Abstract: A method controls an opening speed of a purge valve according to the purge gas concentration implemented by an active purge system (APS). A purge controller varies, when a valve opening speed of a purge control solenoid valve (PCSV) is controlled, the valve opening speed of the PCSV using any one among a low concentration rate coefficient, a high concentration rate coefficient, a coolant temperature rate coefficient, and an ambient air temperature rate coefficient, and performs the purge control using a difference between the valve opening speeds, and thus dualizes the valve opening speed of the PCSV according to a hydrocarbon (HC) concentration, thereby stably controlling the air-fuel ratio, and simultaneously, securing the purge rate and relatively stably control an air-fuel ratio in a state of high concentration purge execution.

Abstract: An embodiment is a method including controlling a purge fuel amount of an active purge system (APS), the controlling including correcting the purge fuel amount using a primary weighting factor obtained using an ambient air temperature and a hydrocarbon (HC) concentration in purge gas fuel as input values, and correcting the corrected purge fuel amount using a secondary weighting factor due to a purge learning value. Some embodiments further include controlling of the purge fuel amount applies a purge execution condition, and the purge execution condition on the basis of a negative pressure of an intake manifold and a vehicle speed of the vehicle in which a purge flow rate exhibits as being greater than or equal to a predetermined value.

Abstract: Provided are a source supplying unit and a method for supplying a source. The source supplying unit includes a pot configured to store a source material, an injector communicating with the pot to inject the source material evaporated from the pot, a high frequency coil part surrounding an outside of the pot, and a resistance-type heating part disposed at an outside of the injector. Since a high frequency induction heating method and a resistance-type heating method are combined to evaporate a source material to be supplied, a large amount of source material can be used, and the thickness and quality of a thin film can be easily controlled.