Patents by Inventor Ian Kenworthy
Ian Kenworthy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10985078Abstract: An apparatus for use in a processing chamber is provided. A consumable is within the processing chamber. A scale is positioned to measure a mass of the consumable.Type: GrantFiled: November 6, 2015Date of Patent: April 20, 2021Assignee: Lam Research CorporationInventor: Ian Kenworthy
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Patent number: 10665435Abstract: A plasma chamber is provided to increase conductance within the plasma chamber and to increase uniformity of the conductance. A radio frequency (RF) path for supplying power to the plasma chamber is symmetric with respect to a center axis of the plasma chamber. Moreover, pumps used to remove materials from the plasma chamber are located symmetric with respect to the center axis. The symmetric arrangements of the RF paths and the pumps facilitate an increase in conductance uniformity within the plasma chamber.Type: GrantFiled: August 12, 2019Date of Patent: May 26, 2020Assignee: Lam Research CorporationInventors: Daniel Arthur Brown, John Patrick Holland, Michael C. Kellogg, James E. Tappan, Jerrel K. Antolik, Ian Kenworthy, Theo Panagopoulos, Zhigang Chen
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Publication number: 20190371579Abstract: A plasma chamber is provided to increase conductance within the plasma chamber and to increase uniformity of the conductance. A radio frequency (RF) path for supplying power to the plasma chamber is symmetric with respect to a center axis of the plasma chamber. Moreover, pumps used to remove materials from the plasma chamber are located symmetric with respect to the center axis. The symmetric arrangements of the RF paths and the pumps facilitate an increase in conductance uniformity within the plasma chamber.Type: ApplicationFiled: August 12, 2019Publication date: December 5, 2019Inventors: Daniel Arthur Brown, John Patrick Holland, Michael C. Kellogg, James E. Tappan, Jerrel K. Antolik, Ian Kenworthy, Theo Panagopoulos, Zhigang Chen
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Patent number: 10395902Abstract: A plasma chamber is provided to increase conductance within the plasma chamber and to increase uniformity of the conductance. A radio frequency (RF) path for supplying power to the plasma chamber is symmetric with respect to a center axis of the plasma chamber. Moreover, pumps used to remove materials from the plasma chamber are located symmetric with respect to the center axis. The symmetric arrangements of the RF paths and the pumps facilitate an increase in conductance uniformity within the plasma chamber.Type: GrantFiled: July 18, 2018Date of Patent: August 27, 2019Assignee: Lam Research CorporationInventors: Daniel Arthur Brown, John Patrick Holland, Michael C. Kellogg, James E. Tappan, Jerrel K. Antolik, Ian Kenworthy, Theo Panagopoulos, Zhigang Chen
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Patent number: 10332729Abstract: A compression member for use in a showerhead electrode assembly of a capacitively coupled plasma chamber. The member applies a compression force to a portion of a film heater adjacent a power supply boot on an upper surface of a thermal control plate and is located between the thermal control plate and a temperature-controlled top plate. The member is composed of an electrically insulating elastomeric material which can work over a large range of compressions and temperatures.Type: GrantFiled: February 13, 2018Date of Patent: June 25, 2019Assignee: LAM RESEARCH CORPORATIONInventors: Darrell Ehrlich, Daniel Arthur Brown, Ian Kenworthy
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Publication number: 20180323044Abstract: A plasma chamber is provided to increase conductance within the plasma chamber and to increase uniformity of the conductance. A radio frequency (RF) path for supplying power to the plasma chamber is symmetric with respect to a center axis of the plasma chamber. Moreover, pumps used to remove materials from the plasma chamber are located symmetric with respect to the center axis. The symmetric arrangements of the RF paths and the pumps facilitate an increase in conductance uniformity within the plasma chamber.Type: ApplicationFiled: July 18, 2018Publication date: November 8, 2018Inventors: Daniel Arthur Brown, John Patrick Holland, Michael C. Kellogg, James E. Tappan, Jerrel K. Antolik, Ian Kenworthy, Theo Panagopoulos, Zhigang Chen
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Patent number: 10049862Abstract: A plasma chamber is provided to increase conductance within the plasma chamber and to increase uniformity of the conductance. A radio frequency (RF) path for supplying power to the plasma chamber is symmetric with respect to a center axis of the plasma chamber. Moreover, pumps used to remove materials from the plasma chamber are located symmetric with respect to the center axis. The symmetric arrangements of the RF paths and the pumps facilitate an increase in conductance uniformity within the plasma chamber.Type: GrantFiled: March 11, 2016Date of Patent: August 14, 2018Assignee: Lam Research CorporationInventors: Daniel Arthur Brown, John Patrick Holland, Michael C. Kellogg, James E. Tappan, Jerrel K. Antolik, Ian Kenworthy, Theo Panagopoulos, Zhigang Chen
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Publication number: 20180174804Abstract: A compression member for use in a showerhead electrode assembly of a capacitively coupled plasma chamber. The member applies a compression force to a portion of a film heater adjacent a power supply boot on an upper surface of a thermal control plate and is located between the thermal control plate and a temperature-controlled top plate. The member is composed of an electrically insulating elastomeric material which can work over a large range of compressions and temperatures.Type: ApplicationFiled: February 13, 2018Publication date: June 21, 2018Inventors: Darrell EHRLICH, Daniel Arthur Brown, Ian Kenworthy
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Patent number: 9922804Abstract: A compression member for use in a showerhead electrode assembly of a capacitively coupled plasma chamber. The member applies a compression force to a portion of a film heater adjacent a power supply boot on an upper surface of a thermal control plate and is located between the thermal control plate and a temperature-controlled top plate. The member is composed of an electrically insulating elastomeric material which can work over a large range of compressions and temperatures.Type: GrantFiled: May 12, 2015Date of Patent: March 20, 2018Assignee: LAM RESEARCH CORPORATIONInventors: Darrell Ehrlich, Daniel Arthur Brown, Ian Kenworthy
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Patent number: 9689533Abstract: A gas delivery system for a plasma process system such as a plasma etching system wherein inner surfaces of gas passages are coated with a corrosion-resistant material coating formed by curing a layer of fluidic precursor deposited on the inner surfaces. The coating can be formed by (a) flowing a fluidic precursor of a corrosion-resistant material through the gas passages and depositing a layer of the fluidic precursor to completely coat the inner surfaces of the gas passages; (b) removing excess fluidic precursor from the inner surfaces; (c) curing the deposited layer of the fluidic precursor to form a corrosion-resistant material coating.Type: GrantFiled: August 29, 2014Date of Patent: June 27, 2017Assignee: LAM RESEARCH CORPORATIONInventors: Ian Kenworthy, Duane Outka, Fangli Hao, Leonard Sharpless, Yijun Du
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Publication number: 20170133283Abstract: An apparatus for use in a processing chamber is provided. A consumable is within the processing chamber. A scale is positioned to measure a mass of the consumable.Type: ApplicationFiled: November 6, 2015Publication date: May 11, 2017Inventor: Ian KENWORTHY
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Publication number: 20160307743Abstract: A plasma chamber is provided to increase conductance within the plasma chamber and to increase uniformity of the conductance. A radio frequency (RF) path for supplying power to the plasma chamber is symmetric with respect to a center axis of the plasma chamber. Moreover, pumps used to remove materials from the plasma chamber are located symmetric with respect to the center axis. The symmetric arrangements of the RF paths and the pumps facilitate an increase in conductance uniformity within the plasma chamber.Type: ApplicationFiled: March 11, 2016Publication date: October 20, 2016Inventors: Daniel Arthur Brown, John Patrick Holland, Michael C. Kellogg, James E. Tappan, Jerrel K. Antolik, Ian Kenworthy, Theo Panagopoulos, Zhigang Chen
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Publication number: 20150243487Abstract: A compression member for use in a showerhead electrode assembly of a capacitively coupled plasma chamber. The member applies a compression force to a portion of a film heater adjacent a power supply boot on an upper surface of a thermal control plate and is located between the thermal control plate and a temperature-controlled top plate. The member is composed of an electrically insulating elastomeric material which can work over a large range of compressions and temperatures.Type: ApplicationFiled: May 12, 2015Publication date: August 27, 2015Applicant: LAM RESEARCH CORPORATIONInventors: Darrell Ehrlich, Daniel Arthur Brown, Ian Kenworthy
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Patent number: 9058960Abstract: A compression member for use in a showerhead electrode assembly of a capacitively coupled plasma chamber. The member applies a compression force to a portion of a film heater adjacent a power supply boot on an upper surface of a thermal control plate and is located between the thermal control plate and a temperature-controlled top plate. The member is composed of an electrically insulating elastomeric material which can work over a large range of compressions and temperatures.Type: GrantFiled: May 9, 2012Date of Patent: June 16, 2015Assignee: Lam Research CorporationInventors: Darrell Ehrlich, Daniel Arthur Brown, Ian Kenworthy
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Publication number: 20140366968Abstract: A gas delivery system for a plasma process system such as a plasma etching system wherein inner surfaces of gas passages are coated with a corrosion-resistant material coating formed by curing a layer of fluidic precursor deposited on the inner surfaces. The coating can be formed by (a) flowing a fluidic precursor of a corrosion-resistant material through the gas passages and depositing a layer of the fluidic precursor to completely coat the inner surfaces of the gas passages; (b) removing excess fluidic precursor from the inner surfaces; (c) curing the deposited layer of the fluidic precursor to form a corrosion-resistant material coating.Type: ApplicationFiled: August 29, 2014Publication date: December 18, 2014Inventors: Ian Kenworthy, Duane Outka, Fangli Hao, Leonard Sharpless, Yijun Du
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Patent number: 8852685Abstract: A method of coating the inner surfaces of gas passages of a gas delivery system for a plasma process system such as a plasma etching system includes (a) flowing a fluidic precursor of a corrosion-resistant material through the gas passages and depositing a layer of the fluidic precursor to completely coat the inner surfaces of the gas passages; (b) removing excess fluidic precursor from the inner surfaces; (c) curing the deposited layer of the fluidic precursor to form a corrosion-resistant material coating.Type: GrantFiled: April 23, 2010Date of Patent: October 7, 2014Assignee: Lam Research CorporationInventors: Ian Kenworthy, Duane Outka, Fangli Hao, Leonard Sharpless, Yijun Du
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Publication number: 20130299605Abstract: A compression member for use in a showerhead electrode assembly of a capacitively coupled plasma chamber. The member applies a compression force to a portion of a film heater adjacent a power supply boot on an upper surface of a thermal control plate and is located between the thermal control plate and a temperature-controlled top plate. The member is composed of an electrically insulating elastomeric material which can work over a large range of compressions and temperatures.Type: ApplicationFiled: May 9, 2012Publication date: November 14, 2013Applicant: Lam Research CorporationInventors: Darrell Ehrlich, Daniel Arthur Brown, Ian Kenworthy
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Publication number: 20110259519Abstract: A method of coating the inner surfaces of gas passages of a gas delivery system for a plasma process system such as a plasma etching system includes (a) flowing a fluidic precursor of a corrosion-resistant material through the gas passages and depositing a layer of the fluidic precursor to completely coat the inner surfaces of the gas passages; (b) removing excess fluidic precursor from the inner surfaces; (c) curing the deposited layer of the fluidic precursor to form a corrosion-resistant material coating.Type: ApplicationFiled: April 23, 2010Publication date: October 27, 2011Applicant: Lam Research CorporationInventors: Ian Kenworthy, Duane Outka, Fangli Hao, Leonard Sharpless, Yijun Du
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Patent number: 4582666Abstract: A non-woven fabric having a pattern defined by an array of discrete areas having a reduced fibre density but which are substantially free of perforations is produced by supporting a freshly wet laid web of the non-woven fabric on a porous surface and directing spaced jets of fluid against the unsupported side in order to displace fibres within discrete areas while maintaining in position a proportion of fibres that are within those areas and that are adjacent the porous surface. The fabric web may be supported on a Fourdrinier wire (1) and the jets of fluid (e.g. water) may be directed through the apertures in a perforated cylinder (6), the fluid being supplied under pressure from a water-knife device (11). The apertures in the cylinder (6) preferably have a cross-section that increases in the direction of the water jets.Type: GrantFiled: October 22, 1982Date of Patent: April 15, 1986Assignees: C. H. Dexter Limited, Societe Francaise des non TissuesInventors: Ian Kenworthy, Robert B. Gettins, Peter W. Logan, Patrick Jeambar, Andre Vuillaume