Patents by Inventor Hyung-Yong Kim

Hyung-Yong Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240138174
    Abstract: Provided are an organic electronic element comprising an anode, a cathode, and an organic material layer between the anode and the cathode, and an electronic device comprising the organic electronic element, wherein the organic material layer comprises each compound represented by Formula 1, Formula 2, or Formula 3, thereby the driving voltage of the organic electronic element can be lowered and the luminous efficiency and lifespan can be improved.
    Type: Application
    Filed: March 15, 2023
    Publication date: April 25, 2024
    Applicant: DUK SAN NEOLUX CO., LTD.
    Inventors: Hyo Min JIN, Bu Yong YUN, Jae Ho KIM, Hyung Dong LEE, Chi Hyun PARK
  • Publication number: 20240128251
    Abstract: A display device includes a first conductive layer disposed on a substrate, a passivation layer disposed on the first conductive layer, a second conductive layer disposed on the passivation layer, a via layer disposed on the second conductive layer, a third conductive layer disposed on the via layer, the third conductive layer including a first electrode, a second electrode, a connection pattern, the first electrode, the second electrode, and the connection pattern being spaced apart from each other, and a light emitting element, a first end and a second end of the light emitting element being disposed on the first electrode and the second electrode, respectively, wherein the connection pattern electrically connects the first conductive layer and the second conductive layer through a first contact hole penetrating the via layer and the passivation layer.
    Type: Application
    Filed: December 26, 2023
    Publication date: April 18, 2024
    Applicant: Samsung Display Co., LTD.
    Inventors: Kyung Jin JEON, So Young KOO, Eok Su KIM, Hyung Jun KIM, Yun Yong NAM, Jun Hyung LIM
  • Patent number: 11963410
    Abstract: A display device includes a substrate including a pixel region and a peripheral region. A plurality of pixels is disposed in the pixel region of the substrate. Each of the plurality of pixels includes a light emitting element. Data lines and scan lines are connected to each of the plurality of pixels. A power line is configured to supply power to the plurality of pixels. The power line includes a plurality of first conductive lines and a plurality of second conductive lines intersecting the plurality of first conductive lines. The plurality of second conductive lines is arranged in a region between adjacent light emitting elements of the plurality of pixels. At least some of the plurality of second conductive lines extend in a direction oblique to a direction of extension of the data lines or the scan lines.
    Type: Grant
    Filed: June 13, 2022
    Date of Patent: April 16, 2024
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Yang Wan Kim, Byung Sun Kim, Jae Yong Lee, Chung Yi, Hyung Jun Park, Su Jin Lee
  • Patent number: 11942482
    Abstract: A display device according to an embodiment includes a light blocking layer disposed on a substrate; an oxygen supply layer disposed on and contacting the light blocking layer; a semiconductor layer disposed on the oxygen supply layer; and a light emitting diode electrically connected with the semiconductor layer. The semiconductor layer includes an oxide semiconductor, and the oxygen supply layer includes a metal oxide that includes at least one of indium, zinc, gallium, and tin.
    Type: Grant
    Filed: August 10, 2021
    Date of Patent: March 26, 2024
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Hyung Jun Kim, So Young Koo, Eok Su Kim, Yun Yong Nam, Jun Hyung Lim, Kyung Jin Jeon
  • Patent number: 11929029
    Abstract: A display device includes first and second initialization voltage sources and first and second pixel circuits. The first initialization voltage source provides a first initialization voltage. The second initialization voltage source provides a second initialization voltage less than the first initialization voltage. The first pixel circuit includes a first organic light emitting diode. The second pixel circuit includes a second organic light emitting diode with an organic material having a band gap different from a band gap of an organic material in the first organic light emitting diode. The first pixel circuit is coupled to the first initialization voltage source and the second initialization voltage source. The second pixel circuit is coupled to a single initialization voltage source.
    Type: Grant
    Filed: January 27, 2023
    Date of Patent: March 12, 2024
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Hyung Jun Park, Yang Wan Kim, Byung Sun Kim, Su Jin Lee, Jae Yong Lee
  • Patent number: 11918781
    Abstract: An infusion flow regulator includes: a main body having an inlet through which fluid is introduced and an outlet through which the fluid is discharged; and a rotary dial rotatably coupled to the main body, with a sealing member interposed therebetween, so as to regulate a flow rate of the fluid, in which the rotary dial includes a regulating flow path having a shape of a recessed groove in cross section with a first width and a first height, and the regulating flow path includes a first region in which the first width is constant and the first height is decreased, and a second region in which both the first width and the first height are decreased. By the aforementioned configuration, the infusion flow regulator for the fluid can accurately regulate the flow rate even in a region where the flow rate of the fluid is very small.
    Type: Grant
    Filed: May 27, 2019
    Date of Patent: March 5, 2024
    Assignee: Korea Aerospace Research Institute
    Inventors: Poo Min Park, Hyung Mo Kim, Tae Choon Park, Young Seok Kang, Jae Sung Huh, Doo Yong Lee
  • Patent number: 11508775
    Abstract: The inventive concepts provide a three-dimensional (3D) image sensor, based on structured light (SL), having a structure in which difficulty in a manufacturing process of a wiring layer is decreased and/or an area of a bottom pad of a capacitor is increased. The 3D image sensor includes: a pixel area including a photodiode in a semiconductor substrate and a gate group including a plurality of gates; a multiple wiring layer on an upper portion of the pixel area, the multiple wiring layer including at least two wiring layers; and a capacitor structure between a first wiring layer on a lowermost wiring layer of the multiple wiring layer and a second wiring layer on the first wiring layer, the capacitor structure including a bottom pad, a top pad, and a plurality of capacitors, wherein the bottom pad is connected to the first wiring layer.
    Type: Grant
    Filed: August 10, 2021
    Date of Patent: November 22, 2022
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Gang Zhang, Shi Li Quan, Hyung-yong Kim, Seug-gab Park, In-gyu Baek, Kyung-rae Byun, Jin-yong Choi
  • Publication number: 20210366974
    Abstract: The inventive concepts provide a three-dimensional (3D) image sensor, based on structured light (SL), having a structure in which difficulty in a manufacturing process of a wiring layer is decreased and/or an area of a bottom pad of a capacitor is increased. The 3D image sensor includes: a pixel area including a photodiode in a semiconductor substrate and a gate group including a plurality of gates; a multiple wiring layer on an upper portion of the pixel area, the multiple wiring layer including at least two wiring layers; and a capacitor structure between a first wiring layer on a lowermost wiring layer of the multiple wiring layer and a second wiring layer on the first wiring layer, the capacitor structure including a bottom pad, a top pad, and a plurality of capacitors, wherein the bottom pad is connected to the first wiring layer.
    Type: Application
    Filed: August 10, 2021
    Publication date: November 25, 2021
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Gang ZHANG, Shi Li QUAN, Hyung-yong KIM, Seug-gab PARK, In-gyu BAEK, Kyung-rae BYUN, Jin-yong CHOI
  • Patent number: 11183527
    Abstract: The inventive concepts provide a three-dimensional (3D) image sensor, based on structured light (SL), having a structure in which difficulty in a manufacturing process of a wiring layer is decreased and/or an area of a bottom pad of a capacitor is increased. The 3D image sensor includes: a pixel area including a photodiode in a semiconductor substrate and a gate group including a plurality of gates; a multiple wiring layer on an upper portion of the pixel area, the multiple wiring layer including at least two wiring layers; and a capacitor structure between a first wiring layer on a lowermost wiring layer of the multiple wiring layer and a second wiring layer on the first wiring layer, the capacitor structure including a bottom pad, a top pad, and a plurality of capacitors, wherein the bottom pad is connected to the first wiring layer.
    Type: Grant
    Filed: May 13, 2019
    Date of Patent: November 23, 2021
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Gang Zhang, Shi Li Quan, Hyung-yong Kim, Seug-gab Park, In-gyu Baek, Kyung-rae Byun, Jin-yong Choi
  • Patent number: 10644058
    Abstract: An image sensor includes a plurality of photo diodes disposed at a semiconductor substrate, and a splitter disposed on the photo diodes. The splitter splits an incident light depending on a wavelength so that split light of different colors enters different photo diodes, respectively. The splitter includes a first pattern structure having a cross-sectional structure in which a plurality of refractive layer patterns are deposited in a lateral direction.
    Type: Grant
    Filed: October 26, 2018
    Date of Patent: May 5, 2020
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jung-Hun Kim, Sang-Su Park, Chang-Hwa Kim, Hyung-Yong Kim, Beom-Suk Lee, Man-Geun Cho, Jae-Sung Hur
  • Publication number: 20200127034
    Abstract: The inventive concepts provide a three-dimensional (3D) image sensor, based on structured light (SL), having a structure in which difficulty in a manufacturing process of a wiring layer is decreased and/or an area of a bottom pad of a capacitor is increased. The 3D image sensor includes: a pixel area including a photodiode in a semiconductor substrate and a gate group including a plurality of gates; a multiple wiring layer on an upper portion of the pixel area, the multiple wiring layer including at least two wiring layers; and a capacitor structure between a first wiring layer on a lowermost wiring layer of the multiple wiring layer and a second wiring layer on the first wiring layer, the capacitor structure including a bottom pad, a top pad, and a plurality of capacitors, wherein the bottom pad is connected to the first wiring layer.
    Type: Application
    Filed: May 13, 2019
    Publication date: April 23, 2020
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Gang ZHANG, Shi Li QUAN, Hyung-yong KIM, Seug-gab PARK, ln-gyu BAEK, Kyung-rae BYUN, Jin-yong CHOI
  • Publication number: 20190157336
    Abstract: An image sensor includes a plurality of photo diodes disposed at a semiconductor substrate, and a splitter disposed on the photo diodes. The splitter splits an incident light depending on a wavelength so that split light of different colors enters different photo diodes, respectively. The splitter includes a first pattern structure having a cross-sectional structure in which a plurality of refractive layer patterns are deposited in a lateral direction.
    Type: Application
    Filed: October 26, 2018
    Publication date: May 23, 2019
    Inventors: Jung-Hun KIM, Sang-Su PARK, Chang-Hwa KIM, Hyung-Yong KIM, Beom-Suk LEE, Man-Geun CHO, Jae-Sung HUR
  • Publication number: 20180057992
    Abstract: A laundry machine and a control method thereof are provided in which laundering ability may be improved while also improving efficiency and noise/vibration. The laundry machine employs a plurality of drum motions by varying drum rotational speed, drum rotational direction, and drum starting and stopping point, to provide different motion of laundry items in the drum.
    Type: Application
    Filed: September 26, 2017
    Publication date: March 1, 2018
    Inventors: In Ho CHO, Hyung Yong Kim, Eun Jin Park, Ig Geun Kwon, Sang Il Hwang, Han Su Jung, Kyung Chul Woo, Byung Keol Choi, Myong Hun Im, Soo Young Oh, Moon Hee Hong, Woo Young Kim, Sang Heon Lee
  • Patent number: 9484458
    Abstract: A fabricating method of a semiconductor device includes providing a substrate having a first region and a second region, forming a plurality of first gates in the first region of the substrate, such that the first gates are spaced apart from each other at a first pitch, forming a plurality of second gates in the second region of the substrate, such that the second gates are spaced apart from each other at a second pitch different from the first pitch, implanting an etch rate adjusting dopant into the second region to form implanted regions, while blocking the first region, forming a first trench by etching the first region between the plurality of first gates, and forming a second trench by etching the second region between the plurality of second gates.
    Type: Grant
    Filed: January 22, 2015
    Date of Patent: November 1, 2016
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jin-Wook Lee, Myeong-Cheol Kim, Sang-Min Lee, Young-Ju Park, Hyung-Yong Kim, Myung-Hoon Jung
  • Patent number: 9206539
    Abstract: The present invention relates to washing machines, and, more particularly, to a washing machine in which a drum that holds laundry is rotated with respect to a substantially horizontal rotation shaft. The washing machine includes a shoe course selection unit for enabling a user to select a shoe course, and a controller for controlling operation of the washing machine to wash shoes while swinging the drum within 90° in left/right directions if the user selects the shoe course.
    Type: Grant
    Filed: April 28, 2009
    Date of Patent: December 8, 2015
    Assignee: LG ELECTRONICS INC.
    Inventors: Hyung Yong Kim, Eun Jin Park, Dong Woo Kang, In Ho Cho, Deug Hee Lee, Pyoung Hwan Kim
  • Patent number: 9054051
    Abstract: In a method of fabricating a semiconductor device, a target layer and a first material layer are sequentially formed on a substrate. A plurality of second material layer patterns are formed on the first material layer, the second material layer patterns extending in a first horizontal direction. A plurality of hardmask patterns extending in a second horizontal direction are formed on the plurality of second material layer patterns and the first material layer, wherein the second horizontal direction is different from the first horizontal direction. A first material layer pattern is formed by etching the first material layer using the plurality of hardmask patterns and the plurality of second material layer patterns as etch masks. A target layer pattern with a plurality of holes is formed by etching the target layer using the first material layer pattern as an etch mask.
    Type: Grant
    Filed: May 16, 2012
    Date of Patent: June 9, 2015
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Soo-yeon Jeong, In-ho Kim, Hyung-yong Kim, Myeong-cheol Kim
  • Publication number: 20150137261
    Abstract: A fabricating method of a semiconductor device includes providing a substrate having a first region and a second region, forming a plurality of first gates in the first region of the substrate, such that the first gates are spaced apart from each other at a first pitch, forming a plurality of second gates in the second region of the substrate, such that the second gates are spaced apart from each other at a second pitch different from the first pitch, implanting an etch rate adjusting dopant into the second region to form implanted regions, while blocking the first region, forming a first trench by etching the first region between the plurality of first gates, and forming a second trench by etching the second region between the plurality of second gates.
    Type: Application
    Filed: January 22, 2015
    Publication date: May 21, 2015
    Inventors: Jin-Wook LEE, Myeong-Cheol KIM, Sang-Min LEE, Young-Ju PARK, Hyung-Yong KIM, Myung-Hoon JUNG
  • Patent number: 9003587
    Abstract: Disclosed is a drum type washing machine having a touch up function and a method for touching up thereof. The drum type washing machine having the touch up function is provided with a touch up button for removing wrinkles on laundry left in the drum type washing machine and a method for touching up. Accordingly, it is not required for a user to additionally execute rinsing and dehydrating processes, or ironing so as to remove wrinkles on the laundry, thus it is convenient. And, since it is not required to additionally execute the rinsing and dehydrating processes, it is capable of preventing unwanted consumption of water and electricity.
    Type: Grant
    Filed: September 4, 2008
    Date of Patent: April 14, 2015
    Assignee: LG Electronics Inc.
    Inventors: Deug-Hee Lee, Pyoung-Hwan Kim, Eun-Jin Park, Hyung-Yong Kim, Seong-Hae Jeong
  • Patent number: 8966944
    Abstract: A laundry machine and a control method thereof are provided in which laundering ability may be improved while also improving efficiency and noise/vibration. The laundry machine employs a plurality of drum motions by varying drum rotational speed, drum rotational direction, and drum starting and stopping point, to provide different motion of laundry items in the drum.
    Type: Grant
    Filed: March 15, 2012
    Date of Patent: March 3, 2015
    Assignee: LG Electronics Inc.
    Inventors: In Ho Cho, Hyung Yong Kim, Eun Jin Park, Ig Geun Kwon, Sang Il Hwang, Han Su Jung, Kyung Chul Woo, Byung Keol Choi, Myong Hun Im, Soo Young Oh, Moon Hee Hong, Woo Young Kim, Sang Heon Lee
  • Patent number: 8946069
    Abstract: A fabricating method of a semiconductor device includes providing a substrate having a first region and a second region, forming a plurality of first gates in the first region of the substrate, such that the first gates are spaced apart from each other at a first pitch, forming a plurality of second gates in the second region of the substrate, such that the second gates are spaced apart from each other at a second pitch different from the first pitch, implanting an etch rate adjusting dopant into the second region to form implanted regions, while blocking the first region, forming a first trench by etching the first region between the plurality of first gates, and forming a second trench by etching the second region between the plurality of second gates.
    Type: Grant
    Filed: December 23, 2013
    Date of Patent: February 3, 2015
    Assignee: Samsung Electronics Co. Ltd.
    Inventors: Jin-Wook Lee, Myeong-Cheol Kim, Sang-Min Lee, Young-Ju Park, Hyung-Yong Kim, Myung-Hoon Jung