Abstract: An operating method of an extreme ultraviolet (EUV) lithography device includes defining a target image to render an illumination system, assigning priorities to respective positions of facets of a pupil facet mirror corresponding to the target image, assigning a mirror according to the assigned priorities using linear programming, generating the illumination system by selecting one of the facets of the pupil facet mirror based on a symmetry criterion, and converting mirror assignment information and source map information corresponding to the selected facet into a form recognizable by an EUV scanner.

Abstract: A reflective mask used in an EUV exposure process includes a mask substrate, a reflective layer on the mask substrate, and an absorption layer on the reflective layer. The reflective mask includes a main region, an out-of-band region surrounding the main region, and an alignment mark region outside a periphery of the out-of-band region. The absorption layer in the alignment mark region includes an alignment mark and an anti-reflection pattern adjacent the alignment mark, and the anti-reflection pattern includes line-and-space patterns having a predetermined line width in the alignment mark region.

Abstract: An operating method of an extreme ultraviolet (EUV) lithography device includes defining a target image to render an illumination system, assigning priorities to respective positions of facets of a pupil facet mirror corresponding to the target image, assigning a mirror according to the assigned priorities using linear programming, generating the illumination system by selecting one of the facets of the pupil facet mirror based on a symmetry criterion, and converting mirror assignment information and source map information corresponding to the selected facet into a form recognizable by an EUV scanner.

Abstract: Provided are encoded polymeric microparticles and a multiplexed bioassay using the encoded polymeric microparticles. Each of the encoded polymeric microparticles includes an encoded polymeric microparticle core and a silica shell surrounding the microparticle core. Further provided is a method for producing encoded polymeric microparticles. The method includes: mixing a photocurable material with a linker having a functional group polymerizable with the photocurable material and an alkoxysilyl group; applying patterned energy to cure the mixture, followed by encoding to obtain encoded polymeric microparticle cores; and treating the encoded polymeric microparticle cores with a silica precursor to form a silica shell on each encoded polymeric microparticle core.