Patents by Inventor I-Chen Hsieh

I-Chen Hsieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9731446
    Abstract: A method for manufacturing a dull polyamide 56 fiber includes steps as follows. Bright polyamide 56 chips are provided. A viscosity adjusting step is provided, wherein a relative viscosity in sulfuric acid of the bright polyamide 56 chips is adjusted to a range of 2.90 to 3.00. A moisture adjusting step is provided, wherein a moisture content of the bright polyamide 56 chips is adjusted to a range of 350 to 550 ppm. A spinning step is provided, which includes providing dull polyamide 6 chips and a blending step. The dull polyamide 6 chips include TiO2. In the blending step, the dull polyamide 6 chips and the bright polyamide 56 chips dealt with the viscosity adjusting step and the moisture adjusting step are melted and blended, and then spun at a temperature ranging from 275° C. to 285° C., thus the dull polyamide 56 fiber is obtained.
    Type: Grant
    Filed: August 19, 2015
    Date of Patent: August 15, 2017
    Assignee: CHAIN YARN CO., LTD.
    Inventors: Yen-Hsiao Chen, Tsung-Hsien Chao, Shih-Yang Chen, I-Chen Hsieh
  • Publication number: 20160176094
    Abstract: A method for manufacturing a dull polyamide 56 fiber includes steps as follows. Bright polyamide 56 chips are provided. A viscosity adjusting step is provided, wherein a relative viscosity in sulfuric acid of the bright polyamide 56 chips is adjusted to a range of 2.90 to 3.00. A moisture adjusting step is provided, wherein a moisture content of the bright polyamide 56 chips is adjusted to a range of 350 to 550 ppm. A spinning step is provided, which includes providing dull polyamide 6 chips and a blending step. The dull polyamide 6 chips include TiO2. In the blending step, the dull polyamide 6 chips and the bright polyamide 56 chips dealt with the viscosity adjusting step and the moisture adjusting step are melted and blended, and then spun at a temperature ranging from 275° C. to 285° C., thus the dull polyamide 56 fiber is obtained.
    Type: Application
    Filed: August 19, 2015
    Publication date: June 23, 2016
    Inventors: Yen-Hsiao CHEN, Tsung-Hsien CHAO, Shih-Yang CHEN, I-Chen HSIEH
  • Patent number: 9232843
    Abstract: A nail polish curing device comprises: a lower part having a top surface and a reflective lower recess-defining surface that extends downwardly from the top surface and that defines a lower recess; an upper part disposed above the lower part and having a top wall, a bottom surface, and a reflective upper recess-defining surface that extends upwardly from the bottom surface and that defines an upper recess, the top wall being formed with a plurality of through-holes; a circuit board mounted on the top wall of the upper part; and a plurality of light emitting elements mounted on and electrically connected to the circuit board and extending respectively through the through-holes into the upper recess so as to emit light into the upper and lower recesses.
    Type: Grant
    Filed: July 11, 2013
    Date of Patent: January 12, 2016
    Assignee: Beauty Bela Cosme Corp.
    Inventors: Yu-Jen Li, Yi-Min Wang, I-Chen Hsieh
  • Patent number: 9072357
    Abstract: A nail polish curing device comprises: a lower part defining a lower recess; an upper part pivoted to the lower part and defining an upper recess; a circuit board mounted on the upper part; and at least one light emitting element connected to the circuit board. The upper part is rotatable relative to the lower part between a first angular position, in which the upper and lower recesses overlap along a vertical direction and cooperate with each other to define an accommodating space for receiving a user's finger therein, and a second angular position, in which the upper and lower recesses do not overlap along the vertical direction, thereby facilitating insertion of a user's toe into an irradiating space between a bottom surface of the upper part and a reference surface.
    Type: Grant
    Filed: July 12, 2013
    Date of Patent: July 7, 2015
    Assignee: BEAUTY BELA COSME CORP.
    Inventors: Yu-Jen Li, Yi-Min Wang, I-Chen Hsieh
  • Publication number: 20140338216
    Abstract: A nail polish curing device comprises: a lower part defining a lower recess; an upper part pivoted to the lower part and defining an upper recess; a circuit board mounted on the upper part; and at least one light emitting element connected to the circuit board. The upper part is rotatable relative to the lower part between a first angular position, in which the upper and lower recesses overlap along a vertical direction and cooperate with each other to define an accommodating space for receiving a user's finger therein, and a second angular position, in which the upper and lower recesses do not overlap along the vertical direction, thereby facilitating insertion of a user's toe into an irradiating space between a bottom surface of the upper part and a reference surface.
    Type: Application
    Filed: July 12, 2013
    Publication date: November 20, 2014
    Inventors: Yu-Jen Li, Yi-Min Wang, I-Chen Hsieh
  • Publication number: 20140338215
    Abstract: A nail polish curing device comprises: a lower part having a top surface and a reflective lower recess-defining surface that extends downwardly from the top surface and that defines a lower recess; an upper part disposed above the lower part and having a top wall, a bottom surface, and a reflective upper recess-defining surface that extends upwardly from the bottom surface and that defines an upper recess, the top wall being formed with a plurality of through-holes; a circuit board mounted on the top wall of the upper part; and a plurality of light emitting elements mounted on and electrically connected to the circuit board and extending respectively through the through-holes into the upper recess so as to emit light into the upper and lower recesses.
    Type: Application
    Filed: July 11, 2013
    Publication date: November 20, 2014
    Inventors: Yu-Jen Li, Yi-Min Wang, I-Chen Hsieh