Patents by Inventor I Chang

I Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110084790
    Abstract: A neutral-grounded structure and a method for delta-connected windings are provided. The delta-connected windings include a first phase winding, a second phase winding, and a third phase winding. A grounding winding is disposed on at least one of the phase windings. The first end of the grounding winding is connected to a grounded point which is utilized as a neutral point. The second end of the grounding winding is connected to a tap of one of the other two phase windings. The voltage phase displacement between the grounding winding and the phase winding corresponding to the grounding winding is 180 degrees. According to the above-mentioned neutral-grounded structure, all the three phase-to-ground voltages are the same when the three phase voltages are balanced. Accordingly, the present invention can solve correlated problems due to differences of the three phase-to-ground voltages of delta-connected windings with conventional grounding methods.
    Type: Application
    Filed: October 13, 2009
    Publication date: April 14, 2011
    Inventors: Tsai-Hsiang Chen, I Chang, Tai-Jou Chen
  • Patent number: 7218089
    Abstract: The method and apparatus for implementing the same phase power supply scheme of the present invention is to utilize means selecting one phase from the three source lines, and supplying power only to the load at single phase line with the neutral line as a return (grounded) line, meanwhile de-energizing the loads of three phase lines at the demand side automatically during a period of time of power shortage.
    Type: Grant
    Filed: June 11, 2004
    Date of Patent: May 15, 2007
    Inventors: Tai-Jou Chen, Tsai-Hsiang Chen, Chiang-Mao Chung, I Chang
  • Publication number: 20060110025
    Abstract: A method for inspecting mask defects comprises a step of providing an image including a simulated mask pattern, at least one simulated defect and a simulated die array (or a simulated cell array), which are superimposed together, and a step of inspecting the location of the simulate defect on the simulated die array (or on the simulated cell array) and on the simulated mask pattern such that an inspector can identify the exact location of a physical defect on a physical die array of a wafer (or on a cell array or a photoelectronic substrate) and further on a physical mask pattern transferred on the die array (or on the cell array).
    Type: Application
    Filed: November 19, 2004
    Publication date: May 25, 2006
    Inventors: Ming Ho, I Chang
  • Publication number: 20050018460
    Abstract: The method and apparatus for implementing the same phase power supply scheme of the present invention is to utilize means selecting one phase from the three source lines, and supplying power only to the load at single phase line with the neutral line as a return (grounded) line, meanwhile de-energizing the loads of three phase lines at the demand side automatically during a period of time of power shortage.
    Type: Application
    Filed: June 11, 2004
    Publication date: January 27, 2005
    Inventors: Tai-Jou Chen, Tsai-Hsiang Chen, Chiang-Mao Chung, I Chang