Patents by Inventor Hyung-ryul Kim

Hyung-ryul Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11970394
    Abstract: Provided is a method of synthesizing apatite powder by emitting a laser beam to a surface of a substrate immersed in a precursor solution. The method is including immersing a substrate in an apatite-forming precursor solution, emitting a laser beam to a region on a surface of the substrate immersed in the precursor solution, and obtaining apatite powder generated in the precursor solution.
    Type: Grant
    Filed: December 22, 2020
    Date of Patent: April 30, 2024
    Assignee: Korea Institute of Science and Technology
    Inventors: Hojeong Jeon, Seung Hoon Um, Yu Chan Kim, Hyung-Seop Han, Myoung-Ryul Ok, Hyunseon Seo, Hyun Kwang Seok
  • Publication number: 20240015346
    Abstract: Disclosed is a method for detecting abusing video information in an electronic device, the method including obtaining first information associated with a user participating in a broadcast and second information associated with a content of the broadcast, determining, based on the second information and a first list of one or more types of abuse, third information about whether the second information corresponds to one of the one or more types of abuse, providing, based on the third information, a service server involved in provision of the broadcast with the first information, the second information and the third information, and providing, based on the third information, a verification server associated with user sanctions with the first information and the second information.
    Type: Application
    Filed: July 5, 2023
    Publication date: January 11, 2024
    Applicant: Hyperconnect LLC
    Inventors: Seung Woo Choi, Hyeong Min Byun, Chan Ok Park, Hyung Ryul Kim, Il Hwan Ryou
  • Patent number: 6171353
    Abstract: Disclosed is an apparatus for effectively treating waste gases which are discharged during a processing of manufacturing semiconductors. The apparatus for treating waste gases according to an embodiment of the present invention comprises a waste gases heating chamber, a waste gases collecting chamber, a waste gases collecting chamber cover, a scraping device for the waste gases collecting chamber cover, a scraping device for the waste gases collecting chamber, and a driving source for driving the scraping device for the waste gases collecting chamber cover, and the scraping device for the waste gases collecting chamber. The apparatus for treating waste gases further includes a cooling tube which is disposed on an outer surface of the waste gases collecting chamber, for cooling waste gases.
    Type: Grant
    Filed: May 4, 1998
    Date of Patent: January 9, 2001
    Assignee: Union Industry Co., Ltd.
    Inventors: Young-bae Park, Hyung-ryul Kim