Patents by Inventor I-Yao Chen

I-Yao Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240168329
    Abstract: An electronic device including a first light emitting unit, a second light emitting unit, a first optical layer and a second optical layer is disclosed. The first light emitting unit emits a first light. The second light emitting unit emits a second light. At least one of the first light and the second light passes through the first optical layer. The second optical layer is overlapped with the first optical layer. The second optical layer is configured to scatter the first light emitted from the first light emitting unit. When the first light emitting unit emits the first light, the second light emitting unit selectively emits the second light.
    Type: Application
    Filed: January 31, 2024
    Publication date: May 23, 2024
    Applicant: InnoLux Corporation
    Inventors: Kuei-Sheng CHANG, Kuo-Jung Wu, Po-Yang Chen, I-An Yao
  • Patent number: 11972072
    Abstract: The present disclosure provides an electronic device including a first sensing circuit, a second sensing circuit and a power line. The first sensing circuit includes a first sensing unit and a first transistor, and a first end of the first sensing unit is coupled to a control end of the first transistor. The second sensing circuit includes a second sensing unit and a second transistor, and a first end of the second sensing unit is coupled to a control end of the second transistor. A first end of the first transistor and a first end of the second transistor are coupled to the power line.
    Type: Grant
    Filed: November 1, 2022
    Date of Patent: April 30, 2024
    Assignee: InnoLux Corporation
    Inventors: Shu-Fen Li, Chuan-Chi Chien, Hsiao-Feng Liao, Rui-An Yu, Chang-Chiang Cheng, Po-Yang Chen, I-An Yao
  • Publication number: 20240135745
    Abstract: An electronic device has a narrow viewing angle state and a wide viewing angle state, and includes a panel and a light source providing a light passing through the panel. In the narrow viewing angle state, the light has a first relative light intensity and a second relative light intensity. The first relative light intensity is the strongest light intensity, the second relative light intensity is 50% of the strongest light intensity, the first relative light intensity corresponds to an angle of 0°, the second relative light intensity corresponds to a half-value angle, and the half-value angle is between ?15° and 15°. In the narrow angle state, a third relative light intensity at each angle between 20° and 60° or each angle between ?20° and ?60° is lower than 20% of the strongest light intensity.
    Type: Application
    Filed: January 3, 2024
    Publication date: April 25, 2024
    Applicant: InnnoLux Corporation
    Inventors: Kuei-Sheng Chang, Po-Yang Chen, Kuo-Jung Wu, I-An Yao, Wei-Cheng Lee, Hsien-Wen Huang
  • Patent number: 11921372
    Abstract: A display device including a first light emitting unit, a second light emitting unit, a first optical layer and a second optical layer is disclosed. The first optical layer is disposed on at least one of the first light emitting unit and the second light emitting unit, and the first optical layer includes a collimating layer. The second optical layer is disposed on the first light emitting unit. The second optical layer is configured to scatter a first light emitted from the first light emitting unit but does not scatter a second light emitted from the second light emitting unit.
    Type: Grant
    Filed: February 14, 2023
    Date of Patent: March 5, 2024
    Assignee: InnoLux Corporation
    Inventors: Kuei-Sheng Chang, Kuo-Jung Wu, Po-Yang Chen, I-An Yao
  • Publication number: 20080217296
    Abstract: An etching apparatus of a semiconductor processing apparatus and the method thereof for recycling etchant solutions are provided. The method is suitable for a processing apparatus which provides an etchant solution on a wafer so as to perform an etching process. After the etching process is completed, a water solution is added to the etchant solution for maintaining a water content thereof. Then, the mixed etchant solution is recycled.
    Type: Application
    Filed: March 7, 2007
    Publication date: September 11, 2008
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Son-Lung Chen, Ying-Fang Chen, I-Yao Chen, Kuo-Chang Chu, Guo-Qiang Wu