Abstract: A method for manufacturing a semiconductor device includes: providing a wafer-bonding stack structure having a sidewall layer and an exposed first component layer; forming a photoresist layer on the first component layer; performing an edge trimming process to at least remove the sidewall layer; and removing the photoresist layer. In this way, contaminant particles generated from the blade during the edge trimming process may fall on the photoresist layer but not fall on the first component layer, so as to protect the first component layer from being contaminated.

Abstract: The disclosure provides a method of active immunotherapy for a cancer patient, comprising administering vaccines against Globo series antigens (i.e., Globo H, SSEA-3 and SSEA-4). Specifically, the method comprises administering Globo H-CRM197 (OBI-833/821) in patients with cancer. The disclosure also provides a method of selecting a cancer patient who is suitable as treatment candidate for immunotherapy. Exemplary immune response can be characterized by reduction of the severity of disease, including but not limited to, prevention of disease, delay in onset of disease, decreased severity of symptoms, decreased morbidity and delayed mortality.

Abstract: A probiotic composition for improving an effect of a chemotherapeutic drug of Gemcitabine on inhibiting pancreatic cancer is disclosed in the present disclosure. The probiotic composition comprises an effective amount of Lactobacillus paracasei GMNL-133, an effective amount of Lactobacillus reuteri GMNL-89, and a pharmaceutically acceptable carrier, wherein the Lactobacillus paracasei GMNL-133 was deposited in the China Center for Type Culture Collection on Sep. 26, 2011 under an accession number CCTCC NO. M 2011331, and the Lactobacillus reuteri GMNL-89 was deposited in the China Center for Type Culture Collection on Nov. 19, 2007 under an accession number CCTCC NO. M 207154. A method for improving the effect of the chemotherapeutic drug of Gemcitabine on inhibiting pancreatic cancer is further disclosed in the present disclosure.

Abstract: A method for manufacturing a semiconductor device includes: providing a wafer-bonding stack structure having a sidewall layer and an exposed first component layer; forming a photoresist layer on the first component layer; performing an edge trimming process to at least remove the sidewall layer; and removing the photoresist layer. In this way, contaminant particles generated from the blade during the edge trimming process may fall on the photoresist layer but not fall on the first component layer, so as to protect the first component layer from being contaminated.

Abstract: A method, a system, and a computer program product for object color correction are provided. Two images of the same target provided by two image capturing devices are introduced into an image conversion model constructed by an image conversion algorithm, and a color coefficient and a luminance coefficient for color space conversion are found, so as to convert the two images to a target color space. Then, the two images in the target color space are introduced into an image color distribution space model constructed by the image conversion algorithm, so as to obtain two different image color distribution space principal axes. The two image color distribution space principal axes are compared and adjusted to be parallel, thereby adjusting a color difference between the two images. The two images that are adjusted are converted back to an original color space, so as to obtain the two corrected images.

Abstract: A method, a system, and a computer program product for object color correction are provided. Two images of the same target provided by two image capturing devices are introduced into an image conversion model constructed by an image conversion algorithm, and a color coefficient and a luminance coefficient for color space conversion are found, so as to convert the two images to a target color space. Then, the two images in the target color space are introduced into an image color distribution space model constructed by the image conversion algorithm, so as to obtain two different image color distribution space principal axes. The two image color distribution space principal axes are compared and adjusted to be parallel, thereby adjusting a color difference between the two images. The two images that are adjusted are converted back to an original color space, so as to obtain the two corrected images.