LEE, Hyun Wook CHO
  • Publication number: 20240120323
    Abstract: The present disclosure relates to an apparatus for fabricating a display panel including: an attachment member having a fixing portion in a pressurization direction to which a pressurization header is fixed, an attachment driving member configured to move the attachment member and the pressurization header in the pressurization direction or a detachment direction through a fixing frame of the attachment member, a first pressure sensing module between the pressurization header and the attachment member and configured to generate first pressure detection signals according to pressure applied to the pressurization header, a gradient setting module configured to set a gradient of the pressurization header based on magnitudes of the first pressure detection signals, and a gradient control module configured to adjust gradients of the pressurization header, the attachment member, and the fixing frame according to control of the gradient setting module.
    Type: Application
    Filed: September 6, 2023
    Publication date: April 11, 2024
    Inventors: Tae Hee LEE, Sung Kook PARK, Kyung Ho KIM, Young Seok SEO, Jae Gwang UM, Sang Hyun LEE, Hyung Suk HWANG
  • Patent number: 8298926
    Abstract: A method for making a silicon wafer includes the steps of generating and stabilizing embryos that become oxygen precipitates by succeeding thermal annealing applied during a semiconductor device manufacturing process. In the silicon wafer, embryos are substantially removed in a denuded zone, and embryos are distributed at a relatively higher concentration in a bulk region. Also, by controlling behaviors of embryos, a silicon wafer having a desired concentration profile of oxygen precipitates by succeeding thermal annealing is manufactured with high reliability and reproducibility.
    Type: Grant
    Filed: December 27, 2007
    Date of Patent: October 30, 2012
    Assignees: Siltron Inc., Hynix Semiconductor Inc.
    Inventors: Hyung-Kook Park, Jin-Kyun Hong, Kun Kim, Chung-Geun Koh
  • Publication number: 20100038755
    Abstract: A method for making a silicon wafer includes the steps of generating and stabilizing embryos that become oxygen precipitates by succeeding thermal annealing applied during a semiconductor device manufacturing process. In the silicon wafer, embryos are substantially removed in a denuded zone, and embryos are distributed at a relatively higher concentration in a bulk region. Also, by controlling behaviors of embryos, a silicon wafer having a desired concentration profile of oxygen precipitates by succeeding thermal annealing is manufactured with high reliability and reproducibility.
    Type: Application
    Filed: December 27, 2007
    Publication date: February 18, 2010
    Applicants: SILTRON INC., HYNIX SEMICONDUCTOR INC.
    Inventors: Hyung Kook Park, Jin-Kyun Hong, Kun Kim, Chung-Geun Koh