Patents by Inventor Hyunwo Kim

Hyunwo Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photosensitive polymers, resist compositions comprising the same, and methods for forming photoresistive patterns
    Patent number: 6849378
    Abstract: A resist composition includes a photoacid generator (PAG) and a photosensitive polymer. The photosensitive polymer includes a comonomer having an acid-labile substituent group or a polar functional group, and a copolymer of alkyl vinyl ether and maleic anhydride. The copolymer is represented by the following structure: where k is an integer of 3 to 8, and where X is tertiary cyclic alcohol having 7 to 20 carbon atoms.
    Type: Grant
    Filed: April 17, 2002
    Date of Patent: February 1, 2005
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sangjun Choi, Hyunwo Kim, Joontae Moon, Sanggyun Woo
  • Photosensitive polymers, resist compositions comprising the same, and methods for forming photoresistive patterns
    Publication number: 20030203306
    Abstract: A resist composition includes a photoacid generator (PAG) and a photosensitive polymer. The photosensitive polymer includes a comonomer having an acid-labile substituent group or a polar functional group, and a copolymer of alkyl vinyl ether and maleic anhydride.
    Type: Application
    Filed: April 17, 2002
    Publication date: October 30, 2003
    Inventors: Sangjun Choi, Hyunwo Kim, Joontae Moon, Sanggyun Woo