Patents by Inventor I-Kuan Lin

I-Kuan Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Electrostatic Chuck With Photo-Patternable Soft Protrusion Contact Surface
    Publication number: 20150294891
    Abstract: In accordance with an embodiment of the invention, there is provided a soft protrusion structure for an electrostatic chuck, which offers a non-abrasive contact surface for wafers, workpieces or other substrates, while also having improved manufacturability and compatibility with grounded surface platen designs. The soft protrusion structure comprises a photo-patternable polymer.
    Type: Application
    Filed: October 29, 2013
    Publication date: October 15, 2015
    Applicant: Entegris, Inc.
    Inventors: I-Kuan Lin, Richard A. Cooke, Jakub Rybczynski
  • DIFFUSION RESISTANT ELECTROSTATIC CLAMP
    Publication number: 20150214087
    Abstract: In one embodiment, a method of fabricating an electrostatic clamp includes forming an insulator body, forming an electrode on the insulator body, and depositing a layer stack on the electrode, the layer stack comprising an aluminum oxide layer that is deposited using atomic layer deposition (ALD).
    Type: Application
    Filed: May 16, 2014
    Publication date: July 30, 2015
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Dale K. Stone, Richard Cooke, I-Kuan Lin, Julian G. Blake, Lyudmila Stone
  • Electrostatic chuck with photo-patternable soft protrusion contact surface
    Patent number: 8861170
    Abstract: In accordance with an embodiment of the invention, there is provided a soft protrusion structure for an electrostatic chuck, which offers a non-abrasive contact surface for wafers, workpieces or other substrates, while also having improved manufacturability and compatibility with grounded surface platen designs. The soft protrusion structure comprises a photo-patternable polymer.
    Type: Grant
    Filed: November 2, 2012
    Date of Patent: October 14, 2014
    Assignee: Entegris, Inc.
    Inventors: I-Kuan Lin, Richard A. Cooke, Jakub Rybczynski