Patents by Inventor Hyun Jung Wang

Hyun Jung Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11194250
    Abstract: A metal oxide photosensitive resin composition for forming a blue pattern layer includes scattering particles including a metal oxide having an average particle diameter of 30 to 300 nm, provided that the metal oxide photosensitive resin composition does not include quantum dots.
    Type: Grant
    Filed: August 24, 2017
    Date of Patent: December 7, 2021
    Assignee: Dongwoo Fine-Chem Co., Ltd.
    Inventors: Hyun Jung Wang, Ju Ho Kim, Hyung Joo Kim, Sung Hun Hong
  • Publication number: 20190278174
    Abstract: A metal oxide photosensitive resin composition for forming a blue pattern layer includes scattering particles including a metal oxide having an average particle diameter of 30 to 300 nm, provided that the metal oxide photosensitive resin composition does not include quantum dots.
    Type: Application
    Filed: August 24, 2017
    Publication date: September 12, 2019
    Applicant: DONGWOO FINE-CHEM CO., LTD.
    Inventors: Hyun Jung Wang, Ju Ho Kim, Hyung Joo Kim, Sung Hun Hong
  • Patent number: 10329409
    Abstract: A photosensitive resin composition according to an example embodiment of the present disclosure includes a quantum dot, a photopolymerizable compound, a photopolymerization initiator, an alkali-soluble resin, and a solvent, wherein the alkali-soluble resin includes at least one of a monomer represented by Formula 1 and a monomer represented by Formula 2:
    Type: Grant
    Filed: January 5, 2017
    Date of Patent: June 25, 2019
    Assignees: Samsung Display Co., Ltd., Dongwoo Fine-Chem Co., Ltd.
    Inventors: Baek Hee Lee, Min Ki Nam, Young Min Kim, Kyoung Won Park, Hae Il Park, Ju Ho Kim, Hyoun Woo Kim, Hun Sik Kim, Jong Soo Lee, Hyun Jung Wang
  • Publication number: 20170240728
    Abstract: A photosensitive resin composition according to an example embodiment of the present disclosure includes a quantum dot, a photopolymerizable compound, a photopolymerization initiator, an alkali-soluble resin, and a solvent, wherein the alkali-soluble resin includes at least one of a monomer represented by Formula 1 and a monomer represented by Formula 2:
    Type: Application
    Filed: January 5, 2017
    Publication date: August 24, 2017
    Inventors: Baek Hee Lee, Min Ki Nam, Young Min Kim, Kyoung Won Park, Hae Il Park, Ju Ho Kim, Hyoun Woo Kim, Hun Sik Kim, Jong Soo Lee, Hyun Jung Wang