Abstract: A thin film transistor (TFT) substrate includes a substrate which is a flexible substrate, and a TFT structure disposed on the substrate and including a gate layer, a gate insulator layer, a first channel island and a second channel island. The gate layer is disposed on the substrate and including a first gate electrode and a second gate electrode electrically connected to each other. The first and second gate electrodes are parts of the same TFT structure. The gate insulator layer covers the first and second gate electrodes. The first and second channel islands are disposed on the gate insulator layer and respectively correspond to the first and second gate electrodes. The source and drain layer is disposed on the gate insulator layer and next to the first and second channel islands, wherein the source and drain layer partially covers top surfaces of the first and second channel islands.

Abstract: A thin film transistor (TFT) substrate includes a substrate which is a flexible substrate, and a TFT structure disposed on the substrate and including a gate layer, a gate insulator layer, a first channel island and a second channel island. The gate layer is disposed on the substrate and including a first gate electrode and a second gate electrode electrically connected to each other. The first and second gate electrodes are parts of the same TFT structure. The gate insulator layer covers the first and second gate electrodes. The first and second channel islands are disposed on the gate insulator layer and respectively correspond to the first and second gate electrodes. The source and drain layer is disposed on the gate insulator layer and next to the first and second channel islands, wherein the source and drain layer partially covers top surfaces of the first and second channel islands.

Abstract: A thin film transistor structure includes a substrate, a gate layer, a gate insulator layer, a first semiconductor island, a second semiconductor island and a source and drain layer. The gate layer is disposed on the substrate, and includes a first gate electrode and a second electrode electrically connected to the first gate electrode. The gate insulator layer is disposed on the substrate and covers the first and second gate electrodes. The first semiconductor island is disposed on the gate insulator layer and corresponding to the first gate electrode. The second semiconductor island is disposed on the gate insulator layer and corresponding to the second electrode. The source and drain layer is disposed on the gate insulator layer and next to the first semiconductor island and the second semiconductor island. A display device using the above thin film transistor structure is also provided.

Abstract: A thin film transistor structure includes a substrate, a gate layer, a gate insulator layer, a first semiconductor island, a second semiconductor island and a source and drain layer. The gate layer is disposed on the substrate, and includes a first gate electrode and a second electrode electrically connected to the first gate electrode. The gate insulator layer is disposed on the substrate and covers the first and second gate electrodes. The first semiconductor island is disposed on the gate insulator layer and corresponding to the first gate electrode. The second semiconductor island is disposed on the gate insulator layer and corresponding to the second electrode. The source and drain layer is disposed on the gate insulator layer and next to the first semiconductor island and the second semiconductor island. A display device using the above thin film transistor structure is also provided.