Patents by Inventor Iacopo Mochi

Iacopo Mochi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10720336
    Abstract: A mask structure and a method for manufacturing a mask structure for a lithography process is provided. The method includes providing a substrate covered with an absorber layer on a side thereof; providing a patterned layer over the absorber layer, the patterned layer comprising at least one opening; and forming at least one assist mask feature in the at least one opening, wherein the at least one assist mask feature is formed by performing a directed self-assembly (DSA) patterning process comprising providing a BCP material in the at least one opening and inducing phase separation of a BCP material into a first component and a second component, the first component being the at least one assist mask feature and being periodically distributed with respect to the second component.
    Type: Grant
    Filed: August 30, 2018
    Date of Patent: July 21, 2020
    Assignees: IMEC VZW, Katholieke Universiteit Leuven, KU LEUVEN R&D
    Inventors: Emily Gallagher, Roel Gronheid, Jan Doise, Iacopo Mochi
  • Publication number: 20190074186
    Abstract: A mask structure and a method for manufacturing a mask structure for a lithography process is provided. The method includes providing a substrate covered with an absorber layer on a side thereof; providing a patterned layer over the absorber layer, the patterned layer comprising at least one opening; and forming at least one assist mask feature in the at least one opening, wherein the at least one assist mask feature is formed by performing a directed self-assembly (DSA) patterning process comprising providing a BCP material in the at least one opening and inducing phase separation of a BCP material into a first component and a second component, the first component being the at least one assist mask feature and being periodically distributed with respect to the second component.
    Type: Application
    Filed: August 30, 2018
    Publication date: March 7, 2019
    Applicants: IMEC VZW, Katholieke Universiteit Leuven, KU LEUVEN R&D
    Inventors: Emily Gallagher, Roel Gronheid, Jan Doise, Iacopo Mochi
  • Publication number: 20150185486
    Abstract: This disclosure provides systems, methods, and apparatus related to imaging elements. In one aspect, a system includes an electromagnetic radiation source, a detector, and an imaging element. The electromagnetic radiation source is configured to generate electromagnetic radiation. The imaging element is configured to simultaneously project a plurality of images of an object onto the detector after the electromagnetic radiation interacts with the object. Each of the plurality of images of the object has different properties from others of the plurality of images.
    Type: Application
    Filed: February 20, 2015
    Publication date: July 2, 2015
    Inventors: Kenneth A. Goldberg, Iacopo Mochi