Patents by Inventor Hyunkyu Sun

Hyunkyu Sun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of managing critical dimension error of photomask and method of manufacturing photomask using the method
    Patent number: 11934095
    Abstract: A method of managing a critical dimension error includes (i) defining, in a photomask, N openings having a width, where N is a natural number, (ii) using graphs for each of the N openings, each of the graphs being obtained by setting locations through an opening of the N openings as a first axis and an intensity of transmitting light as a second axis, obtaining ILSi proportional to an inclination of a tangent to a graph of the graphs at a location corresponding to an edge of an opening and Ii which is an intensity of transmitting light at the location, where i is a natural number from 1 to N, (iii) obtaining, with respect to each of the N openings, a real width CDi of the openings, and (iv) when I a ? v ? e = 1 N ? ? i = 1 N ? I i , CD a ? v ? e = 1 N ? ? i = 1 N ? CD i ? ? and ? ? ILS a ? v ? e = 1 N ? ? i = 1 N ? ILS i , obtaining AIMEEFi which is an aerial image mask error enhancement factor with respect to each of the N openings accordi
    Type: Grant
    Filed: July 19, 2021
    Date of Patent: March 19, 2024
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Jaehyuk Chang, Taejoon Kim, Hyunkyu Sun, Sikyung Lim
  • METHOD OF MANAGING CRITICAL DIMENSION ERROR OF PHOTOMASK AND METHOD OF MANUFACTURING PHOTOMASK USING THE METHOD
    Publication number: 20220197133
    Abstract: A method of managing a critical dimension error includes (i) defining, in a photomask, N openings having a width, where N is a natural number, (ii) using graphs for each of the N openings, each of the graphs being obtained by setting locations through an opening of the N openings as a first axis and an intensity of transmitting light as a second axis, obtaining ILSi proportional to an inclination of a tangent to a graph of the graphs at a location corresponding to an edge of an opening and Ii which is an intensity of transmitting light at the location, where i is a natural number from 1 to N, (iii) obtaining, with respect to each of the N openings, a real width CDi of the openings, and (iv) when I a ? v ? e = 1 N ? ? i = 1 N ? I i , CD a ? v ? e = 1 N ? ? i = 1 N ? CD i ? ? and ? ? ILS a ? v ? e = 1 N ? ? i = 1 N ? ILS i , obtaining AIMEEFi which is an aerial image mask error enhancement factor with respect to each of the N openings accordi
    Type: Application
    Filed: July 19, 2021
    Publication date: June 23, 2022
    Inventors: Jaehyuk Chang, Taejoon Kim, Hyunkyu Sun, Sikyung Lim