Abstract: The present disclosure provides is a high-speed image recognition method and apparatus using a 3D CNN. The high-speed image recognition method using the 3D CNN includes: inputting each of a first image clips among image clips constituting an input image to the 3D CNN; acquiring softmax function values calculated in the 3D CNN with respect to each of the first image clips; calculating a score margin by using the softmax function values; comparing the score margin with a predetermined threshold value to determine whether to input at least one additional image clip other than the first image clips among the image clips constituting the input image to the 3D CNN. Therefore, a calculation speed for image recognition can be improved.

Abstract: The present disclosure provides is a high-speed image recognition method and apparatus using a 3D CNN. The high-speed image recognition method using the 3D CNN includes: inputting each of a first image clips among image clips constituting an input image to the 3D CNN; acquiring softmax function values calculated in the 3D CNN with respect to each of the first image clips; calculating a score margin by using the softmax function values; comparing the score margin with a predetermined threshold value to determine whether to input at least one additional image clip other than the first image clips among the image clips constituting the input image to the 3D CNN. Therefore, a calculation speed for image recognition can be improved.

Abstract: Provided are an apparatus and method of sensing liquid leakage for a lithography apparatus, which can prevent a collector mirror from being contaminated by sensing leakage of cooling water supplied to the collector mirror of an extreme ultraviolet (EUV) light generating apparatus. The liquid leakage sensing apparatus includes a collector mirror module, a cooling unit configured to supply a cooling water to one surface of the collector mirror module, a gas supply unit configured to supply a water soluble gas to the cooling unit, and a sensing unit configured to sense the water soluble gas having leaked to the outside of the cooling unit.

Abstract: Provided are an apparatus and method of sensing liquid leakage for a lithography apparatus, which can prevent a collector mirror from being contaminated by sensing leakage of cooling water supplied to the collector mirror of an extreme ultraviolet (EUV) light generating apparatus. The liquid leakage sensing apparatus includes a collector mirror module, a cooling unit configured to supply a cooling water to one surface of the collector mirror module, a gas supply unit configured to supply a water soluble gas to the cooling unit, and a sensing unit configured to sense the water soluble gas having leaked to the outside of the cooling unit.