Patents by Inventor Ian P. Gibson

Ian P. Gibson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12201809
    Abstract: Disclosed herein is a wearable drug delivery device including a container filled at least partially with a drug including at least one of a PCSK9 (Proprotein Convertase Subtilisin/Kexin Type 9) specific antibody, a granulocyte colony-stimulating factor (G-CSF), a sclerostin antibody, or a calcitonin gene-related peptide (CGRP) antibody. The wearable drug delivery device may include a needle and an insertion mechanism configured to insert the needle into a patient. A fluid pathway connector may define a sterile fluid flowpath between the container and the insertion mechanism. Optionally, a cannula initially disposed about the needle may be included. The cannula may be retained in the patient at an injection site created by the needle after the needle is withdrawn from the patient. Methods of assembly and operation are also provided.
    Type: Grant
    Filed: July 28, 2021
    Date of Patent: January 21, 2025
    Assignee: AMGEN INC.
    Inventors: Scott R. Gibson, Sheldon B. Moberg, Basel Hasan Taha, Margaux Frances Boyaval, Mark A. Destefano, Lawton Laurence, John C. Love, Ian B. Hanson, Paul F. Bente, IV, Matthew J. Clemente, Antonio Ubach, Rajan Ramaswamy, Daniel S. Codd, Scott Beaver, Kevin L. Bokelman, Ian P. Dardani, Sean M. O'connor, Danielle Feldman
  • Patent number: 4419202
    Abstract: In the practice of the sputter ion plating of refractory metals or refractory metal compounds on substrates to form smooth dense substantially porous-free coatings a method whereby the substrate bias potential can be reduced, thereby reducing the generation of substrate heat, is provided wherein the source material consists of a refractory metal or a refractory metal compound and one or more further metals. The further metal may be another refractory metal. Typical refractory and further metals are tungsten and tantalum.The source material may suitably be a bundle of wires consisting of wires of the refractory metal or metal compound and wires of the further metal.For predetermined glow discharge conditions of source and substrate potentials and ionizable gas pressure, the source material preferably consists of the refractory metal or metal compound and the further metal in proportions to form a solid solution on the substrate.The ionizable gas should be an inert gas of high atomic number.
    Type: Grant
    Filed: December 17, 1981
    Date of Patent: December 6, 1983
    Assignee: The Secretary of State for Defence in Her Britannic Majesty's Government of the United Kingdom of Great Britain and Northern Ireland
    Inventor: Ian P. Gibson