Patents by Inventor Hyung-Yong Kim
Hyung-Yong Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240138174Abstract: Provided are an organic electronic element comprising an anode, a cathode, and an organic material layer between the anode and the cathode, and an electronic device comprising the organic electronic element, wherein the organic material layer comprises each compound represented by Formula 1, Formula 2, or Formula 3, thereby the driving voltage of the organic electronic element can be lowered and the luminous efficiency and lifespan can be improved.Type: ApplicationFiled: March 15, 2023Publication date: April 25, 2024Applicant: DUK SAN NEOLUX CO., LTD.Inventors: Hyo Min JIN, Bu Yong YUN, Jae Ho KIM, Hyung Dong LEE, Chi Hyun PARK
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Publication number: 20240128251Abstract: A display device includes a first conductive layer disposed on a substrate, a passivation layer disposed on the first conductive layer, a second conductive layer disposed on the passivation layer, a via layer disposed on the second conductive layer, a third conductive layer disposed on the via layer, the third conductive layer including a first electrode, a second electrode, a connection pattern, the first electrode, the second electrode, and the connection pattern being spaced apart from each other, and a light emitting element, a first end and a second end of the light emitting element being disposed on the first electrode and the second electrode, respectively, wherein the connection pattern electrically connects the first conductive layer and the second conductive layer through a first contact hole penetrating the via layer and the passivation layer.Type: ApplicationFiled: December 26, 2023Publication date: April 18, 2024Applicant: Samsung Display Co., LTD.Inventors: Kyung Jin JEON, So Young KOO, Eok Su KIM, Hyung Jun KIM, Yun Yong NAM, Jun Hyung LIM
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Patent number: 11963410Abstract: A display device includes a substrate including a pixel region and a peripheral region. A plurality of pixels is disposed in the pixel region of the substrate. Each of the plurality of pixels includes a light emitting element. Data lines and scan lines are connected to each of the plurality of pixels. A power line is configured to supply power to the plurality of pixels. The power line includes a plurality of first conductive lines and a plurality of second conductive lines intersecting the plurality of first conductive lines. The plurality of second conductive lines is arranged in a region between adjacent light emitting elements of the plurality of pixels. At least some of the plurality of second conductive lines extend in a direction oblique to a direction of extension of the data lines or the scan lines.Type: GrantFiled: June 13, 2022Date of Patent: April 16, 2024Assignee: SAMSUNG DISPLAY CO., LTD.Inventors: Yang Wan Kim, Byung Sun Kim, Jae Yong Lee, Chung Yi, Hyung Jun Park, Su Jin Lee
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Patent number: 11942482Abstract: A display device according to an embodiment includes a light blocking layer disposed on a substrate; an oxygen supply layer disposed on and contacting the light blocking layer; a semiconductor layer disposed on the oxygen supply layer; and a light emitting diode electrically connected with the semiconductor layer. The semiconductor layer includes an oxide semiconductor, and the oxygen supply layer includes a metal oxide that includes at least one of indium, zinc, gallium, and tin.Type: GrantFiled: August 10, 2021Date of Patent: March 26, 2024Assignee: SAMSUNG DISPLAY CO., LTD.Inventors: Hyung Jun Kim, So Young Koo, Eok Su Kim, Yun Yong Nam, Jun Hyung Lim, Kyung Jin Jeon
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Patent number: 11929029Abstract: A display device includes first and second initialization voltage sources and first and second pixel circuits. The first initialization voltage source provides a first initialization voltage. The second initialization voltage source provides a second initialization voltage less than the first initialization voltage. The first pixel circuit includes a first organic light emitting diode. The second pixel circuit includes a second organic light emitting diode with an organic material having a band gap different from a band gap of an organic material in the first organic light emitting diode. The first pixel circuit is coupled to the first initialization voltage source and the second initialization voltage source. The second pixel circuit is coupled to a single initialization voltage source.Type: GrantFiled: January 27, 2023Date of Patent: March 12, 2024Assignee: SAMSUNG DISPLAY CO., LTD.Inventors: Hyung Jun Park, Yang Wan Kim, Byung Sun Kim, Su Jin Lee, Jae Yong Lee
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Patent number: 11918781Abstract: An infusion flow regulator includes: a main body having an inlet through which fluid is introduced and an outlet through which the fluid is discharged; and a rotary dial rotatably coupled to the main body, with a sealing member interposed therebetween, so as to regulate a flow rate of the fluid, in which the rotary dial includes a regulating flow path having a shape of a recessed groove in cross section with a first width and a first height, and the regulating flow path includes a first region in which the first width is constant and the first height is decreased, and a second region in which both the first width and the first height are decreased. By the aforementioned configuration, the infusion flow regulator for the fluid can accurately regulate the flow rate even in a region where the flow rate of the fluid is very small.Type: GrantFiled: May 27, 2019Date of Patent: March 5, 2024Assignee: Korea Aerospace Research InstituteInventors: Poo Min Park, Hyung Mo Kim, Tae Choon Park, Young Seok Kang, Jae Sung Huh, Doo Yong Lee
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Patent number: 11508775Abstract: The inventive concepts provide a three-dimensional (3D) image sensor, based on structured light (SL), having a structure in which difficulty in a manufacturing process of a wiring layer is decreased and/or an area of a bottom pad of a capacitor is increased. The 3D image sensor includes: a pixel area including a photodiode in a semiconductor substrate and a gate group including a plurality of gates; a multiple wiring layer on an upper portion of the pixel area, the multiple wiring layer including at least two wiring layers; and a capacitor structure between a first wiring layer on a lowermost wiring layer of the multiple wiring layer and a second wiring layer on the first wiring layer, the capacitor structure including a bottom pad, a top pad, and a plurality of capacitors, wherein the bottom pad is connected to the first wiring layer.Type: GrantFiled: August 10, 2021Date of Patent: November 22, 2022Assignee: Samsung Electronics Co., Ltd.Inventors: Gang Zhang, Shi Li Quan, Hyung-yong Kim, Seug-gab Park, In-gyu Baek, Kyung-rae Byun, Jin-yong Choi
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Publication number: 20210366974Abstract: The inventive concepts provide a three-dimensional (3D) image sensor, based on structured light (SL), having a structure in which difficulty in a manufacturing process of a wiring layer is decreased and/or an area of a bottom pad of a capacitor is increased. The 3D image sensor includes: a pixel area including a photodiode in a semiconductor substrate and a gate group including a plurality of gates; a multiple wiring layer on an upper portion of the pixel area, the multiple wiring layer including at least two wiring layers; and a capacitor structure between a first wiring layer on a lowermost wiring layer of the multiple wiring layer and a second wiring layer on the first wiring layer, the capacitor structure including a bottom pad, a top pad, and a plurality of capacitors, wherein the bottom pad is connected to the first wiring layer.Type: ApplicationFiled: August 10, 2021Publication date: November 25, 2021Applicant: Samsung Electronics Co., Ltd.Inventors: Gang ZHANG, Shi Li QUAN, Hyung-yong KIM, Seug-gab PARK, In-gyu BAEK, Kyung-rae BYUN, Jin-yong CHOI
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Patent number: 11183527Abstract: The inventive concepts provide a three-dimensional (3D) image sensor, based on structured light (SL), having a structure in which difficulty in a manufacturing process of a wiring layer is decreased and/or an area of a bottom pad of a capacitor is increased. The 3D image sensor includes: a pixel area including a photodiode in a semiconductor substrate and a gate group including a plurality of gates; a multiple wiring layer on an upper portion of the pixel area, the multiple wiring layer including at least two wiring layers; and a capacitor structure between a first wiring layer on a lowermost wiring layer of the multiple wiring layer and a second wiring layer on the first wiring layer, the capacitor structure including a bottom pad, a top pad, and a plurality of capacitors, wherein the bottom pad is connected to the first wiring layer.Type: GrantFiled: May 13, 2019Date of Patent: November 23, 2021Assignee: Samsung Electronics Co., Ltd.Inventors: Gang Zhang, Shi Li Quan, Hyung-yong Kim, Seug-gab Park, In-gyu Baek, Kyung-rae Byun, Jin-yong Choi
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Patent number: 10644058Abstract: An image sensor includes a plurality of photo diodes disposed at a semiconductor substrate, and a splitter disposed on the photo diodes. The splitter splits an incident light depending on a wavelength so that split light of different colors enters different photo diodes, respectively. The splitter includes a first pattern structure having a cross-sectional structure in which a plurality of refractive layer patterns are deposited in a lateral direction.Type: GrantFiled: October 26, 2018Date of Patent: May 5, 2020Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Jung-Hun Kim, Sang-Su Park, Chang-Hwa Kim, Hyung-Yong Kim, Beom-Suk Lee, Man-Geun Cho, Jae-Sung Hur
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Publication number: 20200127034Abstract: The inventive concepts provide a three-dimensional (3D) image sensor, based on structured light (SL), having a structure in which difficulty in a manufacturing process of a wiring layer is decreased and/or an area of a bottom pad of a capacitor is increased. The 3D image sensor includes: a pixel area including a photodiode in a semiconductor substrate and a gate group including a plurality of gates; a multiple wiring layer on an upper portion of the pixel area, the multiple wiring layer including at least two wiring layers; and a capacitor structure between a first wiring layer on a lowermost wiring layer of the multiple wiring layer and a second wiring layer on the first wiring layer, the capacitor structure including a bottom pad, a top pad, and a plurality of capacitors, wherein the bottom pad is connected to the first wiring layer.Type: ApplicationFiled: May 13, 2019Publication date: April 23, 2020Applicant: Samsung Electronics Co., Ltd.Inventors: Gang ZHANG, Shi Li QUAN, Hyung-yong KIM, Seug-gab PARK, ln-gyu BAEK, Kyung-rae BYUN, Jin-yong CHOI
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Publication number: 20190157336Abstract: An image sensor includes a plurality of photo diodes disposed at a semiconductor substrate, and a splitter disposed on the photo diodes. The splitter splits an incident light depending on a wavelength so that split light of different colors enters different photo diodes, respectively. The splitter includes a first pattern structure having a cross-sectional structure in which a plurality of refractive layer patterns are deposited in a lateral direction.Type: ApplicationFiled: October 26, 2018Publication date: May 23, 2019Inventors: Jung-Hun KIM, Sang-Su PARK, Chang-Hwa KIM, Hyung-Yong KIM, Beom-Suk LEE, Man-Geun CHO, Jae-Sung HUR
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Publication number: 20180057992Abstract: A laundry machine and a control method thereof are provided in which laundering ability may be improved while also improving efficiency and noise/vibration. The laundry machine employs a plurality of drum motions by varying drum rotational speed, drum rotational direction, and drum starting and stopping point, to provide different motion of laundry items in the drum.Type: ApplicationFiled: September 26, 2017Publication date: March 1, 2018Inventors: In Ho CHO, Hyung Yong Kim, Eun Jin Park, Ig Geun Kwon, Sang Il Hwang, Han Su Jung, Kyung Chul Woo, Byung Keol Choi, Myong Hun Im, Soo Young Oh, Moon Hee Hong, Woo Young Kim, Sang Heon Lee
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Patent number: 9484458Abstract: A fabricating method of a semiconductor device includes providing a substrate having a first region and a second region, forming a plurality of first gates in the first region of the substrate, such that the first gates are spaced apart from each other at a first pitch, forming a plurality of second gates in the second region of the substrate, such that the second gates are spaced apart from each other at a second pitch different from the first pitch, implanting an etch rate adjusting dopant into the second region to form implanted regions, while blocking the first region, forming a first trench by etching the first region between the plurality of first gates, and forming a second trench by etching the second region between the plurality of second gates.Type: GrantFiled: January 22, 2015Date of Patent: November 1, 2016Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Jin-Wook Lee, Myeong-Cheol Kim, Sang-Min Lee, Young-Ju Park, Hyung-Yong Kim, Myung-Hoon Jung
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Patent number: 9206539Abstract: The present invention relates to washing machines, and, more particularly, to a washing machine in which a drum that holds laundry is rotated with respect to a substantially horizontal rotation shaft. The washing machine includes a shoe course selection unit for enabling a user to select a shoe course, and a controller for controlling operation of the washing machine to wash shoes while swinging the drum within 90° in left/right directions if the user selects the shoe course.Type: GrantFiled: April 28, 2009Date of Patent: December 8, 2015Assignee: LG ELECTRONICS INC.Inventors: Hyung Yong Kim, Eun Jin Park, Dong Woo Kang, In Ho Cho, Deug Hee Lee, Pyoung Hwan Kim
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Patent number: 9054051Abstract: In a method of fabricating a semiconductor device, a target layer and a first material layer are sequentially formed on a substrate. A plurality of second material layer patterns are formed on the first material layer, the second material layer patterns extending in a first horizontal direction. A plurality of hardmask patterns extending in a second horizontal direction are formed on the plurality of second material layer patterns and the first material layer, wherein the second horizontal direction is different from the first horizontal direction. A first material layer pattern is formed by etching the first material layer using the plurality of hardmask patterns and the plurality of second material layer patterns as etch masks. A target layer pattern with a plurality of holes is formed by etching the target layer using the first material layer pattern as an etch mask.Type: GrantFiled: May 16, 2012Date of Patent: June 9, 2015Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Soo-yeon Jeong, In-ho Kim, Hyung-yong Kim, Myeong-cheol Kim
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Publication number: 20150137261Abstract: A fabricating method of a semiconductor device includes providing a substrate having a first region and a second region, forming a plurality of first gates in the first region of the substrate, such that the first gates are spaced apart from each other at a first pitch, forming a plurality of second gates in the second region of the substrate, such that the second gates are spaced apart from each other at a second pitch different from the first pitch, implanting an etch rate adjusting dopant into the second region to form implanted regions, while blocking the first region, forming a first trench by etching the first region between the plurality of first gates, and forming a second trench by etching the second region between the plurality of second gates.Type: ApplicationFiled: January 22, 2015Publication date: May 21, 2015Inventors: Jin-Wook LEE, Myeong-Cheol KIM, Sang-Min LEE, Young-Ju PARK, Hyung-Yong KIM, Myung-Hoon JUNG
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Patent number: 9003587Abstract: Disclosed is a drum type washing machine having a touch up function and a method for touching up thereof. The drum type washing machine having the touch up function is provided with a touch up button for removing wrinkles on laundry left in the drum type washing machine and a method for touching up. Accordingly, it is not required for a user to additionally execute rinsing and dehydrating processes, or ironing so as to remove wrinkles on the laundry, thus it is convenient. And, since it is not required to additionally execute the rinsing and dehydrating processes, it is capable of preventing unwanted consumption of water and electricity.Type: GrantFiled: September 4, 2008Date of Patent: April 14, 2015Assignee: LG Electronics Inc.Inventors: Deug-Hee Lee, Pyoung-Hwan Kim, Eun-Jin Park, Hyung-Yong Kim, Seong-Hae Jeong
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Patent number: 8966944Abstract: A laundry machine and a control method thereof are provided in which laundering ability may be improved while also improving efficiency and noise/vibration. The laundry machine employs a plurality of drum motions by varying drum rotational speed, drum rotational direction, and drum starting and stopping point, to provide different motion of laundry items in the drum.Type: GrantFiled: March 15, 2012Date of Patent: March 3, 2015Assignee: LG Electronics Inc.Inventors: In Ho Cho, Hyung Yong Kim, Eun Jin Park, Ig Geun Kwon, Sang Il Hwang, Han Su Jung, Kyung Chul Woo, Byung Keol Choi, Myong Hun Im, Soo Young Oh, Moon Hee Hong, Woo Young Kim, Sang Heon Lee
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Fabricating method of semiconductor device and semiconductor device fabricated using the same method
Patent number: 8946069Abstract: A fabricating method of a semiconductor device includes providing a substrate having a first region and a second region, forming a plurality of first gates in the first region of the substrate, such that the first gates are spaced apart from each other at a first pitch, forming a plurality of second gates in the second region of the substrate, such that the second gates are spaced apart from each other at a second pitch different from the first pitch, implanting an etch rate adjusting dopant into the second region to form implanted regions, while blocking the first region, forming a first trench by etching the first region between the plurality of first gates, and forming a second trench by etching the second region between the plurality of second gates.Type: GrantFiled: December 23, 2013Date of Patent: February 3, 2015Assignee: Samsung Electronics Co. Ltd.Inventors: Jin-Wook Lee, Myeong-Cheol Kim, Sang-Min Lee, Young-Ju Park, Hyung-Yong Kim, Myung-Hoon Jung