Patents by Inventor I-Lun TSENG

I-Lun TSENG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11675954
    Abstract: A method of designing a device includes identifying a pin to be inserted into a first layer of the device, wherein the first layer has a plurality of first routing tracks, and each of the plurality of first routing tracks extend in a first direction. The method further includes identifying a blocking shape on a second layer different from the first layer, wherein the second layer has a plurality of second routing tracks, and each of the plurality of second routing tracks extends in a second direction different from the first direction. The method further includes determining at least one candidate location for the pin in the first layer based on the plurality of first routing tracks of the first layer. The method further includes setting a location for the pin in the first layer based on the determined at least one candidate location.
    Type: Grant
    Filed: October 20, 2020
    Date of Patent: June 13, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Sheng-Hsiung Chen, Jyun-Hao Chang, Ting-Wei Chiang, Fong-Yuan Chang, I-Lun Tseng, Po-Hsiang Huang
  • Patent number: 11132488
    Abstract: A method of modifying a cell includes determining a number of pins in a maximum overlapped pin group region. The method further includes determining a number of routing tracks within a span region of the maximum overlapped pin group region. The method further includes comparing the number of pins and the number of routing tracks within the span region to determine a global tolerance of the cell. The method further includes increasing a length of at least one pin of the maximum overlapped pin group in response to the global tolerance failing to satisfy a predetermined threshold.
    Type: Grant
    Filed: January 29, 2020
    Date of Patent: September 28, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Sheng-Hsiung Chen, Jyun-Hao Chang, Ting-Wei Chiang, Fong-Yuan Chang, I-Lun Tseng, Po-Hsiang Huang
  • Publication number: 20210034807
    Abstract: A method of designing a device includes identifying a pin to be inserted into a first layer of the device, wherein the first layer has a plurality of first routing tracks, and each of the plurality of first routing tracks extend in a first direction. The method further includes identifying a blocking shape on a second layer different from the first layer, wherein the second layer has a plurality of second routing tracks, and each of the plurality of second routing tracks extends in a second direction different from the first direction. The method further includes determining at least one candidate location for the pin in the first layer based on the plurality of first routing tracks of the first layer. The method further includes setting a location for the pin in the first layer based on the determined at least one candidate location.
    Type: Application
    Filed: October 20, 2020
    Publication date: February 4, 2021
    Inventors: Sheng-Hsiung CHEN, Jyun-Hao CHANG, Ting-Wei CHIANG, Fong-Yuan CHANG, I-Lun TSENG, Po-Hsiang HUANG
  • Publication number: 20200167518
    Abstract: A method of modifying a cell includes determining a number of pins in a maximum overlapped pin group region. The method further includes determining a number of routing tracks within a span region of the maximum overlapped pin group region. The method further includes comparing the number of pins and the number of routing tracks within the span region to determine a global tolerance of the cell. The method further includes increasing a length of at least one pin of the maximum overlapped pin group in response to the global tolerance failing to satisfy a predetermined threshold.
    Type: Application
    Filed: January 29, 2020
    Publication date: May 28, 2020
    Inventors: Sheng-Hsiung CHEN, Jyun-Hao CHANG, Ting-Wei CHIANG, Fong-Yuan CHANG, I-Lun TSENG, Po-Hsiang HUANG
  • Patent number: 10552568
    Abstract: A method of modifying a cell includes identifying a maximum overlapped pin group. The method further includes determining a number of pins in the maximum overlapped pin group. The method further includes determining a span region of the maximum overlapped pin group. The method further includes comparing the number of pins and the span region to determine a global tolerance of the cell. The method further includes increasing a length of at least one pin of the maximum overlapped pin group in response to the global tolerance failing to satisfy a predetermined threshold. The method further includes fabricating a mask based on the increased length of the at least one pin.
    Type: Grant
    Filed: December 18, 2017
    Date of Patent: February 4, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Sheng-Hsiung Chen, Jyun-Hao Chang, Ting-Wei Chiang, Fong-Yuan Chang, I-Lun Tseng, Po-Hsiang Huang
  • Publication number: 20180107780
    Abstract: A method of modifying a cell includes identifying a maximum overlapped pin group. The method further includes determining a number of pins in the maximum overlapped pin group. The method further includes determining a span region of the maximum overlapped pin group. The method further includes comparing the number of pins and the span region to determine a global tolerance of the cell. The method further includes increasing a length of at least one pin of the maximum overlapped pin group in response to the global tolerance failing to satisfy a predetermined threshold. The method further includes fabricating a mask based on the increased length of the at least one pin.
    Type: Application
    Filed: December 18, 2017
    Publication date: April 19, 2018
    Inventors: Sheng-Hsiung CHEN, Jyun-Hao CHANG, Ting-Wei CHIANG, Fong-Yuan CHANG, I-Lun TSENG, Po-Hsiang HUANG
  • Patent number: 9846759
    Abstract: A method of global connection routing includes determining a global connection tolerance of a cell for use in a circuit layout, wherein the cell comprises a plurality of pins, and a plurality of routing tracks are defined with respect to the cell. The method further includes determining a number of blocked tracks within the cell. The method further includes comparing the global connection tolerance with the number of blocked tracks. The method further includes adjusting a location of the cell within the circuit layout if the global connection tolerance and the number of blocked tracks fail to satisfy a predetermined condition.
    Type: Grant
    Filed: July 30, 2015
    Date of Patent: December 19, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Sheng-Hsiung Chen, Jyun-Hao Chang, Ting-Wei Chiang, Fong-Yuan Chang, I-Lun Tseng, Po-Hsiang Huang
  • Publication number: 20170032073
    Abstract: A method of global connection routing includes determining a global connection tolerance of a cell for use in a circuit layout, wherein the cell comprises a plurality of pins, and a plurality of routing tracks are defined with respect to the cell. The method further includes determining a number of blocked tracks within the cell. The method further includes comparing the global connection tolerance with the number of blocked tracks. The method further includes adjusting a location of the cell within the circuit layout if the global connection tolerance and the number of blocked tracks fail to satisfy a predetermined condition.
    Type: Application
    Filed: July 30, 2015
    Publication date: February 2, 2017
    Inventors: Sheng-Hsiung CHEN, Jyun-Hao CHANG, Ting-Wei CHIANG, Fong-Yuan CHANG, I-Lun TSENG, Po-Hsiang HUANG