Patents by Inventor Ian Kenworthy

Ian Kenworthy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10985078
    Abstract: An apparatus for use in a processing chamber is provided. A consumable is within the processing chamber. A scale is positioned to measure a mass of the consumable.
    Type: Grant
    Filed: November 6, 2015
    Date of Patent: April 20, 2021
    Assignee: Lam Research Corporation
    Inventor: Ian Kenworthy
  • Patent number: 10665435
    Abstract: A plasma chamber is provided to increase conductance within the plasma chamber and to increase uniformity of the conductance. A radio frequency (RF) path for supplying power to the plasma chamber is symmetric with respect to a center axis of the plasma chamber. Moreover, pumps used to remove materials from the plasma chamber are located symmetric with respect to the center axis. The symmetric arrangements of the RF paths and the pumps facilitate an increase in conductance uniformity within the plasma chamber.
    Type: Grant
    Filed: August 12, 2019
    Date of Patent: May 26, 2020
    Assignee: Lam Research Corporation
    Inventors: Daniel Arthur Brown, John Patrick Holland, Michael C. Kellogg, James E. Tappan, Jerrel K. Antolik, Ian Kenworthy, Theo Panagopoulos, Zhigang Chen
  • Publication number: 20190371579
    Abstract: A plasma chamber is provided to increase conductance within the plasma chamber and to increase uniformity of the conductance. A radio frequency (RF) path for supplying power to the plasma chamber is symmetric with respect to a center axis of the plasma chamber. Moreover, pumps used to remove materials from the plasma chamber are located symmetric with respect to the center axis. The symmetric arrangements of the RF paths and the pumps facilitate an increase in conductance uniformity within the plasma chamber.
    Type: Application
    Filed: August 12, 2019
    Publication date: December 5, 2019
    Inventors: Daniel Arthur Brown, John Patrick Holland, Michael C. Kellogg, James E. Tappan, Jerrel K. Antolik, Ian Kenworthy, Theo Panagopoulos, Zhigang Chen
  • Patent number: 10395902
    Abstract: A plasma chamber is provided to increase conductance within the plasma chamber and to increase uniformity of the conductance. A radio frequency (RF) path for supplying power to the plasma chamber is symmetric with respect to a center axis of the plasma chamber. Moreover, pumps used to remove materials from the plasma chamber are located symmetric with respect to the center axis. The symmetric arrangements of the RF paths and the pumps facilitate an increase in conductance uniformity within the plasma chamber.
    Type: Grant
    Filed: July 18, 2018
    Date of Patent: August 27, 2019
    Assignee: Lam Research Corporation
    Inventors: Daniel Arthur Brown, John Patrick Holland, Michael C. Kellogg, James E. Tappan, Jerrel K. Antolik, Ian Kenworthy, Theo Panagopoulos, Zhigang Chen
  • Patent number: 10332729
    Abstract: A compression member for use in a showerhead electrode assembly of a capacitively coupled plasma chamber. The member applies a compression force to a portion of a film heater adjacent a power supply boot on an upper surface of a thermal control plate and is located between the thermal control plate and a temperature-controlled top plate. The member is composed of an electrically insulating elastomeric material which can work over a large range of compressions and temperatures.
    Type: Grant
    Filed: February 13, 2018
    Date of Patent: June 25, 2019
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Darrell Ehrlich, Daniel Arthur Brown, Ian Kenworthy
  • Publication number: 20180323044
    Abstract: A plasma chamber is provided to increase conductance within the plasma chamber and to increase uniformity of the conductance. A radio frequency (RF) path for supplying power to the plasma chamber is symmetric with respect to a center axis of the plasma chamber. Moreover, pumps used to remove materials from the plasma chamber are located symmetric with respect to the center axis. The symmetric arrangements of the RF paths and the pumps facilitate an increase in conductance uniformity within the plasma chamber.
    Type: Application
    Filed: July 18, 2018
    Publication date: November 8, 2018
    Inventors: Daniel Arthur Brown, John Patrick Holland, Michael C. Kellogg, James E. Tappan, Jerrel K. Antolik, Ian Kenworthy, Theo Panagopoulos, Zhigang Chen
  • Patent number: 10049862
    Abstract: A plasma chamber is provided to increase conductance within the plasma chamber and to increase uniformity of the conductance. A radio frequency (RF) path for supplying power to the plasma chamber is symmetric with respect to a center axis of the plasma chamber. Moreover, pumps used to remove materials from the plasma chamber are located symmetric with respect to the center axis. The symmetric arrangements of the RF paths and the pumps facilitate an increase in conductance uniformity within the plasma chamber.
    Type: Grant
    Filed: March 11, 2016
    Date of Patent: August 14, 2018
    Assignee: Lam Research Corporation
    Inventors: Daniel Arthur Brown, John Patrick Holland, Michael C. Kellogg, James E. Tappan, Jerrel K. Antolik, Ian Kenworthy, Theo Panagopoulos, Zhigang Chen
  • Publication number: 20180174804
    Abstract: A compression member for use in a showerhead electrode assembly of a capacitively coupled plasma chamber. The member applies a compression force to a portion of a film heater adjacent a power supply boot on an upper surface of a thermal control plate and is located between the thermal control plate and a temperature-controlled top plate. The member is composed of an electrically insulating elastomeric material which can work over a large range of compressions and temperatures.
    Type: Application
    Filed: February 13, 2018
    Publication date: June 21, 2018
    Inventors: Darrell EHRLICH, Daniel Arthur Brown, Ian Kenworthy
  • Patent number: 9922804
    Abstract: A compression member for use in a showerhead electrode assembly of a capacitively coupled plasma chamber. The member applies a compression force to a portion of a film heater adjacent a power supply boot on an upper surface of a thermal control plate and is located between the thermal control plate and a temperature-controlled top plate. The member is composed of an electrically insulating elastomeric material which can work over a large range of compressions and temperatures.
    Type: Grant
    Filed: May 12, 2015
    Date of Patent: March 20, 2018
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Darrell Ehrlich, Daniel Arthur Brown, Ian Kenworthy
  • Patent number: 9689533
    Abstract: A gas delivery system for a plasma process system such as a plasma etching system wherein inner surfaces of gas passages are coated with a corrosion-resistant material coating formed by curing a layer of fluidic precursor deposited on the inner surfaces. The coating can be formed by (a) flowing a fluidic precursor of a corrosion-resistant material through the gas passages and depositing a layer of the fluidic precursor to completely coat the inner surfaces of the gas passages; (b) removing excess fluidic precursor from the inner surfaces; (c) curing the deposited layer of the fluidic precursor to form a corrosion-resistant material coating.
    Type: Grant
    Filed: August 29, 2014
    Date of Patent: June 27, 2017
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Ian Kenworthy, Duane Outka, Fangli Hao, Leonard Sharpless, Yijun Du
  • Publication number: 20170133283
    Abstract: An apparatus for use in a processing chamber is provided. A consumable is within the processing chamber. A scale is positioned to measure a mass of the consumable.
    Type: Application
    Filed: November 6, 2015
    Publication date: May 11, 2017
    Inventor: Ian KENWORTHY
  • Publication number: 20160307743
    Abstract: A plasma chamber is provided to increase conductance within the plasma chamber and to increase uniformity of the conductance. A radio frequency (RF) path for supplying power to the plasma chamber is symmetric with respect to a center axis of the plasma chamber. Moreover, pumps used to remove materials from the plasma chamber are located symmetric with respect to the center axis. The symmetric arrangements of the RF paths and the pumps facilitate an increase in conductance uniformity within the plasma chamber.
    Type: Application
    Filed: March 11, 2016
    Publication date: October 20, 2016
    Inventors: Daniel Arthur Brown, John Patrick Holland, Michael C. Kellogg, James E. Tappan, Jerrel K. Antolik, Ian Kenworthy, Theo Panagopoulos, Zhigang Chen
  • Publication number: 20150243487
    Abstract: A compression member for use in a showerhead electrode assembly of a capacitively coupled plasma chamber. The member applies a compression force to a portion of a film heater adjacent a power supply boot on an upper surface of a thermal control plate and is located between the thermal control plate and a temperature-controlled top plate. The member is composed of an electrically insulating elastomeric material which can work over a large range of compressions and temperatures.
    Type: Application
    Filed: May 12, 2015
    Publication date: August 27, 2015
    Applicant: LAM RESEARCH CORPORATION
    Inventors: Darrell Ehrlich, Daniel Arthur Brown, Ian Kenworthy
  • Patent number: 9058960
    Abstract: A compression member for use in a showerhead electrode assembly of a capacitively coupled plasma chamber. The member applies a compression force to a portion of a film heater adjacent a power supply boot on an upper surface of a thermal control plate and is located between the thermal control plate and a temperature-controlled top plate. The member is composed of an electrically insulating elastomeric material which can work over a large range of compressions and temperatures.
    Type: Grant
    Filed: May 9, 2012
    Date of Patent: June 16, 2015
    Assignee: Lam Research Corporation
    Inventors: Darrell Ehrlich, Daniel Arthur Brown, Ian Kenworthy
  • Publication number: 20140366968
    Abstract: A gas delivery system for a plasma process system such as a plasma etching system wherein inner surfaces of gas passages are coated with a corrosion-resistant material coating formed by curing a layer of fluidic precursor deposited on the inner surfaces. The coating can be formed by (a) flowing a fluidic precursor of a corrosion-resistant material through the gas passages and depositing a layer of the fluidic precursor to completely coat the inner surfaces of the gas passages; (b) removing excess fluidic precursor from the inner surfaces; (c) curing the deposited layer of the fluidic precursor to form a corrosion-resistant material coating.
    Type: Application
    Filed: August 29, 2014
    Publication date: December 18, 2014
    Inventors: Ian Kenworthy, Duane Outka, Fangli Hao, Leonard Sharpless, Yijun Du
  • Patent number: 8852685
    Abstract: A method of coating the inner surfaces of gas passages of a gas delivery system for a plasma process system such as a plasma etching system includes (a) flowing a fluidic precursor of a corrosion-resistant material through the gas passages and depositing a layer of the fluidic precursor to completely coat the inner surfaces of the gas passages; (b) removing excess fluidic precursor from the inner surfaces; (c) curing the deposited layer of the fluidic precursor to form a corrosion-resistant material coating.
    Type: Grant
    Filed: April 23, 2010
    Date of Patent: October 7, 2014
    Assignee: Lam Research Corporation
    Inventors: Ian Kenworthy, Duane Outka, Fangli Hao, Leonard Sharpless, Yijun Du
  • Publication number: 20130299605
    Abstract: A compression member for use in a showerhead electrode assembly of a capacitively coupled plasma chamber. The member applies a compression force to a portion of a film heater adjacent a power supply boot on an upper surface of a thermal control plate and is located between the thermal control plate and a temperature-controlled top plate. The member is composed of an electrically insulating elastomeric material which can work over a large range of compressions and temperatures.
    Type: Application
    Filed: May 9, 2012
    Publication date: November 14, 2013
    Applicant: Lam Research Corporation
    Inventors: Darrell Ehrlich, Daniel Arthur Brown, Ian Kenworthy
  • Publication number: 20110259519
    Abstract: A method of coating the inner surfaces of gas passages of a gas delivery system for a plasma process system such as a plasma etching system includes (a) flowing a fluidic precursor of a corrosion-resistant material through the gas passages and depositing a layer of the fluidic precursor to completely coat the inner surfaces of the gas passages; (b) removing excess fluidic precursor from the inner surfaces; (c) curing the deposited layer of the fluidic precursor to form a corrosion-resistant material coating.
    Type: Application
    Filed: April 23, 2010
    Publication date: October 27, 2011
    Applicant: Lam Research Corporation
    Inventors: Ian Kenworthy, Duane Outka, Fangli Hao, Leonard Sharpless, Yijun Du
  • Patent number: 4582666
    Abstract: A non-woven fabric having a pattern defined by an array of discrete areas having a reduced fibre density but which are substantially free of perforations is produced by supporting a freshly wet laid web of the non-woven fabric on a porous surface and directing spaced jets of fluid against the unsupported side in order to displace fibres within discrete areas while maintaining in position a proportion of fibres that are within those areas and that are adjacent the porous surface. The fabric web may be supported on a Fourdrinier wire (1) and the jets of fluid (e.g. water) may be directed through the apertures in a perforated cylinder (6), the fluid being supplied under pressure from a water-knife device (11). The apertures in the cylinder (6) preferably have a cross-section that increases in the direction of the water jets.
    Type: Grant
    Filed: October 22, 1982
    Date of Patent: April 15, 1986
    Assignees: C. H. Dexter Limited, Societe Francaise des non Tissues
    Inventors: Ian Kenworthy, Robert B. Gettins, Peter W. Logan, Patrick Jeambar, Andre Vuillaume