Patents by Inventor Ian K. McDaniel

Ian K. McDaniel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Using sacrificial polymer materials in semiconductor processing
    Patent number: 11651952
    Abstract: In an example, a wet cleaning process is performed to clean a structure having features and openings between the features while preventing drying of the structure. After performing the wet cleaning process, a polymer solution is deposited in the openings while continuing to prevent any drying of the structure. A sacrificial polymer material is formed in the openings from the polymer solution. The structure may be used in semiconductor devices, such as integrated circuits, memory devices, MEMS, among others.
    Type: Grant
    Filed: February 5, 2021
    Date of Patent: May 16, 2023
    Assignee: Micron Technology, Inc.
    Inventors: Michael T. Andreas, Jerome A. Imonigie, Prashant Raghu, Sanjeev Sapra, Ian K. McDaniel
  • USING SACRIFICIAL POLYMER MATERIALS IN SEMICONDUCTOR PROCESSING
    Publication number: 20210159069
    Abstract: In an example, a wet cleaning process is performed to clean a structure having features and openings between the features while preventing drying of the structure. After performing the wet cleaning process, a polymer solution is deposited in the openings while continuing to prevent any drying of the structure. A sacrificial polymer material is formed in the openings from the polymer solution. The structure may be used in semiconductor devices, such as integrated circuits, memory devices, MEMS, among others.
    Type: Application
    Filed: February 5, 2021
    Publication date: May 27, 2021
    Inventors: Michael T. Andreas, Jerome A. Imonigie, Prashant Raghu, Sanjeev Sapra, Ian K. McDaniel
  • Using sacrificial polymer materials in semiconductor processing
    Patent number: 10916418
    Abstract: In an example, a wet cleaning process is performed to clean a structure having features and openings between the features while preventing drying of the structure. After performing the wet cleaning process, a polymer solution is deposited in the openings while continuing to prevent any drying of the structure. A sacrificial polymer material is formed in the openings from the polymer solution. The structure may be used in semiconductor devices, such as integrated circuits, memory devices, MEMS, among others.
    Type: Grant
    Filed: November 7, 2019
    Date of Patent: February 9, 2021
    Assignee: Micron Technology, Inc.
    Inventors: Michael T. Andreas, Jerome A. Imonigie, Prashant Raghu, Sanjeev Sapra, Ian K. McDaniel
  • USING SACRIFICIAL POLYMER MATERIALS IN SEMICONDUCTOR PROCESSING
    Publication number: 20200075316
    Abstract: In an example, a wet cleaning process is performed to clean a structure having features and openings between the features while preventing drying of the structure. After performing the wet cleaning process, a polymer solution is deposited in the openings while continuing to prevent any drying of the structure. A sacrificial polymer material is formed in the openings from the polymer solution. The structure may be used in semiconductor devices, such as integrated circuits, memory devices, MEMS, among others.
    Type: Application
    Filed: November 7, 2019
    Publication date: March 5, 2020
    Inventors: Michael T. Andreas, Jerome A. Imonigie, Prashant Raghu, Sanjeev Sapra, Ian K. McDaniel
  • Using sacrificial polymer materials in semiconductor processing
    Patent number: 10497558
    Abstract: In an example, a wet cleaning process is performed to clean a structure having features and openings between the features while preventing drying of the structure. After performing the wet cleaning process, a polymer solution is deposited in the openings while continuing to prevent any drying of the structure. A sacrificial polymer material is formed in the openings from the polymer solution. The structure may be used in semiconductor devices, such as integrated circuits, memory devices, MEMS, among others.
    Type: Grant
    Filed: February 26, 2018
    Date of Patent: December 3, 2019
    Assignee: Micron Technology, Inc.
    Inventors: Michael T. Andreas, Jerome A. Imonigie, Prashant Raghu, Sanjeev Sapra, Ian K. McDaniel
  • USING SACRIFICIAL POLYMER MATERIALS IN SEMICONDUCTOR PROCESSING
    Publication number: 20190267232
    Abstract: In an example, a wet cleaning process is performed to clean a structure having features and openings between the features while preventing drying of the structure. After performing the wet cleaning process, a polymer solution is deposited in the openings while continuing to prevent any drying of the structure. A sacrificial polymer material is formed in the openings from the polymer solution. The structure may be used in semiconductor devices, such as integrated circuits, memory devices, MEMS, among others.
    Type: Application
    Filed: February 26, 2018
    Publication date: August 29, 2019
    Inventors: Michael T. Andreas, Jerome A. Imonigie, Prashant Raghu, Sanjeev Sapra, Ian K. McDaniel